IP Library Granted Patent US 9,424,938
Granted Patent B2
US 9,424,938 · App. 13/156,961 · Granted Aug 23, 2016

Reduced voltage nonvolatile flash memory

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Quick Facts
Patent No.
US 9,424,938
App. No.
13/156,961
Granted
Aug 23, 2016
Kind
B2
Abstract

Subject matter disclosed herein relates to a memory device, and more particularly to nonvolatile memory. The nonvolatile memory may include a memory cell array having memory cell units that have at least one memory cell and select transistors sandwiching the at least one memory cell. At least one programmed threshold voltage of the memory cell units is less than an operating voltage of the memory cell array.

Claims (31)

1. A nonvolatile semiconductor memory comprising:

a memory cell array; and

programming circuitry connected to the memory cell array,

wherein the memory cell array comprises memory cell units, the memory cell units having at least one multilevel memory cell storing two or more bits of information as negative and positive programmed threshold voltages, and select transistors sandwiching the at least one memory cell,

wherein the nonvolatile semiconductor memory is configured to receive an operating voltage from an external power supply as a lowest positive voltage supplied to the nonvolatile semiconductor memory,

wherein the operating voltage is greater than or equal to 2.7 volts and less than or equal to 3.6 volts,

wherein the programming circuitry is configured to apply a plurality of programming pulses each having a voltage less than or equal to the operating voltage when programming one of the memory cell units to one of the positive programmed threshold voltages, and

wherein each of the positive programmed threshold voltages of the memory cell units is less than or equal to the operating voltage.

2. The nonvolatile semiconductor memory of claim 1 , wherein the memory cell array is disposed on a single die that includes a voltage regulator to produce voltages less than a second positive voltage supplied to the nonvolatile semiconductor memory, and wherein the second positive voltage is higher than the operating voltage.

3. The nonvolatile semiconductor memory of claim 1 , wherein the memory cell units are programmed using a Fowler-Nordheim (F-N) tunneling mechanism.

4. The nonvolatile semiconductor memory of claim 1 , wherein the select transistors operate as pass transistors in response to a signal applied to control gates of the select transistors having a voltage less than the operating voltage.

5. The nonvolatile semiconductor memory of claim 1 , wherein the memory cell units comprise less than ten memory cells on a single bitline.

6. The nonvolatile semiconductor memory of claim 1 , wherein the memory cell array is disposed on a single die, and further comprising:

a port to receive boosted-voltage power supply signals from a charge pump located external to the single die.

7. The nonvolatile semiconductor memory of claim 6 , wherein the boosted-voltage power supply signals are applied between a bulk substrate and a control gate of the at least one memory cell during an erase operation.

8. The nonvolatile semiconductor memory of claim 1 , wherein the nonvolatile semiconductor memory is incorporated in at least one of the following: a desktop computer, a laptop computer, a workstation, a server device, a personal digital assistant, a mobile communication device, or any combination thereof.

9. The nonvolatile semiconductor memory of claim 1 , wherein the memory cell units are programmed using channel hot-electron injection.

10. A method comprising:

programming one or more memory cells in a memory array of a memory die so that a positive programmed threshold voltage of the memory cells in the memory array is less than an operating voltage provided to the memory array, wherein the operating voltage is a lowest positive voltage supplied to the memory die and wherein the operating voltage is greater than or equal to 2.7 volts and less than or equal to 3.6 volts, and wherein:

programming the one or more memory cells comprises applying to the one or more memory cells a plurality of programming pulses each having a voltage less than or equal to the operating voltage; and

reading information from selected ones of the one or more memory cells by applying a pass gate voltage to wordlines of unselected ones of the one or more memory cells less than the operating voltage.

11. The method of claim 10 , wherein the one or more memory cells are connected in series and sandwiched between select transistors that comprise pass transistors in response to a control voltage less than the operating voltage.

12. The method of claim 10 , further comprising providing voltages higher than the operating voltage to the one or more memory cells from a charge pump located external to a die that includes the one or more memory cells.

13. The method of claim 12 , wherein the die includes a voltage regulator to provide power supply signals less than the voltage from the charge pump.

14. The method of claim 10 , further comprising operating the one or more memory cells in an embedded application.

15. The method of claim 10 , wherein the memory cells are programmed using channel hot-electron injection.

16. The method of claim 10 , wherein the memory cells are programmed using a Fowler-Nordheim (F-N) tunneling mechanism.

17. The nonvolatile semiconductor memory of claim 1 , wherein the operating voltage is about 3.3 V.

18. The method of claim 10 , wherein the one or more memory cells are disposed in a memory array, wherein a highest programmed threshold voltage of memory cells in the memory array is less than the operating voltage.

19. The nonvolatile semiconductor memory of claim 1 , wherein a die on which the memory array is located does not comprise a charge pump for boosting voltage levels for read operations.

20. The nonvolatile semiconductor memory of claim 19 , wherein the die does not comprise a charge pump.

Assignments (9)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 26, 2011
From: NUMONYX B.V.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 027126/0176 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 9, 2011
From: SAKUI, KOJI
To: MICRON TECHNOLOGY, INC.
Reel/Frame 026419/0039 →