Wafer dicing using femtosecond-based laser and plasma etch
Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. A method includes forming a mask above the semiconductor wafer. The mask is composed of a layer covering and protecting the integrated circuits. The mask is patterned with a femtosecond-based laser scribing process to provide a patterned mask with gaps. The patterning exposes regions of the semiconductor wafer between the integrated circuits. The semiconductor wafer is then etched through the gaps in the patterned mask to singulate the integrated circuits.
1. A method of dicing a semiconductor wafer comprising a plurality of integrated circuits, the method comprising:
forming a mask above the semiconductor wafer, the mask comprising a layer covering and protecting the integrated circuits;
patterning the mask with a femtosecond-based laser scribing process to provide a laser-scribed mask with scribe lines each having a width, the scribe lines exposing regions of the semiconductor wafer between the integrated circuits; and
plasma etching trenches into the semiconductor wafer to singulate the integrated circuits, the trenches each having the width.
2. The method of claim 1 , wherein patterning the mask with the femtosecond-based laser scribing process comprises forming laser-scribed trenches in the regions of the semiconductor wafer between the integrated circuits, and wherein plasma etching the trenches having the width into the semiconductor wafer comprises extending the laser-scribed trenches to singulate the integrated circuits.
3. The method of claim 1 , wherein patterning the mask with the femtosecond-based laser scribing process comprises using a laser having a wavelength of approximately less than or equal to 540 nanometers with a laser pulse width of approximately less than or equal to 400 femtoseconds.
4. The method of claim 1 , wherein plasma etching the semiconductor wafer comprises using a high density plasma etching process.
5. The method of claim 1 , wherein forming the mask comprises forming a layer selected from the group consisting of a photo-resist layer and an I-line patterning layer.
6. The method of claim 1 , wherein the plurality of integrated circuits is separated by streets having a width of approximately 10 microns or smaller as measured at a device layer/substrate interface.
7. The method of claim 1 , wherein the plurality of integrated circuits has a non-restricted layout.
8. A method of dicing a semiconductor wafer comprising a plurality of integrated circuits, the method comprising:
forming a polymer mask layer above a silicon substrate, the polymer mask layer covering and protecting integrated circuits disposed on the silicon substrate, the integrated circuits comprising a layer of silicon dioxide disposed above a layer of low K material and a layer of copper;
patterning the polymer mask layer, the layer of silicon dioxide, the layer of low K material, and the layer of copper with a femtosecond-based laser scribing process to provide a laser scribed polymer mask with scribe lines each having a width, the scribe lines exposing regions of the silicon substrate between the integrated circuits; and
plasma etching trenches into the silicon substrate to singulate the integrated circuits, the trenches each having the width.
9. The method of claim 8 , wherein patterning the layer of silicon dioxide, the layer of low K material, and the layer of copper with the femtosecond-based laser scribing process comprises ablating the layer of silicon dioxide prior to ablating the layer of low K material and the layer of copper.
10. The method of claim 8 , wherein patterning with the femtosecond-based laser scribing process further comprises forming laser-scribed trenches in the regions of the silicon substrate between the integrated circuits, and wherein plasma etching the trenches having the width into the silicon substrate comprises extending the laser-scribed trenches to singulate the integrated circuits.
11. The method of claim 8 , wherein the patterning with the femtosecond-based laser scribing process comprises using a laser having a wavelength of approximately less than or equal to 530 nanometers with a laser pulse width of approximately less than or equal to 400 femtoseconds.
12. The method of claim 8 , wherein plasma etching the silicon substrate comprises using a high density through-silicon plasma etching process.
13. The method of claim 8 , wherein the integrated circuits are separated by streets having a width of approximately 10 microns or smaller.