IP Library Granted Patent US 8,450,810
Granted Patent B2
US 8,450,810 · App. 13/188,059 · Granted May 28, 2013

Bidirectional switch

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Quick Facts
Patent No.
US 8,450,810
App. No.
13/188,059
Granted
May 28, 2013
Kind
B2
Abstract

An ON resistance of a bidirectional switch with a trench gate structure composed of two MOS transistors sharing a common drain is reduced. A plurality of trenches is formed in an N type well layer. Then a P type body layer is formed in every other column of the N type well layer interposed between a pair of the trenches. A first N+ type source layer and a second N+ type source layer are formed alternately in each of a plurality of the P type body layers. A first gate electrode is formed in each of a pair of the trenches interposing the first N+ type source layer, and a second gate electrode is formed in each of a pair of the trenches interposing the second N+ type source layer. A portion of the N type well layer interposed between a sidewall on an opposite side of the body layer of the trench in which the first gate electrode is formed and a sidewall on an opposite side of the body layer of the trench in which the second gate electrode is formed makes an N type drain layer serving as an electric field relaxation layer. A cross-sectional area of the N type drain layer makes a path of the ON current.

Claims (10)

1. A bidirectional switch comprising:

a semiconductor substrate of a first general conductivity type;

a semiconductor layer of a second general conductivity type disposed on the semiconductor substrate;

a plurality of trenches formed in the semiconductor layer so that a column is defined between each pair of the trenches;

a gate electrode disposed in each trench;

a plurality of body layers of the first conductivity type formed in the semiconductor layer so that a body layer exists in every other column of the semiconductor layer so as to form a transistor; and

a source layer of the second conductivity type formed in each body layer,

wherein a column of the semiconductor layer in which no body layer is formed is configured to operate as a common drain layer between two pairs of transistors.

2. The bidirectional switch of claim 1 , wherein a width of the common drain layer determines a source-drain dielectric breakdown voltage of the bidirectional switch.

3. The bidirectional switch of claim 1 , wherein in an ON state of the bidirectional switch a charge accumulation layer is formed around each trench, and an ON current flows from a charge accumulation layer of one transistor to a charge accumulation layer of another transistor through the common drain layer.

Assignments (6)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 038620, FRAME 0087 Recorded Jun 22, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064070/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NUMBER 5859768 AND TO RECITE COLLATERAL AGENT ROLE OF RECEIVING PARTY IN THE SECURITY INTEREST PREVIOUSLY RECORDED ON REEL 038620 FRAME 0087. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Aug 25, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 039853/0001 →
SECURITY INTEREST Recorded Apr 15, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 038620/0087 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2014
From: ON SEMICONDUCTOR TRADING SARL
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 033626/0753 →
CHANGE OF NAME Recorded Aug 22, 2014
From: ON SEMICONDUCTOR TRADING, LTD.
To: ON SEMICONDUCTOR TRADING SARL
Reel/Frame 033596/0245 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 25, 2011
From: TAKEDA, YASUHIRO
To: ON SEMICONDUCTOR TRADING, LTD.
Reel/Frame 026641/0052 →