IP Library Granted Patent US 8,933,711
Granted Patent B2
US 8,933,711 · App. 13/228,215 · Granted Jan 13, 2015

Capacitive sensor radiation measurement

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Quick Facts
Patent No.
US 8,933,711
App. No.
13/228,215
Granted
Jan 13, 2015
Kind
B2
Abstract

A system that includes at least one capacitive sensor for least one angle of incidence component of radiation being measured striking the sensor. The measured capacitance of the sensor is affected by radiation striking the sensor. In some embodiments, the system includes multiple sensors where differences in the capacitive measurements of the sensors can be used to determine information about the radiation such as e.g. horizontal angle, directional angle, and dose.

Claims (55)

1. A method for determining information regarding incident radiation on a radiation detector comprising a plurality of sensor regions, the method comprising:

measuring a plurality of capacitances with circuitry, each capacitance of the plurality associated with radiation being measured striking a sensor region of the plurality of sensor regions, wherein for each sensor region of the plurality of sensor regions, the capacitance measured is dependent upon an angle of incidence of the radiation being measured striking the sensor region;

determining with the circuitry, an angle of incidence component of the radiation using the plurality of measured capacitances;

each of the plurality of sensor regions is configured as a pair of sensor regions with another sensor region of the plurality of sensor regions;

each pair of sensor regions is located on a substrate, wherein a first pair is oriented at a first directional angle on the substrate and a second pair is oriented at a second directional angle on the substrate different from the first directional angle;

wherein a third pair of sensor regions is oriented at a third directional angle on the substrate that is different than the second directional angle and the first directional angle.

2. The method of claim 1 wherein each of the plurality of sensor regions is configured as a pair of sensor regions with another sensor region of the plurality of sensor regions, wherein the determining includes determining a difference in capacitances measured for each pair and using the difference in determining the angle of incidence component.

3. The method of claim 1 wherein:

each pair of sensor regions is associated with a blocking structure that blocks the radiation such that a measured capacitance associated with a first sensor region of a pair is different from a measured capacitance associated with a second sensor region of the pair for certain angles of incidence of radiation being measured and wherein for at least one angle of incidence where radiation being measured strikes both the first sensor region of the pair and the second sensor region of the pair, the measured capacitance associated with the first sensor region equals the measured capacitance associated with the second sensor region.

4. The method of claim 1 wherein the determining an angle of incidence component of the radiation includes determining a directional angle of the radiation.

5. The method of claim 4 further comprising determining a horizontal angle of the radiation using the plurality of measured capacitances.

6. The method of claim 1 wherein the determining an angle of incidence component of the radiation includes determining a horizontal angle of the radiation.

7. The method of claim 1 further comprising determining a dose of the radiation using the plurality of measured capacitances.

8. A method comprising:

measuring a first capacitance associated with a first sensor region and a second capacitance associated with a second sensor region, wherein the first capacitance is dependent upon the radiation being measured striking the first sensor region and the second capacitance is dependent upon the radiation being measured striking the second sensor region;

determining an angle of incidence component of the radiation using the first capacitance and the second capacitance;

wherein the measuring the first capacitance associated with the first sensor region includes applying a voltage to a to plate conductive structure, the first capacitance is a capacitance between the to plate conductive structure and the first sensor region, and

wherein the measuring the second capacitance associated with the second sensor region includes applying a voltage to the top plate conductive structure, the second capacitance is a capacitance between the to plate conductive structure and the second sensor region.

9. The method of claim 8 wherein the determining an angle of incidence component of the radiation includes determining a directional angle of the radiation.

10. The method of claim 8 wherein the determining an angle of incidence component of the radiation includes determining a horizontal angle of the radiation.

11. The method of claim 8 wherein for certain angles of incidence of radiation being measured, a blocking structure blocks the radiation such that a measured capacitance associated with a first sensor region is different from a measured capacitance associated with the second sensor region and wherein for at least one angle of incidence where radiation being measured strikes both the first sensor region and the second sensor region, the measured capacitance associated with the first sensor region equals the measured capacitance associated with the second sensor region.

12. The method of claim 8 further comprising:

measuring a third capacitance associated with a third sensor region and a fourth capacitance associated with a fourth sensor region, wherein the third capacitance is dependent upon the radiation being measured striking the third sensor region and the fourth capacitance is dependent upon the radiation being measured striking the fourth sensor region;

wherein the determining the angle of incidence component of the radiation includes using the third capacitance and the fourth capacitance.

13. An apparatus for determining information regarding radiation being measured comprising:

one or more capacitive sensors, wherein each capacitive sensor of the one or more capacitive sensors comprises a conductive structure and sensor region, the sensor region is made of a material where the capacitance between the conductive structure and sensor region is dependent upon radiation being measured striking the sensor region;

capacitive measuring circuitry including a first terminal and a second terminal, wherein when measuring a capacitance between a conductive structure and a sensor region of a capacitive sensor of the one or more capacitive sensors, the first terminal is electrically coupled to the conductive structure and the second terminal is electrically coupled to the sensor region of the capacitive sensor, wherein the apparatus determines at least one angle of incidence component of radiation being measured using a capacitive measurement of the capacitive sensor by the capacitive measuring circuitry;

wherein the one or more capacitive sensors includes a second capacitive sensor;

wherein the capacitive sensor and the second capacitive sensor are positioned with respect to each other such that a measured capacitance associated with the capacitive sensor is different from a measured capacitance associated with the second capacitive sensor for certain angles of incidence of radiation being measured;

wherein the capacitive sensor and the second capacitive sensor are positioned with respect to each other such that for at least one angle of incidence of radiation being measured striking both the sensor region of the capacitive sensor and the sensor region of the second capacitive sensor, the measured capacitance associated with the first capacitive sensor equals the measured capacitance associated with the second capacitive sensor;

wherein the apparatus determines at least one angle of incidence component of radiation being measured from differences in measured capacitance of the capacitive sensor and the second capacitive sensor;

wherein the conductive structure of the first capacitive sensor is the same conductive structure of the second capacitive sensor.

14. The apparatus of claim 13 wherein:

the one or more capacitive sensors includes a plurality of pairs of a first capacitive sensor and a second capacitive sensor;

wherein for each pair of the plurality of pairs, the first capacitive sensor and the second capacitive sensor are positioned with respect to each other such that a measured capacitance associated with the first capacitive sensor is different from a measured capacitance associated with the second capacitive sensor for certain angles of incidence of radiation being measured;

wherein for each pair of the plurality of pairs, the first capacitive sensor and the second capacitive sensor are positioned with respect to each other such that for at least one angle of incidence of radiation being measured striking both the sensor region of the first capacitive sensor and the sensor region of the second capacitive sensor, the measured capacitance associated with the first capacitive sensor equals the measured capacitance associated with the second capacitive sensor;

wherein the apparatus determines at least one angle of incidence component of radiation being measured from the capacitive measurements of the first capacitive sensor and the second capacitive sensor of the pairs of the plurality.

15. The apparatus of claim 13 wherein the at least one angle of incidence component of radiation being measured includes a directional angle of the radiation.

16. The apparatus of claim 15 wherein the at least one angle of incidence component of radiation being measured includes a horizontal angle of the radiation.

17. The apparatus of claim 13 wherein the at least one angle of incidence component of radiation being measured includes a horizontal angle of the radiation.

18. The apparatus of claim 13 wherein the apparatus determines dose of radiation being measured using a capacitive measurement of the capacitive sensor by the capacitive measuring circuitry.

19. An apparatus for determining information regarding radiation being measured comprising:

one or more capacitive sensors, wherein each capacitive sensor of the one or more capacitive sensors comprises a conductive structure and sensor region, the sensor region is made of a material where the capacitance between the conductive structure and sensor region is dependent upon radiation being measured striking the sensor region;

capacitive measuring circuitry including a first terminal and a second terminal, wherein when measuring a capacitance between a conductive structure and a sensor region of a capacitive sensor of the one or more capacitive sensors, the first terminal is electrically coupled to the conductive structure and the second terminal is electrically coupled to the sensor region of the capacitive sensor, wherein the apparatus determines at least one angle of incidence component of radiation being measured using a capacitive measurement of the capacitive sensor by the capacitive measuring circuitry;

wherein the one or more capacitive sensors includes a plurality of pairs of a first capacitive sensor and a second capacitive sensor;

wherein for each pair of the plurality of pairs, the first capacitive sensor and the second capacitive sensor are positioned with respect to each other such that a measured capacitance associated with the first capacitive sensor is different from a measured capacitance associated with the second capacitive sensor for certain angles of incidence of radiation being measured;

wherein for each pair of the plurality of pairs, the first capacitive sensor and the second capacitive sensor are positioned with respect to each other such that for at least one angle of incidence of radiation being measured striking both the sensor region of the first capacitive sensor and the sensor region of the second capacitive sensor, the measured capacitance associated with the first capacitive sensor equals the measured capacitance associated with the second capacitive sensor;

wherein the apparatus determines at least one angle of incidence component of radiation being measured from the capacitive measurements of the first capacitive sensor and the second capacitive sensor of the pairs of the plurality;

wherein each pair of the plurality of pairs is located in a sensor array on a substrate, wherein at least three of the pairs of the plurality of pairs are positioned at different directional angle orientations with respect to each other on the substrate.

20. The apparatus of claim 19 wherein:

the one or more capacitive sensors includes a second capacitive sensor;

wherein the capacitive sensor and the second capacitive sensor are positioned with respect to each other such that a measured capacitance associated with the capacitive sensor is different from a measured capacitance associated with the second capacitive sensor for certain angles of incidence of radiation being measured;

wherein the capacitive sensor and the second capacitive sensor are positioned with respect to each other such that for at least one angle of incidence of radiation being measured striking both the sensor region of the capacitive sensor and the sensor region of the second capacitive sensor, the measured capacitance associated with the first capacitive sensor equals the measured capacitance associated with the second capacitive sensor;

wherein the apparatus determines at least one angle of incidence component of radiation being measured from differences in measured capacitance of the capacitive sensor and the second capacitive sensor.

21. The apparatus of claim 20 wherein the conductive structure of the first capacitive sensor is the same conductive structure of the second capacitive sensor.

Assignments (21)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
MERGER Recorded Jan 3, 2017
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 041144/0363 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
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To: MORGAN STANLEY SENIOR FUNDING, INC.
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ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
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ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
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To: MORGAN STANLEY SENIOR FUNDING, INC.
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PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0285 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0387 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
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SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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SECURITY AGREEMENT Recorded Jun 18, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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SECURITY AGREEMENT Recorded Jan 31, 2012
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
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SECURITY AGREEMENT Recorded Jan 31, 2012
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
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SECURITY AGREEMENT Recorded Jan 31, 2012
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
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ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 8, 2011
From: HALL, MARK D.; SHROFF, MEHUL D.
To: FREESCALE SEMICONDUCTOR, INC.
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