Stacked semiconductor die with continuous conductive vias
View Patent ↗A stacked semiconductor device includes a first, a second, a third, and a fourth semiconductor device. A first major surface of each of the first and second semiconductor devices which includes the active circuitry directly face each other, and a first major surface of each of the third and fourth semiconductor devices which includes the active circuitry directly face each other. A second major surface of the second semiconductor device directly faces a second major surface of the third semiconductor device. The stacked semiconductor device includes a plurality of continuous conductive vias, wherein each continuous conductive via extends from the second major surface of the first device, through the first device, second device, third device, and fourth device to the second major surface of the fourth device. Each of the semiconductor devices may include a beveled edge at the first major surface on at least one edge of the device.
1. A stacked semiconductor device comprising:
a first semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the first semiconductor device with active circuitry;
a second semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the second semiconductor device with active circuitry;
a third semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the third semiconductor device with active circuitry;
a fourth semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the fourth semiconductor device with active circuitry, wherein:
the first major surface of the first semiconductor device faces the first major surface of the second semiconductor device such that the first major surfaces of the first and second semiconductor devices are between the second major surfaces of the first and second semiconductor devices;
the first major surface of the third semiconductor device faces the first major surface of the fourth semiconductor device such that the first major surfaces of the third and fourth semiconductor devices are between the second major surfaces of the third and fourth semiconductor devices; and
the second major surface of the second semiconductor device faces the second major surface of the third semiconductor device, such that the second major surfaces of the second and third semiconductor devices are between the first major surfaces of the second and third semiconductor devices; and
at least one continuous conductive via, wherein each continuous conductive via of the at least one continuous conductive via extends from the second major surface of the first semiconductor device, through the first semiconductor device, second semiconductor device, and third semiconductor device;
wherein each of the first, second, third, and fourth semiconductor devices comprises a beveled edge at the first major surface on at least one side of the semiconductor device,
the first semiconductor device comprises a conductive plane which includes at least one protruding portion which is in contact with and extends from the at least one continuous conductive via onto the beveled edge of the first semiconductor device;
the second semiconductor device comprises a conductive plane which includes at least one protruding portion which is in contact with and extends from the at least one continuous conductive via onto the beveled edge of the second semiconductor device;
the third semiconductor device comprises a conductive plane which includes at least one protruding portion which is in contact with and extends from the at least one continuous conductive via onto the beveled edge of the third semiconductor device; and
the fourth semiconductor device comprises a conductive plane which includes at least one protruding portion which is in contact with and extends from the at least one continuous conductive via onto the beveled edge of the fourth semiconductor device.
2. The stacked semiconductor device of claim 1 , wherein:
each of the at least one conductive via has a first width at an interface between the first major surfaces of the first and second semiconductor devices and a second width between the first and second major surfaces of the first semiconductor device, wherein the first width is greater than the second width; and
each of the at least one conductive via has a third width at an interface between the first major surfaces of the third and fourth semiconductor devices and a fourth width between the first and second major surfaces of the third semiconductor device, wherein the third width is greater than the fourth width.
3. The stacked semiconductor device of claim 1 , wherein each of the first, second, third, and fourth semiconductor devices is further characterized as a semiconductor die.
4. The stacked semiconductor device of claim 1 , wherein each of the first, second, third, and fourth semiconductor devices is further characterized as a memory device.
5. The stacked semiconductor device of claim 1 , wherein each of the first, second, third, and fourth semiconductor devices is further characterized as a semiconductor wafer.
6. The stacked semiconductor device of claim 1 , wherein one or more continuous conductive vias of the at least one continuous conductive via is for coupling a signal between the active circuitry of each of the first, second, third, and fourth semiconductor device.
7. The stacked semiconductor device of claim 1 further comprising:
for each of the first, second, third, and fourth semiconductor device, forming a second beveled edge at the first major surface on at least one edge of the semiconductor device, wherein:
the second beveled edge of the first semiconductor device faces the second beveled edge of the second semiconductor device such that a first opening is formed between the second beveled edges of the first and second semiconductor devices on a first vertical side of the stacked semiconductor device, the first vertical side of the stacked semiconductor device being substantially perpendicular to each of the first and second major surfaces of the first, second, third, and fourth semiconductor devices; and
the second beveled edge of the third semiconductor device faces the second beveled edge of the fourth semiconductor device such that a second opening is formed between the second beveled edges of the third and fourth semiconductor devices on the first vertical side of the stacked semiconductor device.
8. The stacked semiconductor device of claim 7 , further comprising:
a heat sink attached to the first vertical side of the stacked semiconductor device, the heat sink having a first protruding portion inserted into the first opening between the second beveled edges of the first and second semiconductor devices and a second protruding portion inserted into the second opening between the second beveled edges of the third and fourth semiconductor devices.
9. The stacked semiconductor device of claim 1 , wherein each continuous conductive via of the at least one continuous conductive via extends through the fourth semiconductor device to the second major surface of the fourth semiconductor device.
10. A stacked semiconductor device comprising:
a first semiconductor device having a first major surface and a second major surface opposite the first major surface, and the first major surface of the first semiconductor device having active circuitry and a beveled edge on at least one edge of the first semiconductor device;
a second semiconductor device having a first major surface and a second major surface opposite the first major surface, and the first major surface of the second semiconductor device having active circuitry and a beveled edge on at least one edge of the second semiconductor device;
a third semiconductor device having a first major surface and a second major surface opposite the first major surface, and the first major surface of the third semiconductor device having active circuitry and a beveled edge on at least one edge of the third semiconductor device;
a fourth semiconductor device having a first major surface and a second major surface opposite the first major surface, and the first major surface of the fourth semiconductor device having active circuitry and a beveled edge on at least one edge of the fourth semiconductor device, wherein:
the first major surface of the first semiconductor device faces the first major surface of the second semiconductor device such that the first major surfaces of the first and second semiconductor devices are between the second major surfaces of the first and second semiconductor devices, and the beveled edge of the first semiconductor device faces the beveled edge of the second semiconductor device such that a first opening is formed between the beveled edges of the first and second semiconductor devices;
the first major surface of the third semiconductor device faces the first major surface of the fourth semiconductor device such that the first major surfaces of the third and fourth semiconductor devices are between the second major surfaces of the third and fourth semiconductor devices, and the beveled edge of the third semiconductor device faces the beveled edge of the fourth semiconductor device such that a second opening is formed between the beveled edges of the third and fourth semiconductor devices; and
the second major surface of the second semiconductor device faces the second major surface of the third semiconductor device, such that the second major surfaces of the second and third semiconductor devices are between the first major surfaces of the second and third semiconductor devices; and
at least one continuous conductive via, wherein each continuous conductive via of the at least one continuous conductive via extends from the second major surface of the first semiconductor device, through the first semiconductor device, second semiconductor device, and third semiconductor device, wherein
the first semiconductor device comprises a conductive portion which extends from the at least one continuous conductive via onto the beveled edge of the first semiconductor device;
the second semiconductor device comprises a conductive portion which extends from the at least one continuous conductive via onto the beveled edge of the second semiconductor device;
the third semiconductor device comprises a conductive portion which extends from the at least one continuous conductive via onto the beveled edge of the third semiconductor device; and
the fourth semiconductor device comprises a conductive portion which extends from the at least one continuous conductive via onto the beveled edge of the fourth semiconductor device.
11. The stacked semiconductor device of claim 10 , wherein one or more continuous conductive vias of the at least one continuous conductive via is for coupling a signal between active circuitry of each of the first, second, third, and fourth semiconductor device.
12. A stacked semiconductor device comprising:
a first plurality of openings in a first semiconductor device, the first semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the first semiconductor device having active circuitry, wherein each of the first plurality of openings extends from the first major surface of the first semiconductor device, through the first semiconductor device to the second major surface of the first semiconductor device;
a second plurality of openings in a second semiconductor device, the second semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the second semiconductor device having active circuitry, wherein each of the second plurality of openings extends from the first major surface of the second semiconductor device, through the second semiconductor device to the second major surface of the second semiconductor device;
a third plurality of openings in a third semiconductor device, the third semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the third semiconductor device having active circuitry, wherein each of the third plurality of openings extends from the first major surface of the third semiconductor device, through the third semiconductor device to the second major surface of the third semiconductor device;
a fourth semiconductor device, the fourth semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the fourth semiconductor device having active circuitry;
the first, second, third, and fourth semiconductor device are stacked such that the first major surface of the first semiconductor device directly faces the first major surface of the second semiconductor device, the second major surface of the second semiconductor device directly faces the second major surface of the third semiconductor device, and the first major surface of the third semiconductor device directly faces the first major surface of the fourth semiconductor device, and wherein each of the first plurality of openings, second plurality of openings, and third plurality of openings are aligned to form a plurality of continuous openings which extend from the second major surface of the first semiconductor device, through the first semiconductor device, the second semiconductor device, and the third semiconductor device; and
each continuous opening of the plurality of continuous openings is filled with a signal conducting material,
wherein each of the first, second, third, and fourth semiconductor devices comprises a beveled edge at the first major surface on at least one side of the semiconductor device,
the first semiconductor device comprises an electrically conductive portion which extends from the signal conducting material in at least one of the plurality of continuous openings onto the beveled edge of the first semiconductor device;
the second semiconductor device comprises an electrically conductive portion which extends from the signal conducting material in at least one of the plurality of continuous openings onto the beveled edge of the second semiconductor device;
the third semiconductor device comprises an electrically conductive portion which extends from the signal conducting material in at least one of the plurality of continuous openings onto the beveled edge of the third semiconductor device; and
the fourth semiconductor device comprises an electrically conductive portion which extends from the signal conducting material in at least one of the plurality of continuous openings via onto the beveled edge of the fourth semiconductor device.
13. The device of claim 12 , further comprising:
a fourth plurality of openings in the fourth semiconductor device, wherein each of the fourth plurality of openings extends from the first major surface of the fourth semiconductor device, through the fourth semiconductor device to the second major surface of the fourth semiconductor device, and
wherein each of the first plurality of openings, second plurality of openings, and third plurality of openings align to the fourth plurality of openings to form the plurality of continuous openings such that the plurality of openings extend through the fourth semiconductor device to the second major surface of the fourth semiconductor device.
14. The device of claim 12 , further comprising:
the stacked first, second, third, and fourth semiconductor devices are singulated to form a singulated stacked semiconductor device.
15. The device of claim 14 , further comprising:
for each of the first, second, third, and fourth semiconductor device, forming a second beveled edge at the first major surface on at least one edge of the semiconductor device, wherein:
the second beveled edge of the first semiconductor device faces the second beveled edge of the second semiconductor device such that a first opening is formed between the beveled edges of the first and second semiconductor devices on a first vertical side of the singulated stacked semiconductor device, the first vertical side of the singulated stacked semiconductor device being substantially perpendicular to each of the first and second major surfaces of the first, second, third, and fourth semiconductor devices;
the second beveled edge of the third semiconductor device faces the second beveled edge of the fourth semiconductor device such that a second opening is formed between the second beveled edges of the third and fourth semiconductor devices on the first vertical side of the singulated stacked semiconductor device; and
a heat sink attached to the first vertical side of the singulated stacked semiconductor device, the heat sink having a first protruding portion inserted into the first opening between the second beveled edges of the first and second semiconductor devices and a second protruding portion inserted into the second opening between the second beveled edges of the third and fourth semiconductor devices.
16. The device of claim 12 , wherein:
each opening of the first plurality of openings has a greater diameter at the first major surface than the second major surface of the first semiconductor device;
each opening of the second plurality of openings has a greater diameter at the first major surface than the second major surface of the second semiconductor device; and
each opening of the third plurality of openings has a greater diameter at the first major surface than the second major surface of the third semiconductor device.
17. The device of claim 12 , wherein at least one filled continuous opening of the plurality of filled continuous openings is for coupling a signal between the active circuitry of each of the first, second, third, and fourth semiconductor device.