Method of forming an electromechanical transducer device
View Patent ↗A method of forming an electromechanical transducer device comprises forming on a fixed structure a movable structure and an actuating structure of the electromechanical transducer device, wherein the movable structure is arranged in operation of the electromechanical transducer device to be movable in relation to the fixed structure in response to actuation of the actuating structure. The method further comprises providing a stress trimming layer on at least part of the movable structure, after providing the stress trimming layer, releasing the movable structure from the fixed structure to provide a released electromechanical transducer device, and after releasing the movable structure changing stress in the stress trimming layer of the released electromechanical transducer device such that the movable structure is deflected a predetermined amount relative to the fixed structure when the electromechanical transducer device is in an off state.
1. A method of forming an electromechanical transducer device comprising:
forming on a fixed structure a movable structure and an actuating structure of the electromechanical transducer device, wherein the movable structure is arranged in operation of the electromechanical transducer device to be movable in relation to the fixed structure in response to actuation of the actuating structure;
providing a stress trimming layer on at least part of the movable structure;
after providing the stress trimming layer, releasing the movable structure from the fixed structure to provide a released electromechanical transducer device; and
after releasing the movable structure, changing stress in the stress trimming layer of the released electromechanical transducer device by performing a stress trimming anneal according to an anneal parameter determined in response to an amount of deflection of the released movable structure relative to the fixed structure, such that the movable structure is deflected a predetermined amount relative to the fixed structure when the electromechanical transducer device is in an off state.
2. The method of claim 1 , wherein determining a value for the anneal parameter comprises:
measuring, after releasing the movable structure and before performing the stress trimming anneal, the amount of deflection of the released movable structure relative to the fixed structure;
determining a difference between the measured amount of deflection and the predetermined amount of deflection; and
determining a value for the anneal parameter for deflecting the released movable structure by the determined difference amount.
3. The method of claim 2 , further comprising determining a level of stress of the stress trimming layer for deflecting the released movable structure by the determined difference and wherein the determining the value for the anneal parameter comprises determining the value for the anneal parameter corresponding to the determined level of stress.
4. The method of claim 1 , further comprising performing, prior to providing the stress trimming layer, a second anneal of the movable structure and the actuating structure formed on the fixed structure according to a second anneal parameter having a second predetermined value.
5. The method of claim 4 , wherein the second predetermined value is greater than the anneal parameter for the stress trimming anneal performed on the released electromechanical transducer device.
6. The method of claim 2 , wherein the anneal parameter is at least one of temperature and time.
7. The method of claim 6 , wherein the anneal parameter is temperature and wherein the stress trimming layer is arranged such that a value for the anneal temperature is in a range of values greater than a maximum temperature value required for subsequent processing or operation of the electromechanical transducer device and less than a maximum temperature value required to ensure no or insignificant change to stress in other layers of the electromechanical transducer device.
8. The method of claim 7 , further comprising performing an additional anneal on the electromechanical transducer device before releasing the movable structure at a temperature having a value corresponding to a minimum value of the range of values for the anneal temperature.
9. The method of claim 6 , wherein the anneal parameter is temperature and wherein a thickness of the stress trimming layer is arranged such that a value for the anneal temperature is in a range corresponding to a range of deflection amounts that is larger than a range of deflection amounts required for the determined difference amount.
10. The method of claim 1 , further comprising providing a heater on or as part of the movable structure, wherein the step of performing a stress trimming anneal comprises performing the stress trimming anneal using the heater.
11. The method of claim 10 , wherein the heater is formed from the stress trimming layer.
12. The method of claim 1 , wherein forming on the fixed structure a movable structure and an actuating structure of the electromechanical transducer device comprises forming a plurality of electromechanical transducer devices on a substrate comprising a movable structure and an actuating structure, and the method further comprises after performing the stress trimming anneal of the released electromechanical transducer devices, cutting the substrate to provide a plurality of separated electromechanical transducer devices.
13. The method of claim 1 , wherein forming on the fixed structure a movable structure and an actuating structure of the electromechanical transducer device comprises forming a plurality of electromechanical transducer devices on a substrate comprising a movable structure and an actuating structure, and the method further comprises after releasing the movable structure, cutting the substrate to provide a plurality of separated electromechanical transducer devices.
14. The method of claim 1 , wherein the predetermined amount includes a predetermined range of deflection values relative to a plane parallel to a surface of the fixed structure.