Slimming method of carbon-containing thin film and oxidation apparatus
A slimming method includes transferring an object to be processed on which a patterned carbon-containing thin film is formed into a process chamber in an oxidation apparatus; and oxidizing and removing the surface of the carbon-containing thin film by an oxidizing gas while supplying moisture into the process chamber, to reduce widths of the protruded portions on the pattern of the carbon-containing thin film.
1. A slimming method of a carbon-containing thin film, the slimming method comprising:
transferring an object to be processed on which a patterned carbon-containing thin film is formed into a process chamber in an oxidation apparatus; and
oxidizing and removing a surface of the carbon-containing thin film by an oxidizing gas while supplying an excessive amount of moisture more than an amount of moisture contained in the object or generated as a byproduct into the process chamber, to reduce widths of protruded portions on the pattern of the carbon-containing thin film.
2. A slimming method of a carbon-containing thin film, the slimming method comprising:
transferring an object to be processed on which a patterned carbon-containing thin film is formed into a process chamber in an oxidation apparatus;
supplying an excessive amount of moisture more than an amount of moisture contained in the object or generated as a byproduct into the process chamber; and
oxidizing and removing a surface of the carbon-containing thin film by an oxidizing gas, to reduce widths of protruded portions on the pattern of the carbon-containing thin film.
3. A slimming method of a carbon-containing thin film, the slimming method comprising:
transferring an object to be processed on which a patterned carbon-containing thin film is formed into a process chamber in an oxidation apparatus;
supplying an excessive amount of moisture more than an amount of moisture contained in the object or generated as a byproduct into the process chamber; and
oxidizing and removing a surface of the carbon-containing thin film by an oxidizing gas while supplying the excessive amount of moisture into the process chamber, to reduce widths of protruded portions on the pattern of the carbon-containing thin film.
4. The slimming method of claim 1 , wherein the carbon-containing thin film is a film selected from the group including a resist film, a carbon film, and an anti-reflection film.
5. The slimming method of claim 1 , wherein the oxidizing gas is an oxygen containing gas.
6. The slimming method of claim 5 , wherein the oxidizing is a plasma oxidation process in an oxygen atmosphere.
7. The slimming method of claim 5 , wherein the oxidizing is a thermal oxidation process in an oxygen atmosphere or a thermal oxidation process in an ozone atmosphere.