Exposure apparatus and method of manufacturing device
A scanning exposure apparatus exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate. The apparatus includes: a stage which holds the substrate and moves; and a controller which controls movement of the stage based on a driving profile that defines the movement of the stage. A portion in the driving profile, which defines the movement of the stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller.
1. A scanning exposure apparatus which exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate, the apparatus comprising:
a stage which holds the substrate and moves; and
a controller which controls movement of said stage based on a driving profile that defines the movement of said stage,
wherein a portion in the driving profile, which defines the movement of said stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller.
2. The apparatus according to claim 1 , further comprising a light source which emits light to expose the substrate,
wherein said controller controls said light source based on the driving profile so that the substrate is irradiated with the light at a light amount corresponding to a velocity of said stage during exposure of each shot region.
3. The apparatus according to claim 2 , wherein said controller obtains an acceleration profile of said stage, which is formed by the sine wave having the frequency lower than the resonance frequency, to generate a velocity profile and a position profile of said stage from the obtained acceleration profile, thereby controlling the movement of said stage based on the generated position profile, and controlling said light source based on the generated velocity profile.
4. The apparatus according to claim 1 , wherein the driving profile is formed by a sine wave having a frequency lower than a half of the resonance frequency.
5. The apparatus according to claim 1 , wherein the driving profile is formed by combining a sine wave having a first frequency, and a sine wave having a frequency three times the first frequency and an amplitude one third of the first frequency.
6. The apparatus according to claim 1 , wherein said controller controls the movement of said stage based on the driving profile in at least one reciprocating scanning operation of said stage.
7. A scanning exposure apparatus which exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate, the apparatus comprising:
a stage which holds the substrate and moves; and
a controller which controls movement of said stage based on a driving profile that defines the movement of said stage,
wherein a portion in the driving profile, which defines the movement of said stage during exposure of at least one shot region, is formed by combining not more than three sine waves having a frequency lower than a resonance frequency in a stage controller.
8. The apparatus according to claim 1 , wherein the scanning exposure apparatus includes an immersion exposure apparatus.
9. The apparatus according to claim 7 , wherein the scanning exposure apparatus includes an immersion exposure apparatus.
10. A method of manufacturing a device, the method comprising:
exposing a substrate to light using a scanning exposure apparatus which exposes a plurality of shot regions on the substrate to light while scanning an original and the substrate;
developing the exposed substrate; and
processing the developed substrate to manufacture a device,
the scanning exposure apparatus including:
a stage which holds the substrate and moves; and
a controller which controls movement of the stage based on a driving profile that defines the movement of the stage,
wherein a portion in the driving profile, which defines the movement of the stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller.
11. A method of manufacturing a device, the method comprising:
exposing a substrate to light using a scanning exposure apparatus which exposes a plurality of shot regions on the substrate to light while scanning an original and the substrate;
developing the exposed substrate; and
processing the developed substrate to manufacture a device,
the scanning exposure apparatus including:
a stage which holds the substrate and moves; and
a controller which controls movement of said stage based on a driving profile that defines the movement of said stage,
wherein a portion in the driving profile, which defines the movement of said stage during exposure of at least one shot region, is formed by combining not more than three sine waves having a frequency lower than a resonance frequency in a stage controller.