Apparatus and method for placing solder balls
A system and process for forming a ball grid array on a substrate includes defining a plurality of openings in a resist layer on the substrate, and forming a plurality of openings in the resist layer, each positioned over a contact pad of the substrate. Flux is then deposited in the openings, and solder balls are positioned in each opening with the flux. Solder bumps are formed by reflowing the solder balls in the respective openings. The resist layer is then removed, leaving an array of solder bumps on the substrate. The flux can be deposited by depositing a layer of flux, then removing the flux, except a portion that remains in each opening. Solder balls can be positioned by moving a ball feeder across the resist layer and dropping a solder ball each time an aperture in the ball feeder aligns with an opening in the resist layer.
1. A method, comprising:
positioning a resist layer on a surface of a substrate having a plurality of contact pads thereon;
defining a plurality of openings in the resist layer, each opening positioned over a respective one of the plurality of contact pads;
depositing flux paste in each of the plurality of openings;
positioning a solder ball in each of the plurality of openings in contact with the flux paste deposited in the respective opening by moving a ball feeder across the substrate, the ball feeder having a plurality of apertures spaced apart a distance that corresponds to a spacing, in one dimension, of the contact pads of the substrate, and dropping a single solder ball in each of the plurality of openings in the resist layer as the ball feeder moves across the respective openings;
forming solder bumps on each of the plurality of contact pads by reflowing the plurality of solder balls in the respective openings; and
removing the resist layer after reflowing the solder balls.
2. The method of claim 1 wherein the depositing flux paste comprises depositing a layer of flux paste over substantially an entire surface of the resist layer, and removing flux paste from the surface of the resist layer except a portion of the flux paste that remains in each of the plurality of openings.
3. The method of claim 2 wherein the depositing a layer of flux paste comprises drawing flux paste across the surface of the resist layer with a squeegee.
4. The method of claim 3 , comprising positioning sealing ridges on the surface of the resist layer, followed by the drawing flux paste across the surface of the resist layer, a thickness of the layer of flux paste being defined by a height of the sealing ridges above the surface of the resist layer.
5. The method of claim 2 wherein the depositing a layer of flux paste comprises applying flux paste in a spin coat process.
6. The method of claim 2 wherein the depositing a layer of flux paste comprises applying flux paste in a spray process.
7. The method of claim 2 wherein the removing flux paste from the surface of the resist layer comprises moving a cleaning mechanism across the substrate, with a continuous web of a cleaning material being passed over the surface of the resist layer and drawing away the flux paste.
8. The method of claim 1 , comprising positioning a plurality of sealing ridges on the surface of the resist layer, and wherein the moving a ball feeder across the substrate comprises positioning the ball feeder to span at least two adjacent ones of the plurality of sealing ridges and moving the ball feeder along the sealing ridges over the resist layer.
9. The method of claim 1 wherein the positioning a solder ball in each of the plurality of openings in contact with the flux paste comprises dropping a solder ball into each of the plurality of openings, and pressing the solder ball into the flux paste positioned in the respective opening.
10. A method for forming a ball grid array on a semiconductor device, comprising:
positioning a resist layer on a substrate of the semiconductor device;
defining a plurality of openings in the resist layer;
positioning a solder ball in each of the plurality of openings by moving a ball feeder across the substrate, the ball feeder having a plurality of apertures spaced apart a distance that corresponds to a spacing, in one dimension, of the openings, and dropping a single solder ball in each of the plurality of openings in the resist layer as the ball feeder moves across the respective openings; and
forming a solder bump on a contact pad corresponding to each of the plurality of openings by reflowing the plurality of solder balls in the respective openings.
11. The method of claim 10 , comprising depositing flux in each of the plurality of openings prior to position a solder ball in each of the plurality of openings.
12. The method of claim 11 wherein the depositing flux comprises depositing a layer of flux over the resist layer, and cleaning flux from a surface of the resist layer while leaving flux in each of the openings.
13. The method of claim 10 wherein the positioning a solder ball in each of the plurality of openings comprises moving a ball feeder across the resist layer so that feed apertures of the ball feeder align, in sequence, with individual rows of the openings.
14. A method comprising:
positioning a solder ball in each of a plurality of openings formed in a resist layer, each opening being spaced above a respective contact pad of an integrated circuit package, the positioning including:
by moving a ball feeder across the substrate, the ball feeder having a plurality of apertures spaced apart a distance that corresponds to a spacing, in one dimension, of the contact pads of the substrate; and
dropping solder balls from the apertures of openings in the resist layer as the ball feeder moves across the respective openings; and
forming solder bumps on the contact pads corresponding to each of the plurality of openings by reflowing the plurality of solder balls in the respective openings.
15. The method of claim 14 comprising, prior to positioning the solder balls in the openings, depositing flux paste in each of the plurality of openings.