Coating compositions for use with an overcoated photoresist
View Patent ↗Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
1. A coated substrate comprising:
(a) a layer of a coating composition on a substrate, the coating composition comprising a polyester resin that comprises one or more uracil moieties,
wherein the composition coating layer further comprises phenyl or anthacene groups, or where the uracil moieties are halogen-substituted; and
(b) a photoresist layer over the coating composition layer.
2. The substrate of claim 1 wherein the resin further comprises one or more cyanurate groups.
3. The substrate of claim 1 wherein the coating composition further comprises phenyl or anthracene groups.
4. A method of forming a photoresist relief image, comprising:
(a) applying a coating composition on a substrate, the coating composition comprising a polyester resin that comprises one or more uracil moieties,
wherein the coating composition further comprises phenyl or anthacene groups, or where the uracil moieties are halogen-substituted;
(b) applying a photoresist composition above the coating composition layer; and
(c) exposing and developing the photoresist layer to provide a resist relief image.
5. The method of claim 4 wherein the coating composition further comprises a component that comprises phenyl or anthracene groups.
6. The method of claim 4 wherein the photoresist is exposed with 193 nm radiation.
7. The method of claim 4 wherein the applied coating composition is crosslinked prior to applying the photoresist composition.
8. An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a polyester resin that comprises one or more uracil moieties,
wherein the antireflective composition further comprises phenyl or anthacene groups, or where the uracil moieties are halogen-substituted.
9. The antireflective composition of claim 8 wherein the resin comprises phenyl groups.
10. The antireflective composition of claim 8 wherein the composition further comprises a crosslinker component.
11. The substrate of claim 1 wherein the uracil moieties correspond to the following Formula (I):
wherein R is a hydrogen or non-hydrogen substituent; and
each R1 is the same or different any may be hydrogen, a chemical bond or a non-hydrogen substituent.
12. The method of claim 4 wherein the uracil moieties correspond to the following Formula (I):
wherein R is a hydrogen or non-hydrogen substituent; and
each R1 is the same or different any may be hydrogen, a chemical bond or a non-hydrogen substituent.
13. The composition of claim 8 wherein the uracil linkages correspond to the following Formula (I):
wherein R is a hydrogen or non-hydrogen substituent; and
each R1 is the same or different any may be hydrogen, a chemical bond or a non-hydrogen substituent.
14. The substrate of claim 1 wherein the uracil moieties are fluoro-substituted.
15. The method of claim 4 wherein the uracil moieties are fluoro-substituted.
16. The composition of claim 8 wherein the uracil moieties are fluoro-substituted.
17. The substrate of claim 11 wherein R is fluoro or nitro.
18. The method of claim 12 wherein R is fluoro or nitro.
19. The composition of claim 13 wherein R is fluoro or nitro.
20. The substrate of claim 1 wherein the uracil moieties are halogen-substituted.
21. The method of claim 4 wherein the uracil moieties are halogen-substituted.
22. The composition of claim 8 wherein the uracil moieties are halogen-substituted.