Coating compositions for use with an overcoated photoresist
View Patent ↗Organic coating compositions, particularly antireflective compositions, that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and can serve as a planarizing, conformal or via-fill layer.
1. A coated substrate comprising:
(a) a layer of a coating composition on a substrate, the coating composition comprising a polyester resin component that comprises 1) one or more parabanic acid moieties; 2)one or more cyanurate groups; and 3) one or more uracil groups; and
(b) a photoresist layer over the coating composition layer.
2. A method of forming a photoresist relief image, comprising:
(a) applying a coating composition on a substrate, the coating composition comprising a polyester resin component that comprises 1) one or more parabanic acid moieties; 2) one or cyanurate groups; and 3) one or more uracil groups;
(b) applying a photoresist composition above the coating composition layer; and
(c) exposing and developing the photoresist layer to provide a resist relief image.
3. The method of claim 2 wherein the coating composition comprises a component that comprises phenyl or anthracene groups.
4. The method of claim 2 wherein the photoresist is exposed with 193 nm radiation.
5. The method of claim 2 wherein the applied coating composition is crosslinked prior to applying the photoresist composition.