Method of forming a semiconductor structure
View Patent ↗A method of forming a semiconductor structure comprises forming a first layer of silicon and then forming a second, silicon germanium, layer adjacent the silicon layer. A thin third layer of silicon is then formed adjacent the second layer. A gate structure is then formed upon the third layer of silicon using convention Complementary Metal Oxide Semiconductor processes. Trenches are then formed into the second layer and the structure is then exposed to a thermal gaseous chemical etchant, for example heated hydrochloric acid. The etchant removes the silicon germanium, thereby forming a Silicon-On-Nothing structure. Thereafter, conventional CMOS processing techniques are applied to complete the structure as a Metal Oxide Semiconductor Field Effect Transistor, including the formation of spacer walls from silicon nitride, the silicon nitride also filling a cavity formed beneath the third layer of silicon by removal of the silicon germanium.
1. A device comprising:
a first material layer;
a second material layer disposed over the first material layer;
a third material layer disposed over the second material layer;
a gate insulator layer disposed over the third material layer;
a gate electrode layer disposed over the gate insulator layer;
wherein the third material layer defines first and second trenches on opposite sides of the gate insulator layer and extending through the third material layer;
wherein the second material layer defines a region free of a semiconductor material of the second material layer and extending between the first and third material layers under the gate insulator layer; and
an insulator structure disposed in the region defined by the second material layer, extending through the first and second trenches of the third material layer, and forming sidewalls adjacent the gate insulator layer and the electrode layer.
2. The device of claim 1 , wherein a semiconductor material of the first material layer is different from the semiconductor material of the second material layer.
3. The device of claim 1 , wherein a semiconductor material of the third material layer is different from the semiconductor material of the second material layer.
4. The device of claim 1 , wherein the first material layer comprises silicon.
5. The device of claim 1 , wherein the third material layer comprises silicon.
6. The device of claim 1 , wherein the second material layer comprises silicon-germanium.
7. The device of claim 1 , wherein the first material layer forms a substrate.
8. The device of claim 1 , wherein the insulator structure includes a nitride of silicon.
9. The device of claim 1 , wherein the gate insulator layer comprises silicon dioxide.
10. The device of claim 1 , further comprising a source region and a drain region formed in the third material layer on opposite sides of the gate insulator layer from each other and on different sides than the first and second trenches.
11. A device comprising:
a first material layer;
a second material layer disposed over the first material layer, the second material layer comprising silicon-germanium;
a third material layer disposed over the second material layer, the third material layer comprising silicon;
a gate structure disposed over the third material layer, the gate structure comprising:
a gate insulator layer disposed over the third material layer; and
a gate electrode layer disposed over the gate insulator layer;
wherein the third material layer defines first and second trenches on opposite sides of the gate structure and extending through the third material layer;
wherein the second material layer defines a region free of a semiconductor material of the second material layer and extending between the first and third material layers under the gate structure; and
an insulator structure disposed in the region defined by the second material layer, extending through the first and second trenches of the third material layer, and forming sidewalls adjacent the gate structure.
12. The device of claim 11 , wherein a semiconductor material of the first material layer is different from the semiconductor material of the second material layer.
13. The device of claim 11 , wherein the first material layer comprises silicon.
14. The device of claim 11 , wherein the first material layer forms a substrate.
15. The device of claim 11 , wherein the insulator structure includes a nitride of silicon.
16. The device of claim 11 , wherein the gate insulator layer comprises silicon dioxide.
17. The device of claim 11 , further comprising a source region and a drain region formed in the third material layer on opposite sides of the gate structure from each other and on different sides than the first and second trenches.
18. A device comprising:
a first material layer;
a second material layer disposed over the first material layer;
a third material layer disposed over the second material layer;
a first gate structure including:
a gate insulator layer disposed over the third material layer; and
a gate electrode layer disposed over the gate insulator layer;
wherein the third material layer defines first and second trenches on opposite sides of the first gate structure and extending through the third material layer;
wherein the second material layer defines a region free of a semiconductor material of the second material layer and extending between the first and third material layers under the first gate structure; and
a second gate structure disposed in the region defined by the second material layer.
19. The device of claim 18 , wherein the second material layer comprises silicon-germanium.
20. The device of claim 18 , wherein the second gate structure includes conductive polysilicon.