Granted Patent B1

US 8,513,356 · App. 13/370,571 · Granted Aug 20, 2013

Abstract

Claims (118)

1. A diblock copolymer blend, comprising:

>50 wt % to 99 wt % (on a solids basis) of an ordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer, BCP1, having a polystyrene volume fraction, Vf BCP1-PS , of 0.65 to 0.87; and, wherein the following expression is true

χ

⁢

⁢

N

BCP

⁢

⁢

1

>

[

1.6

Vf

BCP

⁢

⁢

1

-

PS

*

(

1

-

VF

BCP

⁢

⁢

1

-

PS

)

-

0.098

]

wherein χN BCP1 is the product of the Flory-Huggins interaction parameter, χ BCP1 , of BCP1 at 225° C. and the degree of polymerization, N BCP1 , of BCP1;

and,

1 to <50 wt % (on a solids basis) of a disordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer, BCP2, having a polystyrene volume fraction, Vf BCP2-PS , of 0.5 to 0.99; and, wherein the following expression is true

χ

⁢

⁢

N

BCP

⁢

⁢

2

<

[

2.6

Vf

BCP

⁢

⁢

2

-

PS

*

(

1

-

VF

BCP

⁢

⁢

2

-

PS

)

]

wherein χN BCP2 is the product of the Flory-Huggins interaction parameter, χ BCP2 , of BCP2 at 225° C. and the degree of polymerization, N BCP2 , of BCP2;

wherein the number average molecular weight of BCP1, M N-BCP1 , is 30 to 500 kg/mol;

wherein the number average molecular weight of BCP2, M N-BCP2 is 0.1 to <500 kg/mol; and,

wherein M N-BCP1 >M N-BCP2 .

2. The diblock copolymer blend of claim 1 , wherein the BCP1 exhibits a number average molecular weight, M N-BCP1 , of 30 to 500 kg/mol with a polydispersity, PD BCP1 , of 1 to 2.

3. The diblock copolymer blend of claim 1 , wherein the BCP2 exhibits a number average molecular weight, M N-BCP2 , of 0.1 to <500 kg/mol with a polydispersity, PD BCP2 , of 1 to 2.

4. The diblock copolymer blend of claim 1 ,

wherein the BCP1 exhibits a number average molecular weight, M N-BCP1 , of 30 to 500 kg/mol with a polydispersity, PD BCP1 , of 1 to 2; and,

wherein the BCP2 exhibits a number average molecular weight, M N-BCP2 , of 0.1 to <500 kg/mol with a polydispersity, PD BCP2 , of 1 to 2.

5. The diblock copolymer blend of claim 1 , wherein the following equation is satisfied:

0.20

≥



Vf

BCP

⁢

⁢

1

-

PS

-

Vf

BCP

⁢

⁢

2

-

PS

Vf

BCP

⁢

⁢

1

-

PS



.

6. The diblock copolymer blend of claim 1 , further comprising a solvent; wherein the solvent is selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), ethoxyethyl propionate, anisole, ethyl lactate, 2-heptanone, cyclohexanone, amyl acetate, γ-butyrolactone (GBL), n-methylpyrrolidone (NMP) and toluene.

7. The diblock copolymer blend of claim 1 , further comprising an additive; wherein the additive is selected from the group consisting of additional polymers (including homopolymers and random copolymers); surfactants; antioxidants; photoacid generators; thermal acid generators; quenchers; hardeners; adhesion promoters; dissolution rate modifiers; photocuring agents; photosensitizers; acid amplifiers; plasticizers; orientation control agents and cross linking agents.

8. The diblock copolymer blend of claim 1 , further comprising an orientation control agent.

9. A method comprising:

providing a substrate having a surface;

providing a diblock copolymer blend according to claim 1 ;

applying a film of the diblock copolymer blend to the surface of the substrate;

optionally, baking the film;

annealing the film;

treating the annealed film to remove the poly(methyl methacrylate), providing a product film with a plurality of perpendicular, cylindrical holes;

wherein each of the perpendicular, cylindrical holes exhibit an axis of symmetry that is perpendicular to the surface of the substrate.

10. The method of claim 9 , wherein the product film exhibits a degree of perpendicular, cylindrical hole orientation, D perp , of ≧0.95 to 1.

Assignments (6)