Block copolymer and methods relating thereto
View Patent ↗A copolymer composition including a block copolymer having a poly(methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block is provided; wherein the block copolymer exhibits a number average molecular weight, M N , of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
1. A copolymer composition, comprising:
a block copolymer having a poly(methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block;
wherein the block copolymer exhibits a number average molecular weight, M N , of 1 to 1,000 kg/mol; and,
wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2.
2. The copolymer composition of claim 1 , wherein the block copolymer exhibits a film pitch, L 0 , of 10 to 100 nm.
3. The copolymer composition of claim 1 , wherein the block copolymer exhibits a film pitch, L 0 , of 20 to 40 nm.
4. The copolymer composition of claim 1 , wherein the block copolymer is a poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer.
5. The copolymer composition of claim 4 , wherein the diblock copolymer has a poly(methyl methacrylate) volume fraction, Wf PMMA , of 0.69 to 0.83.
6. The copolymer composition of claim 4 , wherein the diblock copolymer has a poly(methyl methacrylate) volume fraction, Wf PMMA , of 0.39 to <0.69.
7. The copolymer composition of claim 4 , wherein the diblock copolymer has a poly(methyl methacrylate) volume fraction, Wf PMMA , of 0.23 to <0.39.
8. The copolymer of composition claim 1 , further comprising a solvent; wherein the solvent is selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), ethoxyethyl propionate, anisole, ethyl lactate, 2-heptanone, cyclohexanone, amyl acetate, γ-butyrolactone (GBL), n-methylpyrrolidone (NMP) and toluene.
9. The copolymer composition of claim 1 , further comprising an additive; wherein the additive is selected from the group consisting of additional polymers; surfactants; antioxidants; photoacid generators; thermal acid generators; quenchers; hardeners; adhesion promoters; dissolution rate modifiers; photocuring agents; photosensitizers; acid amplifiers; plasticizers; orientation control agents and cross linking agents.
10. A method comprising:
providing a substrate;
providing a copolymer composition according to claim 1 ;
applying a film of the copolymer composition to the substrate;
optionally, baking the film;
annealing the film;
treating the annealed film to remove the poly(methyl methacrylate) from the annealed film and to convert the (trimethylsilyl)methyl methacrylate in the annealed film to an etch resistant species.