Ferromagnetic material sputtering target
View Patent ↗A ferromagnetic material sputtering target made of metal having a composition containing 20 mol % or less of Cr, and Co as the remainder thereof, wherein the structure of the target includes a metallic substrate (A), and, in the metallic substrate (A), a spherical phase (B) containing 90 wt % or more of Co in which the difference between the longest diameter and the shortest diameter is 0 to 50%. Provided is a ferromagnetic material sputtering target capable of improving the leakage magnetic flux to obtain a stable electrical discharge with a magnetron sputtering device.
1. A ferromagnetic material sputtering target having a composition comprising metal elements including 20 mol % or less of Cr and Co as the remainder, wherein the sputtering target has a structure comprising a metallic matrix (A) and a metallic phase (B) dispersed in the metallic matrix (A), the metallic phase (B) having a Co content of 90 wt % or more and being in a form of a plurality of separate spherical, pseudo-spherical, oblate spheroidal, or pseudo-oblate spheroidal shaped particles such that a difference in length of a shortest diameter of each of the metallic phase (B) particles and a longest diameter of each the metallic phase (B) particles is 0 to 50% of the longest diameter, wherein a maximum magnetic permeability of the metallic phase (B) is higher than that of the metal matrix (A) surrounding the metallic phase (B), wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 20 vol % or more of a total volume of the sputtering target, and wherein each of the particles of the metallic phase (B) has a size of 30 to 150 μm.
2. The ferromagnetic material sputtering target according to claim 1 , wherein the sputtering target further contains 0.5 mol % or more and 10 mol % or less in total of one or more elements as additive elements selected from B, Ti, V, Mn, Zr, Nb, Ru, Mo, Ta and W.
3. The ferromagnetic material sputtering target according to claim 2 , wherein the metallic matrix (A) further contains a dispersion of inorganic particles of one or more inorganic substances selected from the group consisting of carbon, oxides, nitrides and carbides.
4. The ferromagnetic material sputtering target according to claim 3 , wherein the sputtering target has a relative density of 98% or more.
5. The ferromagnetic material sputtering target according to claim 1 , wherein the metallic matrix (A) further contains a dispersion of inorganic particles of one or more inorganic substances selected from the group consisting of carbon, oxides, nitrides and carbides.
6. The ferromagnetic material sputtering target according to claim 1 , wherein the sputtering target has a relative density of 98% or more.
7. The ferromagnetic material sputtering target according to claim 1 , wherein the sputtering target has an average leakage magnetic flux of 51% to 60%.
8. The ferromagnetic material sputtering target according to claim 7 , wherein the sputtering target has a thickness of about 7 mm.
9. The ferromagnetic material sputtering target according to claim 1 , wherein the metallic phase (B) has a Co content of 95 wt % or more.
10. The ferromagnetic material sputtering target according to claim 1 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 50 vol % or more of the total volume of the sputtering target.
11. The ferromagnetic material sputtering target according to claim 1 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 60 vol % or more of the total volume of the sputtering target.
12. A ferromagnetic material sputtering target consisting of a composition of 20 mol % or less of Cr and Co as the remainder, wherein the sputtering target has a structure comprising a metallic matrix (A) and a metallic phase (B) dispersed in the metallic matrix (A), the metallic phase (B) having a Co content of 90 wt % or more and being in a form of a plurality of separate spherical, pseudo-spherical, oblate spheroidal, or pseudo-oblate spheroidal shaped particles such that a difference in length of a shortest diameter of each of the metallic phase (B) particles and a longest diameter of each the metallic phase (B) particles is 0 to 50% of the longest diameter, wherein a maximum magnetic permeability of the metallic phase (B) is higher than that of the metal matrix (A) surrounding the metallic phase (B), and wherein the metallic phase B) contained in the sputtering target has as a whole a volume of 20 vol % or more of a total volume of the sputtering target.
13. The ferromagnetic material sputtering target according to claim 12 , wherein the size of each of the metallic phase (B) particles is 30 to 150 μm.
14. The ferromagnetic material sputtering target according to claim 12 , wherein the target body has a relative density of 98% or more.
15. The ferromagnetic material sputtering target according to claim 12 , wherein the sputtering target has an average leakage magnetic flux of 51% to 60%.
16. The ferromagnetic material sputtering target according to claim 15 , wherein the sputtering target has a thickness of about 7 mm.
17. The ferromagnetic material sputtering target according to claim 12 , wherein the metallic phase (B) has a Co content of 95 wt % or more.
18. The ferromagnetic material sputtering target according to claim 12 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 50 vol % or more of the total volume of the sputtering target.
19. The ferromagnetic material sputtering target according to claim 12 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 60 vol % or more of the total volume of the sputtering target.
20. A ferromagnetic material sputtering target having a composition comprising metal elements including 20 mol % or less of Cr and Co as the remainder, wherein the sputtering target has a structure comprising a metallic matrix (A) and a metallic phase (B) dispersed in the metallic matrix (A), the metallic phase (B) having a Co content of 97 wt % or more and being in a form of a plurality of separate spherical, pseudo-spherical, oblate spheroidal, or pseudo-oblate spheroidal shaped particles such that a difference in length of a shortest diameter of each of the metallic phase (B) particles and a longest diameter of each the metallic phase (B) particles is 0 to 50% of the longest diameter, wherein a maximum magnetic permeability of the metallic phase (B) is higher than that of the metal matrix (A) surrounding the metallic phase (B), wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 20 vol % or more of a total volume of the sputtering target.
21. The ferromagnetic material sputtering target according to claim 20 , wherein each of the particles of the metallic phase (B) has a size of 30 to 150 μm.
22. The ferromagnetic material sputtering target according to claim 20 , wherein the sputtering target has a relative density of 98% or more.
23. The ferromagnetic material sputtering target according to claim 20 , wherein the sputtering target further contains 0.5 mol % or more and 10 mol % or less in total of one or more elements as additive elements selected from B, Ti, V, Mn, Zr, Nb, Ru, Mo, Ta and W.
24. The ferromagnetic material sputtering target according to claim 23 , wherein the metallic matrix (A) further contains a dispersion of inorganic particles of one or more inorganic substances selected from the group consisting of carbon, oxides, nitrides and carbides.
25. The ferromagnetic material sputtering target according to claim 24 , wherein the sputtering target has a relative density of 98% or more.
26. The ferromagnetic material sputtering target according to claim 20 , wherein the metallic matrix (A) further contains a dispersion of inorganic particles of one or more inorganic substances selected from the group consisting of carbon, oxides, nitrides and carbides.
27. The ferromagnetic material sputtering target according to claim 20 , wherein the sputtering target has an average leakage magnetic flux of 51% to 60%.
28. The ferromagnetic material sputtering target according to claim 27 , wherein the sputtering target has a thickness of about 7 mm.
29. The ferromagnetic material sputtering target according to claim 20 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 50 vol % or more of the total volume of the sputtering target.
30. The ferromagnetic material sputtering target according to claim 20 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 60 vol % or more of the total volume of the sputtering target.
31. A ferromagnetic material sputtering target having a composition comprising metal elements including 20 mol % or less of Cr and Co as the remainder, wherein the sputtering target has a structure comprising a metallic matrix (A) and a metallic phase (B) dispersed in the metallic matrix (A), a center portion of each of the particles of the metallic phase (B) having a Co content of 97 wt % or more and being in a form of a plurality of separate spherical, pseudo-spherical, oblate spheroidal, or pseudo-oblate spheroidal shaped particles such that a difference in length of a shortest diameter of each of the metallic phase (B) particles and a longest diameter of each the metallic phase (B) particles is 0 to 50% of the longest diameter, wherein a maximum magnetic permeability of the metallic phase (B) is higher than that of the metal matrix (A) surrounding the metallic phase (B), wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 20 vol % or more of a total volume of the sputtering target.
32. The ferromagnetic material sputtering target according to claim 31 , wherein each of the particles of the metallic phase (B) has a size of 30 to 150 μm.
33. The ferromagnetic material sputtering target according to claim 31 , wherein the sputtering target has a relative density of 98% or more.
34. The ferromagnetic material sputtering target according to claim 31 , wherein the sputtering target further contains 0.5 mol % or more and 10 mol % or less in total of one or more elements as additive elements selected from B, Ti, V, Mn, Zr, Nb, Ru, Mo, Ta and W.
35. The ferromagnetic material sputtering target according to claim 34 , wherein the metallic matrix (A) further contains a dispersion of inorganic particles of one or more inorganic substances selected from the group consisting of carbon, oxides, nitrides and carbides.
36. The ferromagnetic material sputtering target according to claim 35 , wherein the sputtering target has a relative density of 98% or more.
37. The ferromagnetic material sputtering target according to claim 31 , wherein the metallic matrix (A) further contains a dispersion of inorganic particles of one or more inorganic substances selected from the group consisting of carbon, oxides, nitrides and carbides.
38. The ferromagnetic material sputtering target according to claim 31 , wherein the sputtering target has an average leakage magnetic flux of 51% to 60%.
39. The ferromagnetic material sputtering target according to claim 38 , wherein the sputtering target has a thickness of about 7 mm.
40. The ferromagnetic material sputtering target according to claim 31 , wherein the metallic phase (B) has a Co content of 95 wt % or more.
41. The ferromagnetic material sputtering target according to claim 31 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 50 vol % or more of the total volume of the sputtering target.
42. The ferromagnetic material sputtering target according to claim 31 , wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 60 vol % or more of the total volume of the sputtering target.