IP Library › Granted Patent US 8,847,181
Granted Patent B2
US 8,847,181 · App. 13/402,277 · Granted Sep 30, 2014

System and method for generating extreme ultraviolet light

Inventors: Masato Moriya (Oyama, JP); Hideyuki Hayashi (Hiratsuka, JP); Osamu Wakabayashi (Hiratsuka, JP)
Assignee: Gigaphoton Inc.
H05G2/008H05G2/006H05G2/003
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Quick Facts
Patent No.
US 8,847,181
App. No.
13/402,277
Granted
Sep 30, 2014
Kind
B2
Abstract

Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.

Claims (56)

1. An extreme ultraviolet light generation system, comprising:

a laser apparatus configured to output a laser beam for generating extreme ultraviolet light;

a chamber provided with a window, through which the laser beam from the laser apparatus enters the chamber;

a target supply unit configured to output a target toward a predetermined position inside the chamber;

a laser beam focusing optical system positioned to reflect the laser beam toward the predetermined position inside the chamber;

a detector configured to aim at a point in a path of the laser beam downstream from the predetermined position for detecting an image of the laser beam at the predetermined position;

a target position adjusting mechanism for adjusting a direction into which the target is to be outputted;

a laser beam focus position adjusting mechanism for adjusting a focus position of the laser beam; and

a controller for controlling the target position adjusting mechanism and the laser beam focus position adjusting mechanism based on the image detected by the detector.

2. The extreme ultraviolet light generation system according to claim 1 , wherein

the image detected by the detector includes a shadow of a target, and

the controller is configured to:

calculate a difference between a target extreme ultraviolet light generation position and a position of the target based on the image detected by the detector;

control the target position adjusting mechanism based on the calculated difference;

calculate a difference between the target extreme ultraviolet light generation position and a position of the laser beam based on the image detected by the detector; and

control the laser beam focus position adjusting mechanism based on the calculated difference.

3. The extreme ultraviolet light generation system according to claim 1 , further comprising a laser beam focus adjusting unit for adjusting a divergence of the laser beam,

wherein the controller is configured to calculate a focus position of the laser beam based on the image detected by the detector and control the laser beam focus adjusting unit based on the calculated focus position.

4. The extreme ultraviolet light generation system according to claim 1 , wherein

the image detected by the detector includes a shadow of a target, and

the controller is configured to:

calculate a difference between a target extreme ultraviolet light generation position and a position of the target based on the image detected by the detector;

control a timing at which a subsequent target is to be outputted from the target supply unit based on the calculated difference;

calculate a difference between the target extreme ultraviolet light generation position and a position of the laser beam based on the image detected by the detector; and

control a timing at which a subsequent laser beam is to be outputted from the laser apparatus based on the calculated difference.

5. An extreme ultraviolet light generation system, comprising:

a first laser apparatus configured to output a first laser beam;

a second laser apparatus configured to output a second laser beam for generating extreme ultraviolet light;

a chamber provided with a window, through which the first and second laser beams respectively from the first and second laser apparatuses enter the chamber;

a target supply unit for outputting a target toward a predetermined position inside the chamber;

a laser beam focusing optical system positioned to reflect the first and second laser beams toward the predetermined position;

a detector configured to aim at a point in a path of the second laser beam downstream from the predetermined position for detecting an image of the laser beam at the predetermined position;

a target position adjusting mechanism for adjusting a direction into which the target is to be outputted;

a laser beam focus position adjusting mechanism for adjusting a focus position of at least one of the first and second laser beams; and

a controller for controlling the target position adjusting mechanism and the laser beam focus position adjusting mechanism based on the image detected by the detector.

6. A method for generating extreme ultraviolet light in a system including a laser apparatus, a chamber, a target supply unit, a laser beam focusing optical system, a detector, a target position adjusting mechanism, a laser beam focus position adjusting mechanism, and a controller, the method comprising:

detecting an image of a laser beam from the laser apparatus, the laser beam being reflected by the laser beam focusing optical system toward the predetermined position for generating the extreme ultraviolet light, the detecting step aiming at a point in a path of the laser beam downstream from the predetermined position for detecting the image of the laser beam at the predetermined position; and

controlling the target position adjusting mechanism for adjusting a direction into which a target is to be outputted and the laser beam focus position adjusting mechanism based on the detected image.

7. The method according to claim 6 , wherein

the detected image includes a shadow of a target, and

the controlling step further includes calculating a difference between a target extreme ultraviolet light generation position and a position of the target based on the detected image, and controlling the target position adjusting mechanism based on the calculated difference.

8. The method according to claim 6 , wherein the controlling step further includes calculating a difference between a target extreme ultraviolet light generation position and a position of the laser beam based on the detected image, and controlling the laser beam focus position adjusting mechanism based on the calculated difference.

9. The method according to claim 6 , wherein

a laser beam focus adjusting unit is further provided, and

the controlling step further includes calculating a focus position of the laser beam based on the detected image and controlling the laser beam focus adjusting unit based on the calculated focus position.

10. The method according to claim 6 , wherein

the detected image includes a shadow of a target, and

the controlling step further includes:

calculating a difference between a target extreme ultraviolet light generation position and a position of the target based on the detected image;

controlling a timing at which a subsequent target is to be outputted from the target supply unit based on the calculated difference;

calcualting a difference between the target extreme ultraviolet light generation position and a position of the laser beam based on the detected image; and

controlling a timing at which a subsequent laser beam is to be outputted from the laser apparatus based on the calculated difference.

11. A method for generating extreme ultraviolet light in a system including first and second laser apparatuses, a chamber, a target supply unit, a laser beam focusing optical system, a detector, a target position adjusting mechanism, a laser beam focus position adjusting mechanism, and a controller, the method comprising:

outputting first and second laser beams respectively from the first and second laser apparatuses;

detecting an image of the second laser beam from the laser apparatus, the second laser beam being reflected by the laser beam focusing optical system toward the predetermined position for generating the extreme ultraviolet light, the detecting step aiming at a point in a path of the second laser beam downstream from the predetermined position for detecting the image of the second laser beam at the predetermined position; and

controlling the target position adjusting mechanism for adjusting a direction into which the target is to be outputted and the laser beam focus position adjusting mechanism based on the detected image.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2012
From: MORIYA, MASATO; HAYASHI, HIDEYUKI; WAKABAYASHI, OSAMU
To: GIGAPHOTON INC
Reel/Frame 027743/0832 →
Priority Claims (2)
JP 2011-052917 · Mar 10, 2011 · national
JP 2011-271331 · Dec 12, 2011 · national
Continuity (1)
Related Publication 20120228525A1 · Sep 13, 2012