In situ cleaning device for lithographic apparatus
A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.
1. A lithographic apparatus which performs drawing a pattern on a substrate with a plurality of charged-particle beams, the apparatus comprising:
an optical system including, at an end of the optical system, which faces the substrate, an aperture plate having a plurality of apertures to pass the plurality of charged-particle beams; and
a cleaning unit, comprising a case including an emitting hole plate having a plurality of emitting holes, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case relative to the optical system in a state that the emitting hole plate faces the aperture plate, configured to remove contaminants deposited on the plurality of apertures, using the active species emitted from the plurality of emitting holes
wherein the plurality of apertures includes a first aperture, a second aperture and a third aperture,
wherein the plurality of emitting holes includes a first emitting hole and a second emitting hole,
wherein an interval between the first aperture and the second aperture matches an interval between the first emitting hole and the second emitting hole, and
wherein the driving mechanism is configured to move the case to a position, where the cleaning unit is capable of removing contaminants deposited on the first aperture using active species emitted from the first emitting hole, and the cleaning unit is capable of removing contaminants deposited on the second aperture using active species emitted from the second emitting hole, and then to a position where the cleaning unit is capable of removing contaminants deposited on the third aperture using active species emitted from the first emitting hole.
2. The apparatus according to claim 1 , further comprising a holder configured to hold the substrate, wherein for cleaning the aperture plate, the driving mechanism moves the case so that the emitting hole plate faces the optical system, with the holder retracted.
3. The apparatus according to claim 1 , further comprising a holder configured to hold the substrate, wherein the driving mechanism is configured to drive the holder, and for cleaning the aperture plate, the holder holds the case of the cleaning unit and the driving mechanism moves the holder to move the case.
4. The apparatus according to claim 1 , further comprising a detecting system configured to detect a position of the case relative to the optical system, wherein the driving mechanism moves the case relative to the optical system based a detection by the detecting system.
5. A method of cleaning performed in a lithographic apparatus which performs drawing a pattern on a substrate with a plurality of charged-particle beams, the apparatus comprising:
an optical system including, at an end of the optical system, which faces the substrate, an aperture plate having a plurality of apertures to pass the plurality of charged-particle beams; and
a cleaning unit, comprising a case including an emitting hole plate having a plurality of emitting holes, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case relative to the optical system in a state that the emitting hole plate faces the aperture plate, configured to remove contaminants deposited on the plurality of apertures, using the active species emitted from the plurality of emitting holes,
wherein the plurality of apertures includes a first aperture, a second aperture and a third aperture,
wherein the plurality of emitting holes includes a first emitting hole and a second emitting hole,
wherein an interval between the first aperture and the second aperture matches an interval between the first emitting hole and the second emitting hole
the method comprising:
first moving the case, by the driving mechanism, to a position where the cleaning unit is capable of removing contaminants deposited on the first aperture using active species emitted from the first emitting hole, and the cleaning unit is capable of removing contaminants deposited on the second aperture using active species emitted from the second emitting hole; and
second moving the case, after first moving the case, by the driving mechanism, to a position where the cleaning unit is capable of removing contaminants deposited on the third aperture using active species emitted from the first emitting hole.
6. The apparatus according to claim 1 , wherein
the plurality of apertures further includes a fourth aperture,
an interval between the third aperture and the fourth aperture matches the interval between the first emitting hole and the second emitting hole, and
in a state that the driving mechanism has moved the case to the position where the cleaning unit is capable of removing contaminants deposited on the third aperture using active species emitted from the first emitting hole, the cleaning unit removes contaminants deposited on the fourth aperture using active species emitted from the second emitting hole.