Multibit cell with synthetic storage layer
View Patent ↗Method for writing and reading more than two data bits to a MRAM cell comprising a magnetic tunnel junction formed from a read magnetic layer having a read magnetization, and a storage layer comprising a first storage ferromagnetic layer having a first storage magnetization, a second storage ferromagnetic layer having a second storage magnetization; the method comprising: heating the magnetic tunnel junction above a high temperature threshold; and orienting the first storage magnetization at an angle with respect to the second storage magnetization such that the magnetic tunnel junction reaches a resistance state level determined by the orientation of the first storage magnetization relative to that of the read magnetization. The method allows for storing at least four distinct state levels in the MRAM cell using only one current line to generate a writing field.
1. Method for writing and reading more than two data bits to a magnetic random access memory (MRAM) cell comprising
a magnetic tunnel junction formed from a read magnetic layer having a read magnetization, a tunnel barrier layer, and a storage layer;
the storage layer that can be freely oriented at a high temperature threshold comprising a first storage ferromagnetic layer having a first storage magnetization, a second storage ferromagnetic layer having a second storage magnetization, and a storage anti-parallel coupling layer magnetically coupling the first and second storage magnetization; the method comprising:
heating the magnetic tunnel junction to the high temperature threshold;
orienting the first and second storage magnetization; and
cooling the magnetic tunnel junction to a low temperature threshold to freeze the second storage magnetization;
said orienting the first and second storage magnetization comprises the first storage magnetization forming a predetermined angle with respect to the second storage magnetization such as to reach a predetermined state resistance level of the magnetic tunnel junction determined by the orientation of the first storage magnetization relative to the read magnetization; and in that cooling the magnetic tunnel junction comprises freezing the second storage magnetization at the predetermined angle.
2. The method according to claim 1 , wherein orienting the first and second storage magnetization comprises applying an external magnetic field, the predetermined angle being determined according to the magnitude and direction of the magnetic field.
3. The method according to claim 2 , wherein applying an external magnetic field is performed substantially parallel to the anisotropy axis of the first and second storage magnetization.
4. The method according to claim 3 , wherein said magnitude of the magnetic field is below a spin-flop value, or equal or exceeding the spin-flop value.
5. The method according to claim 2 , wherein applying an external magnetic field is performed substantially orthogonal to the anisotropy axis of the first and second storage magnetization.
6. The method according to claim 5 , wherein said magnitude of the magnetic field is varied from a saturation value of the first and second storage magnetization, and below.
7. The method according to claim 1 , wherein the magnetic tunnel junction further comprises an antiferromagnetic storage layer adapted to pin the second storage magnetization at the low temperature threshold.
8. The method according to claim 1 , wherein the read magnetization of the read layer is fixed relative to the storage magnetization direction; and further comprising passing a read current through the magnetic tunnel junction to measure a junction resistance of the magnetic tunnel junction.
9. The method according to claim 8 , wherein the magnetic tunnel junction further comprises an antiferromagnetic read layer pinning the read magnetization.
10. The method according to claim 1 , wherein the read magnetization of the read layer has a direction that can be varied freely; the method further comprising aligning the read magnetization in a first aligned direction such as to measure a first junction resistance of the magnetic tunnel junction; aligning the read magnetization in a second aligned direction such as to measure a second junction resistance of the magnetic tunnel junction; and determining a difference between the first and second junction resistance.
11. The method according to claim 10 , wherein aligning the read magnetization in a first aligned direction comprises passing a first read current having a first polarity in the current line; and aligning the read magnetization in a second aligned direction comprises passing a second read current having a second polarity in the current line.
12. The method according to claim 1 , wherein the first storage ferromagnetic layer and the second storage ferromagnetic layer are made from a CoFe, CoFeB or NiFe alloy and the storage anti-parallel coupling layer is made from a non-magnetic layer with material selected from a group consisting of ruthenium, chromium, rhenium, iridium, rhodium, silver, copper and yttrium.
13. The method according to claim 1 , wherein the first and second storage ferromagnetic layer has a thickness comprised between about 1.5 nm and about 4 nm.
14. The method according to claim 1 , wherein the storage anti-parallel coupling layer is made of ruthenium and has a thickness comprised between about 0.6 nm and about 2 nm, preferably between about 0.6 nm and about 0.9 nm or between about 1.6 nm and about 2 nm.
15. The method according to claim 6 , wherein the saturation value of the first and second storage magnetization is varied by varying thickness of the storage anti-parallel coupling layer or by varying thickness of the first and second storage layer.