Method for erasing memory cells in a flash memory device using a positive well bias voltage and a negative word line voltage
View Patent ↗A memory device of the non-volatile type including a memory array having a plurality of memory cells organized as sectors, each sector having a main word line associated with a plurality of local word lines, each local word line coupled to the main word line by a respective local word line driver circuit, each of the local word line driver circuits consisting of a first MOS transistor coupled between the respective main word line and a respective local word line and a second MOS transistor coupled between the respective local word line and a first biasing terminal.
1. A method for erasing selected memory cells in a flash memory device comprising:
biasing a p-well connected to a plurality of floating gate memory cell transistors to a positive well bias voltage;
biasing a selected main word line to a negative word line voltage and biasing a plurality of unselected main word lines to a positive word line voltage; and
selecting a plurality of word line drivers connected to respective main word lines to pass the negative word line voltage on the selected main word line to at least one selected local word line connected to gate terminals of selected ones of the floating gate memory cell transistors, and to pass the positive word line voltage on the unselected main word lines to a plurality of unselected local word lines connected to gate terminals of unselected ones of the floating gate memory cell transistors,
wherein the difference between the positive well bias voltage and the negative word line voltage is sufficient to erase the selected memory cells.
2. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 , wherein the difference between the positive well bias voltage and the positive word line voltage is insufficient to erase the unselected memory cells.
3. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the positive well bias voltage is higher than VCC.
4. The method for erasing selected memory cells in a flash memory device as claimed in claim 3 wherein the positive well bias voltage is approximately 7.5 volts.
5. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the positive well bias voltage is generated by a pump circuit.
6. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the negative word line voltage is higher in magnitude than VCC.
7. The method for erasing selected memory cells in a flash memory device as claimed in claim 6 wherein the negative word line voltage is approximately −7.5 volts.
8. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the negative word line voltage is generated by a pump circuit.
9. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the positive word line voltage is less than VCC.
10. The method for erasing selected memory cells in a flash memory device as claimed in claim 9 wherein the positive word line voltage is approximately 2.5 volts.
11. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the at least one selected local word line is a plurality of selected local word lines.
12. The method for erasing selected memory cells in a flash memory device as claimed in claim 11 wherein the plurality of selected local word lines comprises a sector.
13. The method for erasing selected memory cells in a flash memory device as claimed in claim 11 wherein the plurality of selected local word lines comprises a block.
14. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein each of the plurality of word line drivers comprises an NMOS transistor connected between a respective main word line and local word line.
15. The method for erasing selected memory cells in a flash memory device as claimed in claim 14 wherein the gate of each of the NMOS transistors is held at approximately 5 volts.
16. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein each of the plurality of floating gate memory cell transistors is connected to one of a plurality of bit lines, and each of the plurality of bit lines is floating.
17. The method for erasing selected memory cells in a flash memory device as claimed in claim 16 wherein each of the plurality of floating gate memory cell transistors is directly connected to one of the plurality of bit lines.
18. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the plurality of floating gate memory cell transistors are NOR flash memory cell transistors.
19. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the plurality of floating gate memory cell transistors are organized in a parallel flash array.
20. The method for erasing selected memory cells in a flash memory device as claimed in claim 1 wherein the plurality of floating gate memory cell transistors are organized in a serial flash array.