IP Library Granted Patent US 8,994,815
Granted Patent B2
US 8,994,815 · App. 13/523,000 · Granted Mar 31, 2015

Method of extracting contour lines of image data obtained by means of charged particle beam device, and contour line extraction device

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Quick Facts
Patent No.
US 8,994,815
App. No.
13/523,000
Granted
Mar 31, 2015
Kind
B2
Abstract

The present invention is intended to provide a contour extraction method and a contour extraction device with an objective of either suppression of unnecessary contouring processings or selective contouring of necessary portions. To attain the objective, provided are a contour extraction method, and a device, with which contours of pattern edges on an image formed based on charged particles emitted from a sample are extracted and, when contouring of a pattern located in an overlapping region provided in connecting images of plural image-capturing regions to form a synthesized image is performed, either areas of the pattern in the plurality of image-capturing regions, or a pre-set measurement portion is found, and selective contour extraction of the pattern with respect to an image of an image-capturing region is carried out either on a side where the area is large, or on a side where a measurement portion regarding the pattern is located.

Claims (17)

1. A contour line extraction method extracting contour lines of pattern edges on an image formed based on charged particles emitted from a sample due to irradiation of a charged particle beam, comprising:

a step of performing contouring of a pattern located in an overlapping region provided in connecting images of a plurality of image-capturing regions to form a synthesized image, which further comprises:

a step of finding either areas of said pattern in said plurality of image-capturing regions, or a portion of measurement set in advance; and

a step of carrying out selective contour line extraction of said pattern with respect to an image of an image-capturing region either on a side where said area is large, or on a side where a portion of measurement regarding said pattern is located.

2. The contour line extraction method according to claim 1 , wherein said overlapping region is a connecting region between a plurality of image-capturing regions.

3. The contour line extraction method according to claim 1 , wherein information pertaining to an area of a pattern located in said overlapping region is read out from design data of said sample to find areas of said pattern in said plurality of image-capturing regions.

4. The contour line extraction method according to claim 3 , wherein regarding said plurality of image-capturing regions, areas of said pattern are found to selectively perform contour line extraction of said pattern regarding an image of an image-capturing region for which said area is large and not to perform contour line extraction regarding rest of images of image-capturing regions.

5. A contour line extraction device comprising an arithmetic device extracting contour lines of a pattern displayed in an image from said image formed based on charged particles emitted from a sample due to irradiation of a charged particle beam; said arithmetic device finding either areas of said pattern in said plurality of image-capturing regions, or a portion of measurement set in advance, when contouring of a pattern located in an overlapping region provided in connecting images of a plurality of image-capturing regions to form a synthesized image is performed, so that selective contour line extraction of said pattern with respect to an image of an image-capturing region is carried out either on a side where said area is large, or on a side where a portion of measurement regarding said pattern is located.

6. The contour line extraction device according to claim 5 , wherein said overlapping region is a connecting region between a plurality of image-capturing regions.

7. The contour line extraction device according to claim 5 , wherein said arithmetic device reads out information pertaining to an area of a pattern located in said overlapping region from design data of said sample to find areas of said pattern in said plurality of image-capturing regions.

8. The contour line extraction device according to claim 7 , wherein said arithmetic device finds areas of said pattern regarding said plurality of image-capturing regions to selectively perform contour line extraction of said pattern regarding an image of an image-capturing region for which said area is large and not to perform contour line extraction regarding rest of images of image-capturing regions.

9. A computer program product comprising a non-transitory computer readable medium having a computer readable program code embodied therein, the computer readable program code configured to perform operations comprising:

accessing a storage medium storing design data of a semiconductor device or being provided with a storage medium storing said design data,

extracting contour lines of a pattern displayed in an image from said image formed based on charged particles emitted from a sample due to irradiation of a charged particle beam, and

when contouring of a pattern located in an overlapping region provided in connecting images of a plurality of image-capturing regions to form a synthesized image is performed,

finding either areas of said pattern in said plurality of image-capturing regions, or a portion of measurement set in advance; and

carrying out selective contour line extraction of said pattern with respect to an image of an image-capturing region either on a side where said area is large, or on a side where a portion of measurement regarding said pattern is located.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2012
From: MITO, HIROAKI; MATSUOKA, RYOICHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029245/0687 →