Semiconductor cleaner systems and methods
View Patent ↗In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10 −6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.
1. A system for cleaning a workpiece, the system comprising:
a first station configured so as to maintain a dirty environment at the first station commensurate with a dirtiest surface of a dirty workpiece held at the first station, wherein the first station comprises an input for receiving the dirty workpiece and a first robotic mechanism for transferring the dirty workpiece;
a second station, wherein the second station comprises a second robotic mechanism for transferring the workpiece and an output separate and distinct from the input of the first station,
wherein the first or the second robotic mechanism comprises one or more arms for transferring the workpiece; and
a cleaning chamber, wherein the cleaning chamber has an operable workpiece interface within the cleaning chamber to clean the workpiece,
wherein the cleaning chamber comprises an entrance, wherein the entrance is operable for enabling the dirty workpiece to be transferred uncleaned from the first station to the cleaning chamber by the first robotic mechanism,
wherein the cleaning chamber comprises an exit, wherein the exit is operable for enabling the workpiece to be transferred cleaned from the cleaning chamber to the second station by the second robotic mechanism;
wherein the second station is isolated from the first station, and
wherein the second station includes an environmental control system that generates an environment within the second station that is cleaner than the dirty environment of the first station and the output effects egress of the cleaned workpiece from the system commensurate with the cleaner environment of the second station independent from the dirty environment of the first station.
2. A system as in claim 1 further comprising multiple chambers for cleaning multiple workpieces.
3. A system as in claim 1 further comprising an input load port coupled to the first station for accepting the workpiece to be transferred to the cleaning chamber.
4. A system as in claim 1 further comprising an output load port coupled to the second station for accepting the workpiece from the cleaning chamber.
5. A system as in claim 1 wherein the entrance and exit of the cleaning chamber are not open at a same time to provide isolation of the first station from the second station.
6. A system as in claim 1 further comprising a mechanism to establish a flow from the second station to the cleaning chamber during the opening of the exit or from the cleaning chamber to the first station during the opening of the entrance.
7. A system as in claim 1 wherein the first station comprises filter laminar flow coupled to an outside ambient.
8. A system as in claim 1 wherein the second station comprises filter recirculation gas flow with raised floor and chiller.
9. A system as in claim 1 further comprising a mechanism to establish a curtain flow at the exit of the cleaning chamber.
10. A system for cleaning a workpiece, the system comprising:
a first station having a dirty environment commensurate with a dirtiest surface of a dirty workpiece held at the first station, the first station including an input for receiving the dirty workpiece from a first environment and a first robotic mechanism configured to transfer the dirty workpiece;
a cleaning chamber having a workpiece interface, within the cleaning chamber, configured to clean the dirty workpiece, the cleaning chamber including
an entrance through which the dirty workpiece is passed in an uncleaned state from the first station to the cleaning chamber by the first robotic mechanism, and
an exit through which the workpiece is passed in a cleaned state from the cleaning chamber; and
a second station isolated from the first station, the second station including
a second robotic mechanism configured to transfer the cleaned workpiece from the cleaning chamber to the second station,
an environmental control system configured to generate a clean environment within the second station, the clean environment being cleaner than the dirty environment of the first station, and
an output separate and distinct from the input of the first station, the output configured to effect egress of the workpiece from the system, independent from the first environment, to a second environment sharing the clean environment of the second station.
11. The system of claim 10 , wherein the first or the second robotic mechanism comprises one or more arms for transferring the workpiece.