System and method for separating a main pulse and a pre-pulse beam from a laser source
View Patent ↗A dichroic beam splitter module is disclosed for separating a main pulse laser beam from a pre-pulse laser beam each traversing a common beam path. In one embodiment, two dichroic elements are physically aligned along the beam path and are configured to pass the pre-pulse, a laser light having a first wavelength, to target material located near an irradiation site yet reflect the main pulse, a laser light having a second wavelength. The reflected main pulse is then further reflected by two reflective elements or mirrors from the first dichroic element to the second dichroic element and then on to the irradiation site. In alternative embodiments, the first mirror is deformable to alter beam characteristics of the reflected main pulse beam and the second mirror is adjustable to align the main pulse beam to the irradiation site.
1. A system comprising;
a laser source configured to produce a first laser light having a first wavelength along a beam path and configured to produce a second laser light having a second wavelength along the beam path;
and
a beam splitter module comprising:
a first dichroic element configured to receive the first laser light along the beam path and pass the first laser light having the first wavelength, the first dichroic element further configured to receive the second laser light along the beam path and reflect the second laser light having the second wavelength,
a first mirror configured to receive the second laser light reflected from the first dichroic element and reflect the received second laser light,
a second mirror configured to receive the second laser light reflected from the first mirror and reflect the received second laser light,
and
a second dichroic element configured to receive from the first dichroic element the first laser light and pass the first laser light having the first wavelength and configured to receive the second laser light reflected from the second mirror and reflect the second laser light having the second wavelength.
2. The system of claim 1 wherein the laser source is a seed laser.
3. The system of claim 1 wherein the second dichroic element configured to pass the first laser light having the first wavelength is configured to pass the first laser light to target material near an irradiation site.
4. The system of claim 3 wherein the second dichroic element configured to reflect the second laser light having the second wavelength is configured to reflect the second laser light to the irradiation site.
5. The system of claim 4 wherein the first laser light is a pre-pulse beam and the second laser light is a main pulse beam.
6. The system of claim 5 wherein the first dichroic element configured to pass the first laser light having the first wavelength and reflect the second laser light having the second wavelength and the second dichroic element configured to pass the first laser light having the first wavelength and reflect the second laser light having the second wavelength are each accomplished by a dichroic coating on the first dichroic element and the second dichroic element.
7. The system of claim 1 wherein the first mirror has a flat reflective surface.
8. The system of claim 1 wherein the first mirror has a curved reflective surface.
9. The system of claim 1 wherein the second mirror has a flat reflective surface.
10. The system of claim 1 wherein the second mirror has a curved reflective surface.
11. The system of claim 1 wherein the first mirror is a deformable mirror.
12. The system of claim 1 wherein the second mirror is an adjustable mirror.
13. The system of claim 1 wherein the first mirror is an adjustable mirror.
14. The system of claim 1 wherein the second mirror is a deformable mirror.
15. The system of claim 1 wherein the first mirror is both an adjustable mirror and a deformable mirror.
16. The system of claim 1 wherein the second mirror is both an adjustable mirror and a deformable mirror.
17. The system of claim 1 wherein the first dichroic element is adjustable.
18. The system of claim 1 wherein the second dichroic element is adjustable.
19. A method comprising:
generating a laser pre-pulse haying a first wavelength along a beam path;
passing the laser pre-pulse through a first dichroic element and a second dichroic element to target material near an irradiation site;
generating a laser main pulse having a second wavelength along the beam path;
reflecting the laser main pulse by the first dichroic element to a first mirror;
reflecting the laser main pulse from the first mirror to a second mirror;
reflecting the laser main pulse from the second mirror to the second dichroic element; and
reflecting the laser main pulse from the second dichroic element to the irradiation site.
20. The method of claim 19 , wherein reflecting the laser main pulse from the first mirror to the second mirror further comprises dynamically changing a shape of the first mirror to alter beam characteristics of the reflected laser main pulse.
21. The method of claim 19 , wherein reflecting the laser main pulse from the second mirror to the second dichroic element further comprises adjusting the second mirror to align the laser main pulse to the irradiation site.
22. The method of claim 19 wherein reflecting the laser main pulse from the first mirror to the second mirror further comprises adjusting the first mirror to align the laser main pulse to the irradiation site.
23. The method of claim 19 wherein reflecting the laser main pulse from the second mirror to the second dichroic element further comprises dynamically changing a shape of the second mirror to alter beam characteristics of the reflected laser main pulse.
24. A non-transitory computer-readable medium having embodied thereon a program, the program being executable by a processor to perform a method of protecting a laser pulse source from pulse reflections, the method comprising the steps of:
generating a laser pre-pulse having a first wavelength along a beam path;
passing the laser pre-pulse through a through a first dichroic element and a second dichroic element to target material near an irradiation site;
generating a laser main pulse having a second wavelength along the beam path;
reflecting the laser main pulse by the first dichroic element to a first mirror;
reflecting the laser main pulse from the first mirror to a second mirror;
reflecting the laser main pulse from the second mirror to the second dichroic element; and
reflecting the laser main pulse from the second dichroic element to the irradiation site.