Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cup

1. A substrate liquid processing apparatus configured to perform a liquid process on a substrate with a processing solution, the substrate liquid processing apparatus comprising:

a substrate rotation unit configured to hold and rotate a substrate within a processing space;

a processing solution supply unit configured to selectively supply plural kinds of processing solutions to the substrate;

a collection cup configured to collect the processing solutions supplied to the substrate;

a plurality of liquid collection regions formed at the collection cup and configured to collect the processing solutions;

at least one liquid drain opening formed at a bottom portion of the collection cup and configured to discharge the processing solutions collected in the liquid collection regions;

at least one exhaust opening formed above the at least one liquid drain opening of the collection cup;

at least one fixed cover fixed to the collection cup and configured to cover an upper portion of the at least one exhaust opening with a predetermined space therebetween, such that the at least one exhaust opening is entirely covered by the at least one fixed cover when viewed from above;

at least one elevating cup provided above the at least one fixed cover and configured to guide the processing solutions supplied to the substrate into the liquid collection regions; and

at least one cup elevating unit configured to move up and down the at least one elevating cup with respect to the at least one fixed cover depending on the kinds of the processing solutions,

wherein the at least one fixed cover is includes at least one supporting protrusion at a top portion thereof,

the at least one elevating cup includes at least one supporting recess at a bottom portion thereof, and

the at least one supporting protrusion of the at least one fixed cover is configured to be inserted into the at least one supporting recess of the at least one elevating cup, and

the predetermined space between the at least one fixed cover and the at least one exhaust opening is maintained constant when the at least one elevating cup moves up and down.

2. The substrate liquid processing apparatus of claim 1 ,

wherein the at least one liquid drain opening is plural in number, the liquid drain openings are respectively formed at bottom portions of the liquid collection regions, and the number of the liquid drain openings corresponds to the number of the kinds of the processing solutions supplied from the processing solution supply unit.

3. The substrate liquid processing apparatus of claim 2 ,

wherein the at least one cup elevating unit moves up and down the at least one elevating cup, so that the processing space communicates with one of the liquid drain openings.

4. The substrate liquid processing apparatus of claim 1 ,

wherein when the at least one elevating cup is moved up, a lower end of the at least one supporting recess is positioned to be lower than an upper end of the at least one fixed cover.

5. The substrate liquid processing apparatus of claim 1 ,

wherein at least one cover member protruding toward an upper area and a side area of the at least one exhaust opening is provided at the at least one fixed cover.

6. The substrate liquid processing apparatus of claim 1 ,

wherein the at least one exhaust opening is plural in number, and the exhaust openings communicate with each other at a bottom portion of the collection cup.

7. The substrate liquid processing apparatus of claim 1 ,

wherein the at least one exhaust opening is provided between adjacent the liquid collection regions.

8. The substrate liquid processing apparatus of claim 1 ,

wherein the liquid collection regions are partitioned by at least one partition wall at which the at least one exhaust opening is formed.