High temperature thermal annealing process
View Patent ↗A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiO x .
1. A method for processing a substrate, comprising:
providing a substrate having a surface;
providing a copolymer composition, comprising:
a poly(styrene)-b-poly(siloxane) block copolymer component, wherein the number average molecular weight of the poly(styrene)-b-poly(siloxane) block copolymer component is 5 to 1,000 kg/mol; and,
an antioxidant;
applying a film of the copolymer composition to the surface of the substrate;
optionally, baking the film;
annealing the film by heating the film at 275 to 350° C. under a gaseous atmosphere for a period of 1 second to 4 hours; and,
treating the annealed film to remove the poly(styrene) block from the annealed film and to convert the poly(siloxane) block in the annealed film to SiO x .
2. The method of claim 1 , wherein the antioxidant is selected from the group consisting of:
an antioxidant containing at least one 2,6-di-tert-butylphenol moiety;
an antioxidant containing at least one moiety according to the formula
an antioxidant containing at least one moiety according to the formula
an antioxidants containing at least one moiety according to the formula
and,
mixtures thereof.
3. The method of claim 1 , wherein the antioxidant component is an antioxidant selected from the group consisting of
and,
mixtures thereof.
4. The method of claim 2 , wherein the poly(styrene)-b-poly(siloxane) block copolymer component provided is a single poly(styrene)-b-poly(siloxane) diblock copolymer having a number average molecular weight, M N , of 25 to 1,000 kg/mol; a polydispersity, PD, of 1 to 3; and a poly(siloxane) weight fraction, Wf PSi , of 0.19 to 0.33.
5. The method of claim 4 , wherein the copolymer composition provided further comprises a solvent; wherein the solvent is selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), ethoxyethyl propionate, anisole, ethyl lactate, 2-heptanone, cyclohexanone, amyl acetate, γ-butyrolactone (GBL), n-methylpyrrolidone (NMP) and toluene.
6. The method of claim 2 , wherein the poly(styrene)-b-poly(siloxane) block copolymer component is a blend of at least two different poly(styrene)-b-poly(siloxane) block copolymers;
wherein the at least two different poly(styrene)-b-poly(siloxane) block copolymers are selected from the group of poly(styrene)-b-poly(siloxane) block copolymers having a number average molecular weight, M N , of 1 to 1,000 kg/mol and a polydispersity, PD, of 1 to 3; and,
wherein the blend exhibits a blend number average molecular weight, M N-Blend , of 25 to 1,000 kg/mol.
7. The method of claim 6 , wherein the blend exhibits a blend poly(siloxane) weight fraction, Wf PSi-Blend , of 0.19 to 0.33.
8. The method of claim 7 , wherein the copolymer composition provided further comprises a solvent; wherein the solvent is selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), ethoxyethyl propionate, anisole, ethyl lactate, 2-heptanone, cyclohexanone, amyl acetate, γ-butyrolactone (GBL), n-methylpyrrolidone (NMP) and toluene.
9. The method of claim 1 , wherein the gaseous atmosphere is a nitrogen atmosphere having ≦100 ppm oxygen.