IP Library Granted Patent US 9,018,743
Granted Patent B2
US 9,018,743 · App. 13/566,082 · Granted Apr 28, 2015

Semiconductor device

Inventors: Min Jae Lee (Seoul, KR); You Shin Chung (Chungcheongnam-do, KR); Hoon Jung (Gwangju, KR)
H01L24/17H05K3/303H05K3/3452H05K2201/09418H05K2201/10674H05K2201/10977H05K2203/166H01L2224/73204H01L2224/14133H01L2224/16105H01L23/49838H01L24/14H01L24/16H01L2224/05567H01L2224/13014H01L2224/13022H01L2224/13082H01L2224/13147H01L2224/1412H01L2224/81191H01L2224/81203H01L2224/814H01L2224/81815H01L2224/131H01L2224/16238H01L23/49816H01L2924/00014H01L2224/05553
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Quick Facts
Patent No.
US 9,018,743
App. No.
13/566,082
Granted
Apr 28, 2015
Kind
B2
Abstract

Provided is a semiconductor device in which misalignment between a semiconductor die and a substrate (e.g., a circuit board) can be prevented or substantially reduced when the semiconductor die is attached to the circuit board. In a non-limiting example, the semiconductor device includes: a semiconductor die comprising at least one bump; and a circuit board comprising at least one circuit pattern to which the bump is electrically connected. In a non-limiting example, the circuit board comprises: an insulation layer comprising a center region and peripheral regions around the center region; a plurality of center circuit patterns formed in the center region of the insulation layer; and a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer. The center circuit patterns may be formed wider than the peripheral circuit patterns, formed in a zigzag pattern, and/or may be formed in a crossed shape.

Claims (84)

1. A semiconductor device comprising:

a semiconductor die comprising at least one bump; and

a circuit board comprising at least one circuit pattern to which the bump is electrically connected, wherein the circuit board comprises:

an insulation layer comprising a center region and peripheral regions around the center region;

a plurality of center circuit patterns formed in the center region of the insulation layer;

a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer; and

a protection layer,

wherein the center circuit patterns are wider than the peripheral circuit patterns, and

wherein the peripheral circuit patterns comprise:

first-direction peripheral circuit patterns disposed in mutually-facing first peripheral regions and running parallel with a first direction, wherein a respective exposed portion of each of the first-direction peripheral circuit patterns is exposed through a respective opening in the protection layer and runs parallel with the first direction; and

second-direction peripheral circuit patterns disposed in mutually-facing second peripheral regions different from the first peripheral regions, the second-direction peripheral circuit patterns running parallel with a second direction different from the first direction, wherein a respective exposed portion of each of the second-direction peripheral circuit patterns is exposed through a respective opening in the protection layer and runs parallel with the second direction.

2. The semiconductor device as claimed in claim 1 , wherein the openings in the protection layer through which the exposed portions of the peripheral circuit patterns are exposed are rectangular.

3. A semiconductor device comprising:

a semiconductor die comprising at least one bump; and

a circuit board comprising at least one circuit pattern to which the bump is electrically connected, wherein the circuit board comprises:

an insulation layer comprising a center region and peripheral regions around the center region;

a plurality of center circuit patterns formed in the center region of the insulation layer;

a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer; and

a protection layer,

wherein the center circuit patterns are wider than the peripheral circuit patterns, and

wherein:

the peripheral circuit patterns comprise first-direction peripheral circuit patterns disposed in mutually-facing first peripheral regions and running parallel with a first direction, wherein a respective exposed portion of each of the first-direction peripheral circuit patterns is exposed through a respective opening in the protection layer and runs parallel with the first direction; and

the center circuit patterns are disposed between the mutually-facing first peripheral regions of the peripheral circuit patterns, wherein a respective exposed portion of at least half of the center circuit patterns is exposed through a respective opening in the protection layer and runs parallel with a second direction different from the first direction.

4. The semiconductor device as claimed in claim 3 , wherein the center circuit patterns are at least 1.5 times wider than the peripheral circuit patterns.

5. The semiconductor device as claimed in claim 1 , wherein the center circuit patterns are at least 1.5 times wider than the peripheral circuit patterns.

6. The semiconductor device as claimed in claim 1 , wherein the center circuit patterns are about 1.5 times to about 2.5 times wider than the peripheral circuit patterns.

7. A semiconductor device comprising:

a semiconductor die comprising at least one bump; and

a circuit board comprising at least one circuit pattern to which the bump is electrically connected, wherein the circuit board comprises:

an insulation layer comprising a center region and peripheral regions around the center region;

a plurality of center circuit patterns formed in the center region of the insulation layer;

a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer; and

a protection layer,

wherein the center circuit patterns comprise:

first-direction center circuit patterns parallel with a first direction; and

second-direction center circuit patterns parallel with a second direction different from the first direction, and

wherein the peripheral circuit patterns comprise:

first-direction peripheral circuit patterns disposed in mutually-facing first peripheral regions and running parallel with the first direction, wherein a respective exposed portion of each of the first-direction peripheral circuit patterns is exposed through a respective opening in the protection layer and runs parallel with the first direction; and

second-direction peripheral circuit patterns disposed in mutually-facing second peripheral regions different from the first peripheral regions, the second-direction peripheral circuit patterns running parallel with the second direction different from the first direction, wherein a respective exposed portion of each of the second-direction peripheral circuit patterns is exposed through a respective opening in the protection layer and runs parallel with the second direction.

8. The semiconductor device as claimed in claim 7 , wherein the openings in the protection layer through which the exposed portions of the peripheral circuit patterns are exposed are rectangular.

9. The semiconductor device as claimed in claim 7 , wherein the exposed portions of the peripheral circuit patterns are linear.

10. The semiconductor device as claimed in claim 7 , wherein the center circuit patterns are at least 1.5 times wider than the peripheral circuit patterns.

11. The semiconductor device as claimed in claim 7 , wherein the center circuit patterns are about 1.5 times to about 2.5 times wider than the peripheral circuit patterns.

12. A semiconductor device comprising:

a semiconductor die comprising at least one bump; and

a circuit board comprising at least one circuit pattern to which the bump is electrically connected, wherein the circuit board comprises:

an insulation layer comprising a center region and peripheral regions around the center region;

a plurality of center circuit patterns formed in the center region of the insulation layer;

a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer; and

a protection layer,

wherein the center circuit patterns comprise:

first-direction center circuit patterns parallel with a first direction; and

second-direction center circuit patterns parallel with a second direction different from the first direction, and

wherein:

each of the first-direction center circuit patterns comprises a respective exposed portion that is exposed through a respective opening in the protection layer and runs parallel with the first direction; and

each of the second-direction center circuit patterns comprises a respective exposed portion that is exposed through a respective opening in the protection layer and runs parallel with the second direction.

13. The semiconductor device as claimed in claim 12 , wherein the center circuit patterns are at least 1.5 times wider than the peripheral circuit patterns.

14. The semiconductor device as claimed in claim 12 , wherein the openings in the protection layer through which the exposed portions of the center circuit patterns are exposed are rectangular.

15. A semiconductor device comprising:

a semiconductor die comprising at least one bump; and

a circuit board comprising at least one circuit pattern to which the bump is electrically connected, wherein the circuit board comprises:

an insulation layer comprising a center region and peripheral regions around the center region;

a plurality of center circuit patterns formed in the center region of the insulation layer;

a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer; and

a protection layer,

wherein each of the center circuit patterns has a crossed shape in at least first and second directions, and

wherein each of the center circuit patterns is exposed through a respective opening in the protection layer.

16. A semiconductor device comprising:

a semiconductor die comprising at least one bump; and

a circuit board comprising at least one circuit pattern to which the bump is electrically connected, wherein the circuit board comprises:

an insulation layer comprising a center region and peripheral regions around the center region;

a plurality of center circuit patterns formed in the center region of the insulation layer; and

a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer; and

a protection layer,

wherein each of the center circuit patterns has a crossed shape in at least first and second directions, and

wherein the peripheral circuit patterns comprise:

first-direction peripheral circuit patterns disposed in mutually-facing first peripheral regions and running parallel with the first direction, wherein a respective exposed portion of each of the first-direction peripheral circuit patterns is exposed through a respective opening in the protection layer and runs parallel with the first direction; and

second-direction peripheral circuit patterns disposed in mutually-facing second peripheral regions different from the first peripheral regions, the second-direction peripheral circuit patterns running parallel with the second direction, wherein a respective exposed portion of each of the second-direction peripheral circuit patterns is exposed through a respective opening in the protection layer and runs parallel with the second direction.

17. The semiconductor device as claimed in claim 16 , wherein the openings in the protection layer through which the exposed portions of the peripheral circuit patterns are exposed are rectangular.

18. The semiconductor device as claimed in claim 16 , wherein each of the center circuit patterns has a crossed shape in at least three directions.

19. The semiconductor device as claimed in claim 15 , wherein each of the center circuit patterns has a crossed shape in at least three directions.

20. The semiconductor device as claimed in claim 15 , wherein:

each of the peripheral circuit patterns comprises a respective exposed portion that is rectangular shaped and exposed through a respective opening in the protection layer; and

each of the center circuit patterns comprises a respective exposed portion that is cross shaped and exposed through the respective opening in the protection layer.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 12, 2020
From: AMKOR TECHNOLOGY, INC.
To: AMKOR TECHNOLOGY SINGAPORE HOLDING PTE.LTD.
Reel/Frame 054046/0673 →
SECURITY INTEREST Recorded Aug 1, 2018
From: AMKOR TECHNOLOGY, INC.
To: BANK OF AMERICA, N.A., AS AGENT
Reel/Frame 046683/0139 →
PATENT SECURITY AGREEMENT Recorded May 7, 2015
From: AMKOR TECHNOLOGY, INC.
To: BANK OF AMERICA, N.A.
Reel/Frame 035613/0592 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 3, 2012
From: LEE, MIN JAE; CHUNG, YOU SHIN; JUNG, HOON
To: AMKOR TECHNOLOGY, INC.
Reel/Frame 028718/0882 →
Priority Claims (1)
KR 10-2011-0078583 · Aug 8, 2011 · national
Continuity (1)
Related Publication 20130039026A1 · Feb 14, 2013