Axiocentric scrubbing land grid array contacts and methods for fabrication
A contact structure and assembly and a method for manufacturing the same for a microelectronics device includes first and second electrically conductive contacts being helically shaped. A carrier element is attached to and positioned between the first and second contacts. The first and second contacts are in electrical communication with each other, and the first and second contacts are in a mirror image relationship with each other. A pair of insulating substrates each include electrically conductive members. A contact point on each of the first and second contacts is attached and electrically communicating to respective electrically conductive members such that the first and second electrically conductive contacts between the pair of insulating substrates form an electrically conductive package. A metal layer on the carrier element provides electrical conductivity through a first opening defined by the carrier element between the first and second portions of the helix shaped contact.
1. A method for manufacturing a contact structure for microelectronics manufacturing, comprising:
providing a carrier element defining a first opening therethrough;
positioning a molded element on opposite sides of the carrier element by passing the molded element partially through the first opening;
coating the molded element with an electrically conductive material;
fabricating a helix shaped contact from the electrically conductive material on the opposite sides of the carrier element, the helix shaped contact being positioned over the molded element, the helix shaped contact having a first portion and a second portion on the opposing sides of the carrier element, respectively, and the first and second portions being in minor image relationship to each other;
heating the combined helix shaped contact and the molded element such that the molded element is ablated and the helix shaped contact substantially retains the shape of the molded element;
positioning at least one contact point on each of the first contact portion and the second contact portion between a pair of insulating substrates including electrically conductive members; and
positioning the at least one contact point on each of the first and second contacts portions for electrical contact with respective electrically conductive members to form an electrically conductive package.
2. The method of claim 1 , wherein the helix shaped contact is a metal alloy; and the step of heating further includes:
annealing the helix shaped contact; and
quenching the helix shaped contact.
3. The method of claim 1 , wherein the molded element is a molded sacrificial polymer element.
4. The method of claim 1 , wherein the molded element is cone shaped.
5. The method of claim 1 , further comprising:
applying a plurality of conductive metal coatings to the molded element.
6. The method of claim 1 , wherein fabricating the helix shaped contact includes using photolithography.
7. The method of claim 1 , wherein a metal layer on the carrier element provides electrical conductivity through the first opening between the first and second portions of the helix shaped contact.
8. The method of claim 1 , further comprising:
a second opening defined by the carrier element, and a metal layer on the carrier element providing electrical conductivity through the second opening between the first and second portions of the helix shaped contact.
9. The method of claim 1 , further comprising:
compressing the first and second contacts between the insulating substrates such that the first and second contacts twist on the electrically conductive members during the compression.
10. The method of claim 1 , further comprising:
sputter depositing the electrically conductive material.
11. The method of claim 10 , wherein the electrically conductive material comprises copper and beryllium.
12. The method of claim 10 , wherein the electrically conductive material is formed from a plurality of layers using the sputter depositing step.
13. The method of claim 12 , wherein the electrically conductive material comprises one or more combinations of the elements in the following groups: (beryllium, copper, and titanium); and (beryllium, copper, and chromium).
14. The method of claim 13 , wherein a specified number of the plurality of layers are copper, and another specified number of the plurality of layers are beryllium.
15. The method of claim 1 , further comprising:
depositing the electrically conductive material using one of the following deposition techniques:
electroplating; evaporation; plasma spray; electroless deposition; and sputter deposition.
16. The method of claim 15 , wherein the step of depositing the electrically conductive material includes depositing a plurality of layers to form the electrically conductive material; and the method further comprising, before the step of heating the combined helix shaped contact, the following step:
implementing one or more of the deposition techniques including any combination of the deposition techniques, with one or more of the following materials including any combination of the materials, including: copper; beryllium; titanium; and chromium.