Harsh environment optical element protection
View Patent ↗Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.
1. An optical element for reflecting extreme ultraviolet radiation produced by laser irradiation of a target material comprising tin or a tin compound, said optical element comprising:
a substrate;
a stack disposed on said substrate, said stack comprising alternating first and second layers, said first layer comprising a first dielectric material and said second layer comprising a second dielectric material; and
a protective layer arranged on said stack, wherein said protective layer comprises a first layer primarily of Al 2 O 3 arranged on the stack, a second layer primarily of Si arranged on the first layer, and a coating of SiO2 arranged on the second layer.
2. An optical element as claimed in claim 1 wherein said first layer primarily of Al 2 O 3 has a thickness of about 10 nm to about 30 nm.
3. An optical element as claimed in claim 2 wherein said first layer primarily of Al 2 O 3 has a thickness of about 10 nm to about 00 nm.
4. An optical element as claimed in claim 1 wherein said second layer primarily of Si has a thickness of about 10 nm to about 20 nm.
5. An optical element as claimed in claim 1 wherein said coating has a thickness of about 1 nm to about 2 nm.
6. An optical element for reflecting extreme ultraviolet radiation, said optical element comprising:
a substrate;
a stack disposed on said substrate; said stack comprising alternating first and second layers, said first layer comprising a first dielectric material and said second layer comprising a second dielectric material;
a first protective layer arranged on and distinct from said stack, said first protective layer comprising primarily Mo;
a second protective layer on said first protective layer, said second protective layer comprising primarily Si; and
an outer coating of SiO2 on said second protective layer.
7. Apparatus for producing extreme ultraviolet radiation comprising:
a chamber adapted to accommodate a vacuum;
a dispenser arranged to dispense a target material comprising tin into the chamber; and
an optical element arranged in the chamber, said optical element comprising a substrate,
a stack disposed on said substrate; said stack comprising alternating first and second layers, said first layer comprising a first dielectric material and said second layer comprising a second dielectric material, and
a protective layer comprising a first layer primarily of Al 2 O 3 arranged on the stack, a second layer primarily of Si arranged on the first layer, and a coating of SiO2 arranged on the second layer and arranged to be exposed to an interior of said chamber.