Photoresists comprising ionic compound
View Patent ↗New photoresist compositions are provided that comprise a component that comprises a radiation-insensitive ionic compound. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
1. A photoresist comprising:
(a) one or more resins;
(b) one or more acid generators; and
(c) a compound comprising a structure of the following Formula (I):
wherein in Formula (I):
R 1 , R 2 and R 3 are the same or different optionally substituted alkyl or heteroalkyl having 1 to 8 carbon atoms;
R 4 is an optionally substituted alkyl or heteroalkyl having 10 or more carbon atoms,
or two or more of R 1 , R 2 , R 3 and R 4 are taken together to form a heterocyclic or heteroaromatic ring containing the depicted nitrogen cation;
Y is a counter anion.
2. The photoresist of claim 1 wherein R 4 has 10 to 30 carbon atoms.
3. The photoresist of claim 1 wherein Y in Formula (I) comprises a sulfamate moiety or a sulfonate moiety.
4. The photoresist of claim 1 wherein one or more of R 1 , R 2 and R 3 are the same or different optionally substituted alkyl comprising 1-4 carbon atoms.
5. The photoresist of claim 1 wherein at least one of R 1 , R 2 , and R 3 comprises 1-2 carbon atoms.
6. The photoresist of claim 1 wherein Y has a pKa of between −2 and 5.
7. A photoresist comprising:
(a) one or more resins;
(b) one or more acid generators; and
(c) an ionic compound comprising:
a cationic moiety selected from:
in which n is 12-18; and
an anionic moiety selected from:
in which:
R 10 is a linear C 1 -C 18 alkyl group, or a cyclohexyl, adamantyl, norbornyl, or camphoryl group;
R 11 and R 12 are each independently a linear C 1 -C 18 alkyl group, or a cyclohexyl, adamantyl, norbornyl, or camphoryl group; and
R 13 is a linear C 1 -C 18 alkyl group, or a cyclohexyl, adamantyl, norbornyl, or camphoryl group.
8. A photoresist composition of claim 1 wherein R 4 in Formula I has 12 or more carbon atoms.
9. A photoresist of claim 1 wherein R 4 is not taken to form a heterocyclic or heteroaromatic ring containing the depicted nitrogen cation.