Metal pad structure over TSV to reduce shorting of upper metal layer
Various embodiments of mechanisms for forming a slotted metal pad over a TSV in substrate are provided. The dielectric structures in the slotted metal pad reduce dishing effect during planarization of the slotted metal pad. As a result, the risk of having metal stringers in upper metal level(s) caused by the dishing effect is greatly reduced.
1. A semiconductor die for bonding with another die, comprising:
a through substrate via (TSV) formed in a substrate of the semiconductor die; and
a slotted metal pad formed directly over the TSV, wherein the slotted metal pad has a top surface area larger than a top surface area of the TSV, wherein the slotted metal pad has a plurality of metal bars in a first direction, and wherein slots between the plurality of metal bars are filled with a dielectric material to form dielectric bars.
2. The die of claim 1 , wherein a first metal bar of the plurality of metal bars located at an edge of the slotted metal pad is wider than a second metal bar of the plurality of metal bars located away from the edge of the slotted metal pad.
3. The die of claim 2 , wherein the second metal bar has a middle section and an edge section, the edge section being closer to the edge of the slotted metal pad than the middle section, the middle section being narrower, in a direction perpendicular to the first direction, than the edge section.
4. The die of claim 3 , wherein the middle section has a length, the slotted metal pad has a width, and wherein the length of the middle section relative the width of the slotted metal pad is in a range from about 0.2 to about 0.8.
5. The die of claim 2 , wherein a ratio of a width of the second metal bar to a width of a neighboring dielectric bar is in a range from about 0.5 to about 1.2.
6. The die of claim 2 , wherein a fourth metal bar near a center of the slotted metal pad is narrower than the second metal bar.
7. The die of claim 2 , wherein the second metal bar has a width greater than about 0.4 μm.
8. The die of claim 1 , wherein a third metal bar in a second direction perpendicular to the first direction connects to the plurality of metal bars.
9. The die of claim 1 , wherein the plurality of metal bars include a copper diffusion barrier layer and a copper-containing gap-fill layer.
10. The die of claim 1 , wherein a ratio of metal surface area of a surface of the slotted metal pad facing the TSV to a total surface area of the surface of the slotted metal pad facing the TSV is in a range from about 50% to about 90%.
11. The die of claim 1 , wherein a ratio of a total surface of the slotted metal pad facing the TSV to a top surface of the TSV in contact with the slotted metal pad is in a range from about 1.2 to about 3.5.
12. The die of claim 1 , further comprising additional metal strips connecting neighboring metal bars of the plurality of metal bars, wherein the additional metal strips are not at edges of the slotted metal pad, and wherein the additional metal strips are not at a center of the slotted metal pad.
13. The die of claim 1 , further comprising:
an interconnect structure formed over the slotted metal pad, wherein a portion of the interconnect structure directly on the slotted metal pad is planar.
14. The die of claim 1 , wherein at least one microelectronic device is formed on the substrate.
15. The die of claim 1 , wherein the dielectric bars have respective widths greater than about 0.4 μm.
16. The die of claim 1 , wherein the substrate includes a semiconductor wafer, the TSV extending from a top major surface of the semiconductor wafer through to a bottom major surface of the semiconductor wafer.
17. The die of claim 1 , wherein the slots between the plurality of metal bars are filled with a solid dielectric material.
18. A semiconductor die, comprising:
a through substrate via (TSV) formed in a substrate of the semiconductor die; and
a slotted metal pad formed directly over the TSV, wherein the slotted metal pad has a top surface area larger than a top surface area of the TSV, wherein the slotted metal pad has a plurality of metal bars in a first direction, and wherein slots between the plurality of metal bars are filled with a dielectric material to form dielectric bars, wherein a first metal bar of the plurality of metal bars at an edge of the slotted metal pad is wider than a second metal bar of the plurality of metal bars away from edges of the slotted metal pad.
19. A device comprising:
a semiconductor substrate having a top surface and a bottom surface;
a through substrate via (TSV) extending from the top surface of the semiconductor substrate, through the substrate, and to the bottom surface of the semiconductor substrate;
an external connector formed on the bottom surface of the semiconductor substrate and in physical contact with the TSV;
an interconnect structure formed over the top surface of the semiconductor substrate and in electrical contact with the TSV; and
a slotted metal pad formed directly over the TSV, wherein the slotted metal pad has a plurality of metal bars in a first direction, and wherein slots between the plurality of metal bars are filled with a solid dielectric material to form dielectric bars.
20. The device of claim 19 , wherein the solid dielectric material is silicon oxide or a low dielectric constant (low-k) dielectric material.