IP Library Granted Patent US 8,802,508
Granted Patent B2
US 8,802,508 · App. 13/689,034 · Granted Aug 12, 2014

Semiconductor device package

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Quick Facts
Patent No.
US 8,802,508
App. No.
13/689,034
Granted
Aug 12, 2014
Kind
B2
Abstract

Forming a packaged semiconductor device includes placing a semiconductor die attached to a carrier into a mold cavity having an injection port, wherein the semiconductor die has an encapsulant exclusion region on a top surface of the semiconductor die within an outer perimeter of the top surface; and flowing an encapsulant over the semiconductor die and carrier from the injection port, wherein the encapsulant flows around the encapsulant exclusion region to surround the encapsulant exclusion region without covering the encapsulant exclusion region. The encapsulant exclusion region has a first length corresponding to a single longest distance across the encapsulant exclusion region, wherein the first length is aligned, within 30 degrees, to a line defined by a shortest distance between an entry point of the injection port into the mold cavity and an outer perimeter of the encapsulant exclusion region.

Claims (31)

1. A method for forming a packaged semiconductor device, the method comprising:

placing a semiconductor die attached to a carrier into a mold cavity having an injection port, wherein the semiconductor die has an encapsulant exclusion region on a top surface of the semiconductor die within an outer perimeter of the top surface; and

flowing an encapsulant over the semiconductor die and carrier from the injection port, wherein the encapsulant flows around the encapsulant exclusion region to surround the encapsulant exclusion region without covering the encapsulant exclusion region, wherein the encapsulant exclusion region has a first length corresponding to a single longest distance across the encapsulant exclusion region, wherein the first length is aligned, within 30 degrees, to a line defined by a shortest distance between an entry point of the injection port into the mold cavity and an outer perimeter of the encapsulant exclusion region.

2. The method of claim 1 , wherein the first length is further characterized as a major axis of the encapsulant exclusion region.

3. The method of claim 2 , wherein the encapsulant exclusion region has a leading portion having a first width measured parallel to a minor axis of the encapsulant exclusion region and a non-leading portion having a second width measured parallel to the minor axis that is greater than the first width, wherein the non-leading portion is mutually exclusive with the leading portion.

4. The method of claim 2 wherein the encapsulant exclusion region is further characterized as an ellipse.

5. The method of claim 1 , wherein no other distance across the region is as long as the first length.

6. The method of claim 1 , wherein the encapsulant exclusion region is symmetrical about the first length.

7. The method of claim 1 , wherein the encapsulant exclusion region is non-symmetrical about the first length.

8. The method of claim 1 , wherein the encapsulant exclusion region is defined by a portion of the mold cavity which contacts the semiconductor die during the step of flowing the encapsulant.

9. The method of claim 8 , wherein the portion of the mold cavity comprises a molding film which contacts the semiconductor die during the step of flowing the encapsulant.

10. The method of claim 8 , further comprising:

after encapsulation of the packaged semiconductor device, attaching a downset portion of a heat spreader to the encapsulant exclusion region.

11. The method of claim 1 , wherein the step of placing the semiconductor die attached to the carrier into the mold cavity is further characterized in that the semiconductor die has a second encapsulant exclusion region on the top surface within the outer perimeter of the top surface, wherein the second encapsulant exclusion region is mutually exclusive of the encapsulant exclusion region.

12. The method of claim 11 , wherein, during the flowing, the encapsulant does not cover the second encapsulant exclusion region, wherein the second encapsulant exclusion region has a second length corresponding to a single longest distance across the second encapsulant exclusion region, wherein the second length is aligned, within 30 degrees, to a line defined by a shortest distance between an entry point of the injection port into the mold cavity and an outer perimeter of the second encapsulant exclusion region.

13. The method of claim 12 , wherein, after the flowing, the encapsulant between the encapsulant exclusion region and the second encapsulant exclusion region is aligned within 30 degrees with each of the shortest distance between the entry point of the injection port into the mold cavity and the outer perimeter of the encapsulant exclusion region and the shortest distance between the entry point of the injection port into the mold cavity and the outer perimeter of the second encapsulant exclusion region.

14. A method for forming a packaged semiconductor device, the method comprising:

attaching a downset portion of a heat spreader to a top surface of a semiconductor die with a thermal interface material, wherein the semiconductor die is attached to a carrier, and wherein the downset portion of the heat spreader attached to the surface of the semiconductor die defines an encapsulant exclusion region on the top surface of the semiconductor die;

placing the heat spreader, semiconductor die, and carrier into a mold cavity having an injection port; and

flowing an encapsulant over the semiconductor die and carrier from the injection port to surround the downset portion of the heat spreader and cover exposed portions of the semiconductor die and at least a portion of the carrier, wherein the encapsulant exclusion region has a first length corresponding to a single longest distance across the encapsulant exclusion region, wherein the first length is aligned, within 30 degrees, to a line defined by a shortest distance between an entry point of the injection port into the mold cavity and an outer perimeter of the encapsulant exclusion region, and wherein the packaged semiconductor device is devoid of encapsulant between the downset portion of the heat spreader and the top surface of the semiconductor die.

15. The method of claim 14 , wherein the first length is further characterized as a major axis of the encapsulant exclusion region.

16. The method of claim 15 , wherein the encapsulant exclusion region has a leading portion having a first width measured parallel to a minor axis of the encapsulant exclusion region and a non-leading portion having a second width measured parallel to the minor axis that is greater than the first width, wherein the non-leading portion is mutually exclusive with the leading portion.

17. The method of claim 15 wherein the encapsulant exclusion region is further characterized as an ellipse.

18. The method of claim 14 , wherein no other distance across the region is as long as the first length.

19. A packaged semiconductor device, comprising:

a die carrier;

a semiconductor die attached to the die carrier;

a heat spreader having a downset portion attached to a top surface of the semiconductor die, wherein the downset portion has a bottom surface facing the top surface of the semiconductor die and is located within an outer perimeter of the top surface of the semiconductor die; and

an encapsulant over the semiconductor die and the carrier and surrounding the downset portion of the heat spreader, wherein the packaged semiconductor device includes an area devoid of encapsulant between the bottom surface of the downset portion and the top surface of the semiconductor die, wherein the bottom surface of the downset portion has a first length corresponding to a single longest distance across the bottom surface of the downset portion, and wherein the first length is aligned, within 30 degrees, to a diagonal axis of the packaged semiconductor device.

20. The packaged semiconductor device of claim 19 , wherein the first length is further characterized as a major axis of the bottom surface of the downset portion, and wherein the bottom surface of the downset portion has a leading portion having a first width measured parallel to a minor axis of the area devoid of encapsulant and a non-leading portion having a second width measured parallel to the minor axis that is greater than the first width, wherein the non-leading portion is mutually exclusive with the leading portion.

21. The packaged semiconductor device of claim 19 wherein the bottom surface of the downset portion is symmetrical about the first length.

Assignments (22)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040632 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Sep 21, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 044209/0047 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 040632/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
PATENT RELEASE Recorded Jan 14, 2016
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037494/0312 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0671 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0685 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 1, 2013
From: CARPENTER, BURTON J.; LOW, BOON YEW; ZHAO, ZHUFENG
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 030925/0467 →
SECURITY AGREEMENT Recorded Jun 18, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 030633/0424 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Apr 22, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Apr 22, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
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SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Apr 22, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 030258/0523 →