Embedded non-volatile memory
View Patent ↗The present invention is a method of incorporating a non-volatile memory into a CMOS process that requires four or fewer masks and limited additional processing steps. The present invention is an epi-silicon or poly-silicon process sequence that is introduced into a standard CMOS process (i) after the MOS transistors' gate oxide is formed and the gate poly-silicon is deposited (thereby protecting the delicate surface areas of the MOS transistors) and (ii) before the salicided contacts to those MOS transistors are formed (thereby performing any newly introduced steps having an elevated temperature, such as any epi-silicon or poly-silicon deposition for the formation of diodes, prior to the formation of that salicide). A 4F 2 memory array is achieved with a diode matrix wherein the diodes are formed in the vertical orientation.
1. A CMOS logic device comprising MOS transistor logic and one or more diode memory arrays whereby the material to form the diodes of the memory array is deposited or grown after the MOS transistor gate material is deposited and before the annealing of any silicide in the MOS transistor contacts, and further comprising cups that are filled with a material that performs the function of an information storage element.
2. The CMOS logic device of claim 1 whereby the material to form the diodes of the memory array is epi-silicon.
3. The CMOS logic device of claim 1 whereby the material to form the diodes of the memory array is poly-silicon.
4. The CMOS logic device of claim 1 whereby the material that performs the function of an information storage element is a phase-change material.
5. The CMOS logic device of claim 4 whereby the phase-change material comprises a Chalcogenide alloy.
6. The CMOS logic device of claim 4 whereby the phase-change material comprises one or more of the elements Germanium, Tellurium or Antimony.
7. The CMOS logic device of claim 1 further comprising contacts between the silicon on the substrate and one or more metal layers formed above the substrate.
8. The CMOS logic device of claim 7 whereby the cups are formed by the selective removal of said contacts.
9. An electronic system comprising a memory device whereby the memory device comprises MOS transistor logic and one or more diode memory arrays whereby the material to form the diodes of the memory array is deposited or grown after the MOS transistor gate material is deposited and before the annealing of any silicide in the MOS transistor contacts, and whereby the diodes of the memory array are comprised by information storage cells that also comprise cups that are filled with a material that performs the function of an information storage element.
10. The electronic system of claim 9 whereby the material to form the diodes of the memory array is epi-silicon.
11. The electronic system of claim 9 whereby the material to form the diodes of the memory array is poly-silicon.
12. The electronic system of claim 9 whereby the material that performs the function of an information storage element is a phase-change material.
13. The electronic system of claim 12 whereby the phase-change material comprises a Chalcogenide alloy.
14. The electronic system of claim 12 whereby the phase-change material comprises one or more of the elements Germanium, Tellurium or Antimony.
15. The electronic system of claim 9 further comprising contacts between the silicon on the substrate and one or more metal layers formed above the substrate.
16. The electronic system of claim 15 whereby the cups are formed by the selective removal of said contacts.
17. The electronic system of claim 9 whereby the memory device is comprised by a package that is removable.
18. The electronic system of claim 9 whereby the memory device contains one or more types of information selected from the list of digital text, digital books, digital music, digital audio, digital photography, digital video, and digital cartography.
19. An electronic system comprising a memory device whereby the memory device comprises MOS transistor logic and one or more diode memory arrays whereby the material to form the diodes of the memory array is deposited or grown after the MOS transistor gate material is deposited and before the annealing of any silicide in the MOS transistor contacts, and further comprising (i) contacts between the silicon on the substrate and one or more metal layers formed above the substrate and (ii) cups formed by the selective removal of said contacts.
20. The electronic system of claim 19 whereby the material to form the diodes of the memory array is epi-silicon.
21. The electronic system of claim 19 whereby the material to form the diodes of the memory array is poly-silicon.
22. The electronic system of claim 19 whereby the memory device is comprised by a package that is removable.
23. The electronic system of claim 19 whereby the memory device contains one or more types of information selected from the list of digital text, digital books, digital music, digital audio, digital photography, digital video, and digital cartography.