REO/ALO/A1N template for III-N material growth on silicon
A method of forming a template on a silicon substrate includes providing a single crystal silicon substrate. The method further includes epitaxially depositing a layer of rare earth oxide on the surface of the silicon substrate. The rare earth oxide being substantially crystal lattice matched to the surface of the silicon substrate. The method further includes forming an aluminum oxide layer on the rare earth oxide, the aluminum oxide being substantially crystal lattice matched to the surface of the rare earth oxide and epitaxially depositing a layer of aluminum nitride (AlN) on the aluminum oxide layer substantially crystal lattice matched to the surface of the aluminum oxide.
1. A III-N template on a silicon substrate comprising:
a single crystal silicon substrate;
a single crystal rare earth oxide layer positioned on the silicon substrate, the rare earth oxide being substantially crystal lattice matched to the surface of the silicon substrate;
an aluminum oxide layer positioned on the surface of the rare earth oxide layer, the aluminum oxide being substantially crystal lattice matched to the surface of the rare earth oxide layer; and
a layer of aluminum nitride (AlN) positioned on the surface of the aluminum oxide layer and substantially crystal lattice matched to the surface of the aluminum oxide layer.
2. The III-N template on a silicon substrate as claimed in claim 1 wherein the single crystal layer of rare earth oxide includes a composition including multiple rare earth oxides one of graded to bridge the multiple rare earth oxides or stepped to have an abrupt change in the rare earth oxides.
3. The III-N template on a silicon substrate as claimed in claim 2 wherein the composition including multiple rare earth oxides includes a first rare earth oxide adjacent the silicon substrate having a crystal lattice spacing substantially matching a double lattice spacing of silicon and a second rare earth oxide adjacent the aluminum oxide layer having a crystal lattice spacing substantially matching a crystal lattice spacing of the aluminum oxide layer.
4. The III-N template on a silicon substrate as claimed in claim 3 wherein the first rare earth oxide includes Gd 2 O 3 .
5. The III-N template on a silicon substrate as claimed in claim 3 wherein the second rare earth oxide includes Er 2 O 3 .
6. The III-N template on a silicon substrate as claimed in claim 1 further including a layer of III-N material positioned on the layer of aluminum nitride and substantially crystal lattice matched to the surface of the aluminum nitride.
7. The III-N template on a silicon substrate as claimed in claim 6 wherein the layer of III-N material includes one of an LED structure and an HEMT structure.
8. The III-N template on a silicon substrate as claimed in claim 7 wherein the LED structure includes at least one layer of i-GaN, n-GaN, an active layer, an electron blocking layer, or p-GaN.
9. The III-N template on a silicon substrate as claimed in claim 7 wherein the HEMT structure includes at least one layer of i-GaN, AlN, AlGaN, or GaN.
10. An III-N structure on a silicon substrate comprising:
a single crystal silicon substrate;
a single crystal rare earth oxide layer positioned on the silicon substrate, the rare earth oxide being substantially crystal lattice matched to the surface of the silicon substrate;
an aluminum oxide layer positioned on the surface of the rare earth oxide layer, the aluminum oxide being substantially crystal lattice matched to the surface of the rare earth oxide layer;
a layer of aluminum nitride (AlN) positioned on the surface of the aluminum oxide layer and substantially crystal lattice matched to the surface of the aluminum oxide layer; and
one of a III-N LED structure and a III-N HEMT structure positioned on the layer of aluminum oxide, the one of the III-N LED structure and the III-N HEMT structure including at least one III-N layer substantially crystal lattice matched to the surface of the aluminum nitride layer.