Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer

1. A monomer, having the Formula I:

wherein R 1 , R 2 , and R 3 are each independently a C 1-30 monovalent organic group, and R 1 , R 2 , and R 3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups;

R 4 includes H, F, C 1-4 alkyl, or C 1-4 fluoroalkyl;

A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups;

m is 3, and n is an integer of 1 to 8; and

x is 1 to 2n+2, and y is 0 to 2m+2.

2. The monomer of claim 1 , wherein R 4 is H, F, methyl, or trifluoromethyl.

3. The monomer of claim 1 , wherein R 1 , R 2 , and R 3 are each independently C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, C 1-10 fluoroalkoxy, C 1-10 alkanol, or a combination comprising at least one of the foregoing.

4. The monomer of claim 1 , wherein R 1 , R 2 , and R 3 are each independently methyl, ethyl, trifluoromethyl, 2,2,2-trifluoroethyl, 2-hydroxyethyl, or a combination comprising at least one of the foregoing.

5. The monomer of claim 1 , wherein n is 3 or 4, x is 1 or 2, and y is an integer of from 0 to 2.

6. The monomer of claim 1 , wherein R 1 is methyl or ethyl, n is 3, and y is 0.

7. A polymer, comprising the monomer of claim 1 .

8. A photoresist composition, comprising the polymer of claim 7 and a photoacid generator.

9. A coated substrate, comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of claim 8 over the one or more layers to be patterned.

10. A patterned layer, formed by patternwise imaging the coated substrate of claim 9 using actinic radiation at 193 nm.

11. A monomer, having the Formula I:

wherein R 1 , R 2 , and R 3 are each independently a C 1-30 monovalent organic group, and R 1 , R 2 , and R 3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups;

R 4 includes H, F, C 1-4 alkyl, or C 1-4 fluoro alkyl;

A is —O—CH 2 (C═O)—;

m and n are each independently an integer of 1 to 8; and

x is 0 to 2n+2, and y is 0 to 2m+2.

12. The monomer of claim 11 , wherein R 4 is H, F, methyl, or trifluoromethyl.

13. The monomer of claim 11 , wherein R 1 , R 2 , and R 3 are each independently C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, C 1-10 fluoroalkoxy, C 1-10 alkanol, or a combination comprising at least one of the foregoing.

14. The monomer of claim 11 , wherein R 1 , R 2 , and R 3 are each independently methyl, ethyl, trifluoromethyl, 2,2,2-trifluoroethyl, 2-hydroxyethyl, or a combination comprising at least one of the foregoing.

15. The monomer of claim 11 , wherein m and n are independently 3 or 4, and x and y are independently an integer of from 0 to 2.

16. The monomer of claim 11 , wherein R 1 is methyl or ethyl, m and n are each 3, and x and y are each 0.

17. A polymer, comprising the monomer of claim 11 .

18. A photoresist composition, comprising the polymer of claim 17 and a photoacid generator.

19. A coated substrate, comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of claim 18 over the one or more layers to be patterned.

20. A patterned layer, formed by patternwise imaging the coated substrate of claim 19 using actinic radiation at 193 nm.