Semiconductor fuses in a semiconductor device comprising metal gates
View Patent ↗In a replacement gate approach, the semiconductor material of the gate electrode structures may be efficiently removed during a wet chemical etch process, while this material may be substantially preserved in electronic fuses. Consequently, well-established semiconductor-based electronic fuses may be used instead of requiring sophisticated metal-based fuse structures. The etch selectivity of the semiconductor material may be modified on the basis of ion implantation or electron bombardment.
1. A semiconductor device, comprising:
a transistor element positioned in and above an active region of a semiconducting substrate, said transistor element comprising a gate electrode structure, said gate electrode structure comprising a gate dielectric layer positioned above said active region and a metal-containing electrode material positioned above said gate dielectric layer, wherein said gate dielectric layer comprises a first high-k dielectric material; and
a fuse body positioned above an isolation region of said semiconducting substrate, said fuse body comprising a layer of dielectric material positioned above said isolation region, a first metal-containing cap layer positioned above said layer of dielectric material, and a semiconductor material positioned above said first metal-containing cap layer, wherein said semiconductor material has an upper portion and a lower portion, said upper portion comprising an electrically inert species and having an increased etch resistivity compared to said lower portion.
2. The semiconductor device of claim 1 , wherein said layer of dielectric material comprises a second high-k dielectric material.
3. The semiconductor device of claim 2 , wherein said second high-k dielectric material is the same as said first high-k dielectric material.
4. The semiconductor device of claim 1 , wherein said gate electrode structure further comprises a second metal-containing cap layer positioned between said gate dielectric layer and said metal-containing electrode material.
5. The semiconductor device of claim 4 , wherein a material comprising said second metal-containing cap layer is the same as a material comprising said first metal-containing cap layer.
6. The semiconductor device of claim 4 , wherein said gate electrode structure further comprises a further metal-containing material layer positioned between said second metal-containing cap layer and said metal-containing electrode material, said further metal-containing material layer comprising a work function adjusting species.
7. The semiconductor device of claim 1 , wherein said electrically inert species comprises xenon.
8. The semiconductor device of claim 1 , further comprising:
a contact level positioned above said transistor element and said fuse body, said contact level comprising a dielectric insulating material;
a first contact element embedded in said dielectric insulating material, said first contact element electrically contacting said fuse body; and
at least one second contact element embedded in said layer of insulating material, said second contact element electrically contacting said transistor element.
9. The semiconductor device of claim 1 , wherein said semiconductor material comprises silicon.
10. The semiconductor device of claim 1 , wherein said semiconductor material comprises germanium.
11. A semiconductor device, comprising:
a transistor element comprising a gate electrode structure, said gate electrode structure comprising a high-k gate dielectric material and a metal-containing electrode material formed above said high-k gate dielectric material; and
an electronic fuse comprising a semiconductor material having an upper portion and a lower portion, said upper portion comprising an electrically inert species and having an increased etch resistivity compared to said lower portion.
12. The semiconductor device of claim 11 , wherein said electronic fuse further comprises a layer of a metal-containing material formed on a layer of said high-k gate dielectric material.
13. The semiconductor device of claim 11 , wherein said semiconductor material comprises silicon.
14. The semiconductor device of claim 11 , wherein said semiconductor material comprises germanium.
15. The semiconductor device of claim 11 , wherein said gate electrode structure has a gate length of approximately 50 nm or less.