Reticle carrier
View Patent ↗A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base plate forming a recess defined by the obverse surface of the rigid base plate and internal edges of the retaining ring. A reticle pad supports a reticle in the recess. The base plate and the reticle pad having an array of matching, aligned passageway holes therethrough for exhaustion of air from space between the base plate and a the reticle and for supply of air to that space so a vacuum can retain a the reticle in place on the reticle carrier under vacuum conditions and application of air under pressure can eject a reticle from the reticle carrier.
1. A damascene reticle formed in a transparent substrate having a top surface comprising:
a feature recess formed in said top surface of said transparent substrate; and
a radiation transmissivity modifying material formed in said feature recess.
2. The damascene reticle of claim 1 wherein said radiation transmissivity modifying material comprises a material selected from the group consisting of an opaque material, and a partially transmissive material.
3. The damascene reticle of claim 1 wherein a plurality of deposited films are included in said feature recess with said deposited films having different degrees of transmissivity.
4. The damascene reticle of claim 1 wherein said radiation transmissivity modifying material is selected from the group comprising:
at least two deposited films including an opaque film and a transmissive film; and
an opaque film deposited with a partially transmissive material.
5. A damascene reticle formed in a transparent substrate having a top surface comprising:
a feature recess formed in said top surface of said transparent substrate; and
a radiation transmissivity modifying material formed in said feature recess;
wherein said radiation transmissivity modifying material comprises an opaque film juxtaposed with a phase error correction material selected from the group consisting of a solid or a gas.
6. A damascene reticle formed in a transparent substrate having a top surface comprising:
a feature recess formed in said top surface of said transparent substrate; and
a radiation transmissivity modifying material formed in said feature recess;
wherein said feature recess having sidewalls, and said radiation transmissivity modifying material being spaced away from said sidewalls by a phase error correction material.
7. A damascene reticle formed in a transparent substrate having a top surface comprising:
a feature recess formed in said top surface of said transparent substrate;
a radiation transmissivity modifying material formed in said feature recess; and
a liner juxtaposed with said radiation transmissivity modifying material as a lens for focusing the exposure rays at the edge of the pattern to increase signal to noise levels, whereby scattering from the projected pattern is minimized.