IP Library Granted Patent US 8,964,482
Granted Patent B2
US 8,964,482 · App. 13/755,606 · Granted Feb 24, 2015

Dynamic healing of non-volatile memory cells

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Quick Facts
Patent No.
US 8,964,482
App. No.
13/755,606
Granted
Feb 24, 2015
Kind
B2
Abstract

Methods and systems are disclosed for dynamic healing of non-volatile memory (NVM) cells within NVM systems. The dynamic healing embodiments described herein relax damage within tunnel dielectric layers for NVM cells that occurs over time from charges (e.g., holes and/or electrons) becoming trapped within these tunnel dielectric layers. NVM operations with respect to which dynamic healing processes can be applied include, for example, erase operations, program operations, and read operations. For example, dynamic healing can be applied where performance for the NVM system degrades beyond a selected performance level for an NVM operation, such as elevated erase/program pulse counts for erase/program operations and bit errors for read operations. A variety of healing techniques can be applied, such as drain stress processes, gate stress processes, and/or other desired healing techniques.

Claims (29)

1. A method for dynamic healing of non-volatile memory (NVM) cells, comprising:

performing a memory operation for one or more non-volatile memory (NVM) cells within an NVM system, each NVM cell having a tunnel dielectric layer, a drain node, a source node, and at least one gate node;

determining performance information related to the memory operation; and

applying a healing process to the NVM cells if performance for the NVM cells has degraded beyond a selected performance level based upon the performance information;

wherein the applying step comprises at least one of applying a drain stress voltage to the drain nodes for the NVM cells or applying a gate stress voltage to the gate nodes for the NVM cells; and

wherein the healing process is configured to heal damage to the tunnel dielectric layers within the NVM cells.

2. The method of claim 1 , wherein the applying step is performed while junction temperatures within the NVM cells are at elevated temperature levels.

3. The method of claim 1 , wherein the memory operation comprises at least one of an erase operation or a program operation, wherein the performance information comprises an erase pulse count if the memory operation comprises the erase operation, and wherein the performance information comprises a program pulse count if the memory operation comprises the program operation.

4. The method of claim 1 , wherein the memory operation comprises a read operation and wherein the performance information comprises a bit error detected for the read operation.

5. The method of claim 1 , wherein after the healing process is applied, repeating the performing, determining, and applying steps until performance for the NVM cells is determined to meet the selected performance level.

6. The method of claim 1 , further comprising repeating the performing, determining, and applying steps over time and adjusting the selected performance level after one or more applying steps have been performed.

7. The method of claim 1 , further comprising determining if healing is enabled before performing the determining and applying steps.

8. The method of claim 7 , further comprising allowing healing to be independently enabled for two or more blocks of NVM cells.

9. The method of claim 1 , wherein the drain stress voltage, if applied, comprises a voltage of 3.0 volts to 5.0 volts applied for 1 to 100 seconds.

10. The method of claim 1 , wherein the gate stress voltage, if applied, comprises a voltage of 6.0 volts to 9.0 volts applied for 1 to 100 seconds.

11. A non-volatile memory (NVM) system, comprising:

an array of non-volatile memory (NVM) cells, each NVM cell having a tunnel dielectric layer, a drain node, a source node, and at least one gate node;

controller circuitry configured to perform a memory operation for one or more of the NVM cells, to determine performance information for the memory operation, and to apply a healing process to the NVM cells if performance for the NVM cells has degraded beyond a selected performance level based upon the performance information;

wherein the controller circuitry is further configured to apply at least one of a drain stress voltage to the drain nodes for the NVM cells as the healing process or a gate stress voltage to the gate nodes for the NVM cells as the healing process; and

wherein the healing process is configured to heal damage to the tunnel dielectric layers within the NVM cells.

12. The NVM system of claim 11 , wherein the memory operation comprises an erase operation and wherein the performance information comprises an erase pulse count for the erase operation.

13. The NVM system of claim 11 , wherein the memory operation comprises a program operation and wherein the performance information comprises a program pulse count for the program operation.

14. The NVM system of claim 11 , wherein the memory operation comprises a read operation and wherein the performance information comprises a bit error detected for the read operation.

15. The NVM system of claim 11 , wherein the controller circuitry is further configured to determine if healing is enabled before the healing process is applied.

16. The NVM system of claim 15 , wherein the controller circuitry is further configured to independently determine if healing is enabled for one or more blocks of NVM cells.

17. The NVM system of claim 11 , wherein the drain stress voltage comprises a voltage of 3.0 volts to 5.0 volts applied for 1 to 100 seconds, if the controller circuitry is configured to apply a drain stress voltage.

18. The NVM system of claim 11 , wherein the gate stress voltage comprises a voltage of 6.0 volts to 9.0 volts applied for 1 to 100 seconds, if the controller circuitry is configured to apply a gate stress voltage.

19. The NVM system of claim 11 , wherein the controller circuitry is further configured to repeat the healing process until performance for the NVM cells is determined to meet the selected performance level.

20. The NVM system of claim 11 , wherein the controller circuitry is further configured to adjust the selected performance level after one or more healing processes have been applied.

Assignments (21)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
MERGER Recorded Jan 3, 2017
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 041144/0363 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
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To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
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ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0704 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0744 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0725 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →
SECURITY AGREEMENT Recorded Jun 18, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
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ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2013
From: MU, FUCHEN; HE, CHEN; WANG, YANZHUO
To: FREESCALE SEMICONDUCTOR, INC.
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