III-N material grown on AIO/AIN buffer on Si substrate

1. III-N material grown on a silicon substrate comprising:

a single crystal silicon substrate;

a single crystal buffer positioned on the silicon substrate, the single crystal buffer including aluminum oxynitride positioned adjacent the silicon substrate and aluminum nitride adjacent the upper surface, the single crystal buffer being substantially crystal lattice matched to the surface of the silicon substrate;

a first layer of III-N material positioned on the surface of the buffer; and

an inter-layer of aluminum nitride (AlN) positioned on the surface of the first layer of III-N material and an additional layer of III-N material positioned on the surface of the inter-layer of aluminum nitride, the inter-layer of aluminum nitride and the additional layer of III-N material repeated n-times to reduce or engineer strain in a final III-N layer.

2. The III-N material grown on the silicon substrate as claimed in claim 1 wherein the aluminum oxynitride and the aluminum nitride are one of graded to have smooth changes in the aluminum oxynitride and the aluminum nitride or stepped to have abrupt changes in the aluminum oxynitride and the aluminum nitride.

3. The III-N material grown on the silicon substrate as claimed in claim 1 wherein the layer of III-N material includes one of an LED structure and an HEMT structure.

4. The III-N material grown on the silicon substrate as claimed in claim 3 wherein the LED structure includes at least one layer of i-GaN, n-GaN, an active layer, an electron blocking layer, or p-GaN.

5. The III-N material grown on the silicon substrate as claimed in claim 3 wherein the HEMT structure includes at least one layer of i-GaN, AlN, AlGaN, or GaN.

6. The III-N material grown on the silicon substrate as claimed in claim 1 wherein the first layer of III-N material includes epitaxially grown gallium nitride.

7. A method of growing III-N material on a silicon substrate comprising the steps of:

providing a single crystal silicon substrate;

growing or depositing a buffer on the silicon substrate, the buffer including single crystal aluminum oxynitride adjacent the silicon substrate and aluminum nitride adjacent an upper surface of the buffer, the aluminum oxynitride being substantially crystal lattice matched to the surface of the silicon substrate;

growing or depositing a first layer of III-N material on the upper surface of the buffer;

growing or depositing an inter-layer of aluminum nitride (AlN) on the first layer of III-N material;

growing or depositing an additional layer of III-N material on the surface of the layer of aluminum nitride; and

repeating the steps of growing or depositing the inter-layer of aluminum nitride and the additional layer of III-N material n-times to reduce or engineer strain in a final III-N layer.

8. The method as claimed in claim 7 wherein the step of

growing or depositing the buffer includes growing or depositing a single crystal layer of aluminum oxynitride on the silicon substrate, the aluminum oxynitride layer being substantially crystal lattice matched to the surface of the silicon substrate and growing or depositing a single crystal layer of aluminum nitride on the layer of aluminum oxynitride, the aluminum nitride layer being substantially crystal lattice matched to the surface of the aluminum oxynitride.

9. The method as claimed in claim 7 wherein the aluminum oxynitride and the aluminum nitride are epitaxially grown in a continuous process including one of graded to have smooth changes in the aluminum oxynitride and the aluminum nitride or stepped to have abrupt changes in the aluminum oxynitride and the aluminum nitride.

10. The method as claimed in claim 7 wherein the step of growing or depositing the first layer of III-N material includes depositing a layer of gallium nitride with a thickness in a range of approximately 50 nm to approximately 100 nm thick.

11. The method as claimed in claim 7 wherein the step of growing or depositing the inter-layer of aluminum nitride includes depositing a layer in a range of approximately 1 nm to approximately 10 nm thick.

12. The method as claimed in claim 7 wherein the step of growing or depositing the final layer of III-N material includes growing or depositing an LED structure on the final layer of III-N material.

13. The method as claimed in claim 12 wherein the step of growing the LED structure on the final layer of III-N material includes growing at least one layer including one of i-GaN, n-GaN, active layers, electron blocking layers, or p-GaN.

14. The method as claimed in claim 7 wherein the step of growing or depositing the final layer of III-N material includes growing an HEMT structure on the final layer of III-N material.

15. The method as claimed in claim 14 wherein the step of growing the HEMT structure on the final layer of III-N material includes growing at least one layer including one of, i-GaN, AlN, AlGaN, or GaN.

16. A method of growing III-N material on a silicon substrate comprising the steps of:

providing a single crystal silicon substrate;

epitaxially depositing a buffer on the silicon substrate, the buffer including single crystal aluminum oxynitride adjacent the silicon substrate and aluminum nitride adjacent an upper surface of the buffer, the aluminum oxynitride being substantially crystal lattice matched to the surface of the silicon substrate;

epitaxially depositing a first layer of GaN on the upper surface of the buffer;

epitaxially depositing an inter-layer of aluminum nitride (AlN) on the first GaN layer;

epitaxially depositing an additional layer of GaN on the surface of the aluminum nitride inter-layer;

repeating the steps of epitaxially depositing the inter-layer of aluminum nitride and the additional layer of GaN n-times to reduce or engineer strain in each subsequent additional layer of GaN to reduce or engineer strain in a final GaN layer; and

epitaxially depositing a III-N layer on the final GaN layer, the III-N layer including one of an LED structure and an HEMI structure.

17. A method as claimed in claim 16 wherein the step of epitaxially depositing the buffer includes epitaxially growing the aluminum oxynitride and the aluminum nitride in a continuous process including one of graded to have smooth changes in the aluminum oxynitride and the aluminum nitride or stepped to have abrupt changes in the aluminum oxynitride and the aluminum nitride.

18. The method as claimed in claim 16 wherein the step of

epitaxially depositing the buffer includes growing or depositing a single crystal layer of aluminum oxynitride on the silicon substrate, the aluminum oxynitride layer being substantially crystal lattice matched to the surface of the silicon substrate and growing or depositing a single crystal layer of aluminum nitride on the layer of aluminum oxynitride, the aluminum nitride layer being substantially crystal lattice matched to the surface of the aluminum oxynitride.