IP Library Granted Patent US 8,680,660
Granted Patent B1
US 8,680,660 · App. 13/798,052 · Granted Mar 25, 2014

Brace for bond wire

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Quick Facts
Patent No.
US 8,680,660
App. No.
13/798,052
Granted
Mar 25, 2014
Kind
B1
Abstract

In a semiconductor device having multiple tiers of bond wires extending in a first direction, dummy insulated bond wires extend in a second direction orthogonal to the first direction and between the wire tiers to support the wires in an upper tier to prevent them from sagging and contacting wires in a lower tier.

Claims (46)

1. A semiconductor device, comprising:

a die flag;

an integrated circuit die attached to a top surface of the die flag;

a plurality of first leads spaced from a first side edge of the die flag;

a first dummy lead spaced from a second side edge of the die flag;

a second dummy lead spaced from a third side edge of the die flag opposite the second side edge;

a plurality of first bond wires extending from a first set of bond pads on a top surface of the integrated circuit die to a first set of the plurality of first leads for electrically connecting the first set of bond pads to the first set of first leads;

a plurality of second bond wires extending from a second set of bond pads on the top surface of the integrated circuit die to a second set of the plurality of first leads for electrically connecting the second set of bond pads to the second set of first leads; and

at least one insulated bond wire extending from the first dummy lead to the second dummy lead and between the first and second pluralities of bond wires, wherein the at least one insulated bond wire prevents the plurality of second bond wires from sagging and contacting ones of the plurality of first bond wires.

2. The semiconductor device of claim 1 , wherein the at least one insulated bond wire comprises two insulated bond wires, the two insulated bond wires spaced from and parallel to each other.

3. The semiconductor device of claim 1 , wherein the at least one insulated bond wire comprises three insulated bond wires, each of the three insulated bond wires spaced from and parallel to each other.

4. The semiconductor device of claim 1 , wherein the first and second pluralities of bond wires comprise one of bare copper wires, bare aluminium wires, and bare gold wires.

5. The semiconductor device of claim 1 , wherein the first and second pluralities of bond wires have different loop heights.

6. The semiconductor device of claim 1 , wherein the top surface of the integrated circuit die lies in a first plane and the plurality of first leads lie in a second plane that is parallel to and spaced from the first plane.

7. The semiconductor device of claim 3 , wherein the first plane is higher than the second plane.

8. The semiconductor device of claim 1 , further comprising a die attach material between the integrated circuit die and the top surface of the die flag for securing the integrated circuit die to the top surface of the die flag.

9. The semiconductor device of claim 8 , further comprising a mold compound that encapsulates at least the top surface of the integrated circuit die, the first and second dummy leads, the at least one insulated bond wire, the first and second pluralities of bond wires, and a portion of the plurality of first leads.

10. A semiconductor device, comprising:

a die flag;

an integrated circuit die attached to a top surface of the die flag;

a plurality of first leads spaced from a first side edge of the die flag;

a first dummy lead spaced from a second side edge of the die flag;

a second dummy lead spaced from a third side edge of the die flag opposite the second side edge;

a plurality of first bond wires extending from a first set of bond pads on a top surface of the integrated circuit die to a first set of the plurality of first leads for electrically connecting the first set of bond pads to the first set of first leads;

a plurality of second bond wires extending from a second set of bond pads on the top surface of the integrated circuit die to a second set of the plurality of first leads for electrically connecting the second set of bond pads to the second set of first leads,

wherein the plurality of first bond wires have a different loop height than the plurality of second bond wires; and

at least one insulated bond wire extending from the first dummy lead to the second dummy lead and between the first and second pluralities of bond wires, wherein the at least one insulated bond wire prevents the plurality of second bond wires from sagging and contacting ones of the plurality of first bond wires.

11. The semiconductor device of claim 10 , wherein the at least one insulated bond wire comprises two insulated bond wires, the two insulated bond wires spaced from and parallel to each other.

12. The semiconductor device of claim 10 , wherein the at least one insulated bond wire comprises three insulated bond wires, each of the three insulated bond wires spaced from and parallel to each other.

13. The semiconductor device of claim 10 , wherein the first and second pluralities of bond wires comprise one of bare copper wires, bare aluminium wires, and bare gold wires.

14. The semiconductor device of claim 10 , further comprising a die attach material between the integrated circuit die and the top surface of the die flag for securing the integrated circuit die to the top surface of the die flag.

15. The semiconductor device of claim 14 , further comprising a mold compound that encapsulates at least the top surface of the integrated circuit die, the first and second dummy leads, the at least one insulated bond wire, the first and second pluralities of bond wires, and a portion of the plurality of first leads.

16. A semiconductor device, comprising:

a die flag;

an integrated circuit die attached to a top surface of the die flag;

a plurality of first leads spaced from a first side edge of the die flag;

a dummy lead spaced from a second side edge of the die flag that is adjacent to the first side edge of the die flag;

a plurality of first bond wires extending from a first set of bond pads on a top surface of the die to a first set of the plurality of first leads for electrically connecting the first set of bond pads to the first set of first leads;

a plurality of second bond wires extending from a second set of bond pads on the top surface of the integrated circuit die to a second set of the plurality of first leads for electrically connecting the second set of bond pads to the second set of first leads; and

at least one insulated bond wire extending from a third bond pad on a top surface of the integrated circuit die and near an edge of the integrated circuit die to the dummy lead and between the first and second pluralities of bond wires, wherein the at least one insulated bond wire prevents the plurality of second bond wires from sagging and contacting ones of the plurality of first bond wires.

17. The semiconductor device of claim 16 , wherein the at least one insulated bond wire comprises two insulated bond wires, wherein the second insulated bond wire extends from a fourth bond pad on the surface of the integrated circuit die proximate to the third bond pad to the dummy lead.

18. The semiconductor device of claim 16 , wherein the first and second pluralities of bond wires have different loop heights.

19. The semiconductor device of claim 16 , wherein the first and second pluralities of bond wires comprise one of bare copper wires, bare aluminium wires, and bare gold wires.

20. The semiconductor device of claim 16 , further comprising:

a die attach material between the integrated circuit die and the top surface of the die flag for securing the integrated circuit die to the top surface of the die flag; and

a mold compound that encapsulates at least the top surface of the integrated circuit die, the first dummy lead, the at least one insulated bond wire, the first and second pluralities of bond wires, and a portion of the plurality of first leads.

Assignments (17)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040632 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Sep 21, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 044209/0047 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 040632/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0744 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0725 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0704 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →