IP Library Granted Patent US 8,833,564
Granted Patent B1
US 8,833,564 · App. 13/798,706 · Granted Sep 16, 2014

Systems and methods for reducing dust in granular material

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Quick Facts
Patent No.
US 8,833,564
App. No.
13/798,706
Granted
Sep 16, 2014
Kind
B1
Abstract

A method of removing dust from granular polysilicon includes introducing a stream of granular polysilicon, dispersing the longitudinal stream of granular polysilicon by redirecting the stream into a radially outward flow having a circular pattern, and introducing a counter flow of gas in an opposite direction to that of the longitudinal stream of granular polysilicon to contact the radially outward flow to separate the dust from the granular polysilicon.

Claims (14)

1. A method of removing dust from granular polysilicon, the method comprising:

introducing a stream of granular polysilicon into a canister from an inlet positioned opposite a disperser;

dispersing the stream of granular polysilicon by redirecting the stream into a radially outward flow by the disperser;

introducing a counter flow of gas in an opposite direction to that of the stream of granular polysilicon to contact the radially outward flow to separate the dust from the granular polysilicon;

wherein the inlet is connected with a domed hood located within the canister to prevent reversed flow of the stream of granular polysilicon from the inlet into a dust outlet;

introducing a cross-flow of gas to increase turbulence of the radially outward flow radially outward from a center axis of the canister from below the domed hood and the inlet.

2. The method of claim 1 , further comprising the step of pulling a vacuum through the dust outlet located above the inlet to pull the dust from the granular polysilicon.

3. The method of claim 1 , further comprising the step of packaging the granular polysilicon after the dust has been removed.

4. The method of claim 1 , wherein the domed hood has a first opening with a first cross-sectional area adjacent the inlet that is substantially larger than a second cross-sectional area of a second opening adjacent the interior of the canister.

5. The method of claim 4 , wherein the canister has an interior cross-sectional area that is substantially larger than the second cross-sectional area.

6. The method of claim 1 , wherein the disperser is conically shaped to redirect the stream of granular polysilicon radially outward in a circular pattern.

7. The method of claim 1 , wherein the counter flow of gas is introduced from a position below the disperser.

8. The method of claim 1 , further comprising the step of adjusting the counter flow of gas to regulate the size of granular polysilicon passing through the canister.

9. The method of claim 1 , further comprising the step of removing the granular polysilicon from the canister after removal of the dust through a collection port.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 7, 2018
From: SUNEDISON SEMICONDUCTOR LIMITED; MEMC JAPAN LIMITED; MEMC ELECTRONIC MATERIALS S.P.A.
To: GLOBALWAFERS CO., LTD.
Reel/Frame 046327/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2014
From: MEMC ELECTRONIC MATERIALS, INC.
To: SUNEDISON SEMICONDUCTOR LIMITED (UEN201334164H)
Reel/Frame 032963/0522 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 23, 2014
From: YUN, SEOK-MIN; PARK, SEONG-SU; KIM, SE-MYUNG; CHOI, WON-JIN; YOON, WOO-JIN
To: MEMC ELECTRONIC MATERIALS, INC.
Reel/Frame 032735/0111 →