Parallel shunt paths in thermally assisted magnetic memory cells
View Patent ↗A thermally assisted magnetic memory cell device includes a substrate, a first electrode disposed on the substrate, a magnetic tunnel junction disposed on the first electrode, a second electrode disposed on the magnetic tunnel junction, a conductive hard mask disposed on the second electrode and a parallel shunt path coupled to the magnetic tunnel junction, thereby electrically coupling the first and second electrodes.
1. A thermally assisted magnetic memory cell device, comprising:
a substrate;
a first electrode disposed on the substrate;
a magnetic tunnel junction (MTJ) disposed on the first electrode;
a second electrode disposed on the MTJ;
a conductive hard mask disposed on the second electrode; and
a conductive material disposed on sides of the MTJ, such that the conductive material forms a parallel shunt path coupled to the MTJ, thereby electrically coupling the first and second electrodes.
2. The device as claimed in claim 1 further comprising a contact electrically coupled to the conductive hard mask and to the parallel shunt path.
3. The device as claimed in claim 1 wherein resistance of the parallel shunt path is less than resistance of the MTJ.
4. The device as claimed in claim 1 wherein resistance of the parallel shunt path is selected based on the material of the parallel shunt path.
5. The device as claimed in claim 1 further comprising an insulating passivation layer disposed between the MTJ and the parallel shunt path.
6. The device as claimed in claim 5 wherein resistance of the parallel shunt path is selected based on geometry and material of the parallel shunt path.
7. The device as claimed in claim 1 wherein the parallel shunt path is thermally coupled to the MTJ.
8. A thermally assisted magnetic memory cell device, comprising:
a magnetic tunnel junction (MTJ) structure;
a conductive material disposed on sides of the MTJ structure, such that the conductive material forms a parallel shunt path coupled to the MTJ structure; and
a contact electrically coupled to the MTJ structure and to the parallel shunt path of the conductive material.
9. The device as claimed in claim 8 wherein the MTJ structure includes an MTJ.
10. The device as claimed in claim 9 wherein resistance of the parallel shunt path is less than resistance of the MTJ.
11. The device as claimed in claim 9 wherein resistance of the parallel shunt path is selected based on the material of the parallel shunt path.
12. The device as claimed in claim 9 further comprising an insulating passivation layer disposed between the MTJ structure and the parallel shunt path.
13. The device as claimed in claim 9 wherein the parallel shunt path is thermally coupled to the MTJ structure.
14. The device as claimed in claim 12 wherein resistance of the parallel shunt path is selected based on geometry and material of the parallel shunt path.