IP Library Granted Patent US 10,241,623
Granted Patent B2
US 10,241,623 · App. 13/828,021 · Granted Mar 26, 2019

Reduction of touch sensor pattern visibility using beamsplitters

Inventors: Esat Yilmaz (Santa Cruz, CA); Neerja Saran (Fremont, CA)
Assignee: Neodrón Limited
G06F3/042G06F3/044G06F3/0421Y10S977/742
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Quick Facts
Patent No.
US 10,241,623
App. No.
13/828,021
Filed
Mar 14, 2013
Granted
Mar 26, 2019
Kind
B2
Art Unit
2622
USPC
345/175
Abstract

In one embodiment, a touch sensor comprises a beamsplitter operable to reflect a first portion of light incident on the beamsplitter and transmit a second portion of light incident on the beamsplitter, a substrate, and one or more lines of conductive material disposed on the substrate, the lines of conductive material disposed between the first substrate and the beamsplitter.

Claims (36)

1. A touch sensor comprising:

a beamsplitter operable to reflect a first portion of light incident on the beamsplitter and transmit a second portion of light incident on the beamsplitter, wherein the first portion of light is in the range of 50% to 75% and the second portion of light is in the range of 25% to 50%;

a first substrate;

one or more lines of metal material disposed on the first substrate, the one or more lines of metal material disposed between the first substrate and the beamsplitter; and

a layer of anti-reflective coating disposed between the beamsplitter and the one or more lines of metal material

wherein the beamsplitter is deposited over a cover layer of the touch sensor, the layer of anti-reflective material being between the first substrate and the cover layer, the cover layer being between the beamsplitter and the first substrate, the beamsplitter, the cover layer, and the first substrate adapted to be positioned over a display.

2. The touch sensor of claim 1 , wherein the one or more lines of metal material comprises a first set of lines of metal material and a second set of lines of metal material, the first set of lines disposed above the first substrate, the second set of lines disposed below the first substrate.

3. The touch sensor of claim 1 , further comprising a second substrate disposed between the beamsplitter and the anti-reflective coating.

4. The touch sensor of claim 3 , wherein refractive indices of the beamsplitter, the second substrate, and the anti-reflective coating are substantially similar to each other.

5. The touch sensor of claim 1 , wherein the lines of metal material form a plurality of electrodes, each electrode of the plurality of electrodes comprising a mesh formed by at least a portion of the lines of metal material.

6. The touch sensor of claim 1 , wherein refractive indices of the beamsplitter, the first substrate, and the anti-reflective coating are substantially similar to each other.

7. The touch sensor of claim 1 , further comprising a self-adhesive that couples the beamsplitter to a top surface of the cover layer of the touch sensor.

8. A system, comprising:

a controller;

a touch sensor comprising:

a display;

a beamsplitter operable to reflect a first portion of light incident on the beamsplitter and transmit a second portion of light incident on the beamsplitter, wherein the first portion of light is in the range of 50% to 75%, and the second portion of light is in the range of 25% to 50%;

one or more lines of metal material disposed on a first substrate between the display and the beamsplitter; and

a layer of anti-reflective coating disposed between the beamsplitter and the one or more lines of metal material;

wherein the beamsplitter is deposited over a cover layer of the touch sensor, the layer of anti-reflective material being between the first substrate and the cover layer, the cover layer being between the beamsplitter and the first substrate, the beamsplitter, the cover layer, and the first substrate positioned over the display; and

one or more computer-readable non-transitory storage media coupled to the touch sensor and embodying logic that is configured when executed to control the touch sensor.

9. The system of claim 8 , wherein the one or more lines of metal material comprises a first set of lines of metal material and a second set of lines of metal material, the first set of lines disposed above the first substrate, the second set of lines disposed below the first substrate.

10. The system of claim 8 , further comprising a second substrate disposed between the beamsplitter and the anti-reflective coating.

11. The system of claim 10 , wherein refractive indices of the beamsplitter, the second substrate, and the anti-reflective coating are substantially similar to each other.

12. The system of claim 8 , wherein the lines of metal material form a plurality of electrodes, each electrode of the plurality of electrodes comprising a mesh formed by at least a portion of the lines of metal material.

13. A device comprising:

a display;

a beamsplitter operable to reflect a first portion of light incident on the beamsplitter and transmit a second portion of light incident on the beamsplitter, wherein the first portion of light is in the range of 50% to 75%, and the second portion of light is in the range of 25% to 50%;

a touch sensor comprising one or more lines of metal material disposed on a first substrate between the display and the beamsplitter, the touch sensor comprising a cover layer;

a layer of anti-reflective coating disposed between the beamsplitter and the one or more lines of metal material;

wherein the beamsplitter is deposited over the cover layer of the touch sensor, the layer of anti-reflective material being between the first substrate and the cover layer, the cover layer being between the beamsplitter and the first substrate, the beamsplitter, the cover layer, and the first substrate positioned over the display; and

a touch-sensor controller operable to apply a voltage to at least a portion of the metal material.

14. The device of claim 13 , wherein the one or more lines of metal material comprises a first set of lines of metal material and a second set of lines of metal material, the first set of lines disposed above the first substrate, the second set of lines disposed below the first substrate.

15. The device of claim 13 , further comprising a second substrate disposed between the beamsplitter and the anti-reflective coating.

16. The device of claim 15 , wherein refractive indices of the beamsplitter, the second substrate, and the anti-reflective coating are substantially similar to each other.

17. The device of claim 13 , wherein the lines of metal material form a plurality of electrodes, each electrode of the plurality of electrodes comprising a mesh formed by at least a portion of the lines of metal material.

Assignments (12)
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0001 →
RELEASE OF SECURITY INTEREST Recorded Feb 28, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: ATMEL CORPORATION
Reel/Frame 059262/0105 →
RELEASE OF SECURITY INTEREST Recorded Feb 25, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059333/0222 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 5, 2019
From: MICROCHIP TECHNOLOGY INC.; ATMEL CORPORATION; MICROCHIP TECHNOLOGY GERMANY GMBH
To: NEODRÓN LIMITED
Reel/Frame 048259/0840 →
RELEASE OF SECURITY INTEREST IN CERTAIN PATENT RIGHTS Recorded Dec 21, 2018
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; ATMEL CORPORATION
Reel/Frame 047976/0884 →
RELEASE OF SECURITY INTEREST IN CERTAIN PATENT RIGHTS Recorded Dec 21, 2018
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; ATMEL CORPORATION
Reel/Frame 047976/0937 →
SECURITY INTEREST Recorded Sep 18, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 047103/0206 →
SECURITY INTEREST Recorded Jun 25, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 046426/0001 →
SECURITY INTEREST Recorded Feb 10, 2017
From: ATMEL CORPORATION
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 041715/0747 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT COLLATERAL Recorded Apr 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: ATMEL CORPORATION
Reel/Frame 038376/0001 →
PATENT SECURITY AGREEMENT Recorded Jan 3, 2014
From: ATMEL CORPORATION
To: MORGAN STANLEY SENIOR FUNDING, INC. AS ADMINISTRATIVE AGENT
Reel/Frame 031912/0173 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2013
From: YILMAZ, ESAT; SARAN, NEERJA
To: ATMEL CORPORATION
Reel/Frame 030002/0935 →
Continuity (1)
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