IP Library Granted Patent US 9,117,670
Granted Patent B2
US 9,117,670 · App. 13/829,021 · Granted Aug 25, 2015

Inject insert liner assemblies for chemical vapor deposition systems and methods of using same

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Quick Facts
Patent No.
US 9,117,670
App. No.
13/829,021
Granted
Aug 25, 2015
Kind
B2
Abstract

A system for depositing a layer on a substrate includes a processing chamber, a gas injecting port for introducing gas into the system, a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein, and an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber. The inject insert liner assembly defines gas flow channels therein extending along a lengthwise direction of the system, wherein each channel includes an inlet and an outlet, and at least one channel is tapered along the lengthwise direction of the system in at least one of a vertical or horizontal direction. The inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.

Claims (39)

1. A system for depositing a layer on a substrate, the system comprising:

a processing chamber;

a gas injecting port for introducing gas into the system, the gas injecting port disposed upstream from the processing chamber;

a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein;

an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber, the inject insert liner assembly defining gas flow channels therein extending along a lengthwise direction of the system, wherein the inject insert liner assembly defines an inlet of each channel adjacent to the gas distribution plate and an outlet of each channel downstream from the inlet; and

a chamber liner positioned adjacent to and downstream from the inject insert liner assembly, the chamber liner at least partially defining a gas inlet in fluid communication with at least one of the gas flow channels defined by the inject insert liner assembly;

wherein at least one of the gas flow channels is tapered between the channel inlet and the channel outlet along the lengthwise direction of the system in at least one of a vertical or horizontal direction, and wherein the inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.

2. The system as set forth in claim 1 wherein each channel corresponds to a single hole in the gas distribution plate and each inlet of each channel has a cross-sectional area less than about 5 times a cross-sectional area of a gas distribution plate hole corresponding to that channel.

3. The system as set forth in claim 1 wherein at least one channel is tapered outwardly in the horizontal direction from the channel inlet to the channel outlet.

4. The system as set forth in claim 3 wherein at least one channel tapered outwardly in the horizontal direction is tapered at an angle of between about 1 degree and about 15 degrees in the horizontal direction.

5. The system as set forth in claim 1 wherein at least one channel is tapered outwardly in the vertical direction from the channel inlet to the channel outlet.

6. The system as set forth in claim 5 wherein at least one channel tapered outwardly in the vertical direction is tapered at an angle of between about 1 degree and about 15 degrees in the vertical direction.

7. The system as set forth in claim 1 wherein at least one channel is tapered inwardly in the vertical direction from the channel inlet to the channel outlet.

8. The system as set forth in claim 1 wherein the gas distribution plate and the inject insert liner assembly are a unitary member.

9. The system as set forth in claim 1 wherein the inject insert liner assembly includes an upper half and a lower half.

10. A system for depositing a layer on a substrate, the system comprising:

a processing chamber;

a gas injecting port for introducing gas into the system, the gas injecting port disposed upstream from the processing chamber;

a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein;

an inject insert liner assembly received within the system adjacent to the gas distribution plate and upstream from the processing chamber, the inject insert liner assembly defining gas flow channels therein extending along a lengthwise direction of the system, the inject insert liner assembly defining an inlet of each channel adjacent to the gas distribution plate and an outlet of each channel downstream from the inlet; and

a chamber liner positioned adjacent to and downstream from the inject insert liner assembly, the chamber liner at least partially defining a gas inlet in fluid communication with at least one of the gas flow channels defined by the inject insert liner assembly;

wherein each channel is tapered from the channel inlet to the channel outlet along the lengthwise direction of the system in at least one of a vertical or horizontal direction.

11. The system as set forth in claim 10 wherein the inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.

12. The system as set forth in claim 11 wherein each channel corresponds to a single hole in the gas distribution plate and each inlet of each channel has a cross-sectional area less than 5 times a cross-sectional area of a gas distribution plate hole corresponding to that channel.

13. The system as set forth in claim 10 wherein at least one channel is tapered outwardly in the horizontal direction from the channel inlet to the channel outlet.

14. The system as set forth in claim 13 wherein at least one channel tapered in the horizontal direction is tapered at an angle of between about 1 degree and about 15 degrees in the horizontal direction.

15. The system as set forth in claim 10 wherein at least one channel is tapered outwardly in the vertical direction from the channel inlet to the channel outlet.

16. The system as set forth in claim 15 wherein at least one channel tapered outwardly in the vertical direction is tapered at an angle of between about 1 degree and about 15 degrees in the vertical direction.

17. The system as set forth in claim 10 wherein at least one channel is tapered inwardly in the vertical direction from the channel inlet to the channel outlet.

18. The system as set forth in claim 10 wherein the inject insert liner assembly is a unitary member.

19. The system as set forth in claim 10 wherein the inject insert liner assembly includes an upper half and a lower half.

20. A system for depositing a layer on a substrate, the system comprising:

a processing chamber;

a gas injecting port for introducing gas into the system, the gas injecting port disposed upstream from the processing chamber;

a gas distribution plate disposed between the gas injecting port and the processing chamber, the gas distribution plate including holes therein; and

an inject insert liner assembly abutting the gas distribution plate, the inject insert liner assembly defining gas flow channels therein extending along a lengthwise direction of the system, the inject insert liner assembly defining an inlet of each channel adjacent to the gas distribution plate and an outlet of each channel downstream from the inlet, wherein each channel is continuously and gradually tapered from the channel inlet to the channel outlet in at least one of a vertical or horizontal direction.

21. The system as set forth in claim 20 , further comprising a chamber liner positioned adjacent to and downstream from the inject insert liner assembly, the chamber liner at least partially defining a gas inlet in fluid communication with at least one of the gas flow channels defined by the inject insert liner assembly.

22. The system as set forth in claim 20 wherein the inject insert liner assembly has the same number of gas flow channels as the number of holes in the gas distribution plate.

23. The system of claim 22 , wherein each channel corresponds to single hole in the gas distribution plate and each inlet of each channel has a cross-sectional area less than 5 times a cross-sectional area of a gas distribution plate hole corresponding to that channel.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 7, 2018
From: SUNEDISON SEMICONDUCTOR LIMITED; MEMC JAPAN LIMITED; MEMC ELECTRONIC MATERIALS S.P.A.
To: GLOBALWAFERS CO., LTD.
Reel/Frame 046327/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 22, 2014
From: SUNEDISON SEMICONDUCTOR PTE. LTD. (UEN201334164H)
To: SUNEDISON SEMICONDUCTOR LIMITED (UEN201334164H)
Reel/Frame 032947/0117 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 2, 2014
From: ABEDIJABERI, ARASH; PITNEY, JOHN A.; THOMAS, SHAWN G.
To: SUNEDISON SEMICONDUCTOR PTE. LTD. (UEN201334164H)
Reel/Frame 032810/0230 →