IP Library Granted Patent US 9,099,633
Granted Patent B2
US 9,099,633 · App. 13/850,267 · Granted Aug 4, 2015

Solid electrolyte memory elements with electrode interface for improved performance

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Quick Facts
Patent No.
US 9,099,633
App. No.
13/850,267
Granted
Aug 4, 2015
Kind
B2
Abstract

A memory element can include a first electrode; a second electrode; and a memory material programmable between different resistance states, the memory material disposed between the first electrode and the second electrode and comprising a solid electrolyte with at least one modifier element formed therein; wherein the first electrode is an anode electrode that includes an anode element that is ion conductible in the solid electrolyte, the anode element being different than the modifier element.

Claims (41)

1. A memory element, comprising: a first electrode; a second electrode; and a memory material disposed between the first electrode and the second electrode and comprising a solid electrolyte programmable between the different resistance states with at least one modifier element formed therein that is different from elements of the solid electrolyte; wherein

the first electrode is an anode electrode that includes an anode element that is ion conductible in the solid electrolyte, the anode element being different than the modifier element, and

the modifier element is not ion conductible in the solid electrolyte, and selected from the group of: a post transition metal, a non-metal, titanium, tantalum, zirconium and hafnium.

2. The memory element of claim 1 , wherein:

the modifier element is selected from the group of: aluminum and tin.

3. The memory element of claim 1 , wherein:

the solid electrolyte is selected from the group of: a chalcogen based solid electrolyte and a metal oxide.

4. The memory element of claim 1 , wherein:

the modifier element is selected from the group of: nitrogen and oxygen.

5. A method of fabricating a memory element, comprising:

forming a first electrode;

forming a second electrode; and

forming a memory layer between the first and second electrodes,

the memory layer comprising a solid electrolyte layer programmable between different resistance states, a portion of the solid electrolyte layer having a modifier element formed therein to form an interface layer;

wherein

the first electrode is an anode electrode that includes an anode element that is ion conductible in the solid electrolyte, the anode element being different than the modifier element.

6. The method of claim 5 , wherein:

forming the memory layer includes depositing a metal oxide as the solid electrolyte layer with the modifier element.

7. The method of claim 5 , wherein:

forming the memory layer includes depositing a chalcogen based solid electrolyte with the modifier element.

8. The method of claim 5 , wherein:

forming the memory layer includes sputtering at least the modifier element.

9. The method of claim 5 , wherein:

the modifier element comprises a transition metal.

10. The method of claim 5 , wherein:

the modifier element is selected from the group of: titanium, tantalum, zirconium and hafnium.

11. The method of claim 5 , wherein:

the modifier element comprises a non-metal.

12. The method of claim 5 , wherein:

forming the first electrode includes forming a layer comprising titanium.

13. A memory element, comprising:

a first electrode;

a second electrode; and

a memory material programmable between different resistance states, the memory material disposed between the first electrode and the second electrode and comprising a solid electrolyte with at least one modifier element formed in only a portion thereof, to create an interface layer; wherein

the first electrode is an anode electrode that includes an anode element that is ion conductible in the solid electrolyte, the anode element being different than the modifier element.

14. The memory element of claim 13 , wherein:

the modifier element comprises a transition metal.

15. The memory element of claim 13 , wherein:

the modifier element is selected from the group of titanium, tantalum, zirconium and hafnium.

16. The memory element of claim 13 , wherein:

the modifier element is selected from the group of: a post-transition metal and a non-metal.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 20, 2023
From: RENESAS DESIGN US INC. (FORMERLY KNOWN AS DIALOG SEMICONDUCTOR US INC. AS SUCCESSOR-IN-INTEREST TO ADESTO TECHNOLOGIES CORPORATION AND ARTEMIS ACQUISITION, LLC)
To: GLOBALFOUNDRIES U.S. INC.
Reel/Frame 063118/0352 →
RELEASE OF SECURITY INTEREST Recorded Sep 24, 2019
From: OBSIDIAN AGENCY SERVICES, INC., AS COLLATERAL AGENT
To: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
Reel/Frame 050480/0836 →
RELEASE OF SECURITY INTEREST Recorded May 9, 2019
From: OPUS BANK
To: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
Reel/Frame 049125/0970 →
SECURITY INTEREST Recorded May 8, 2018
From: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
To: OBSIDIAN AGENCY SERVICES, INC., AS COLLATERAL AGENT
Reel/Frame 046105/0731 →
SECURITY INTEREST Recorded May 22, 2015
From: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
To: OPUS BANK
Reel/Frame 035754/0580 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 30, 2013
From: GOPALAN, CHAKRAVARTHY; LEE, WEI TI; MA, YI; SHIELDS, JEFFREY ALLAN
To: ADESTO TECHNOLOGIES CORPORATION
Reel/Frame 031514/0561 →