Method of fabricating MEMS device having release etch stop layer
View Patent ↗A method of fabricating a microelectromechanical (MEMS) device includes bonding a transducer wafer to a substrate wafer along a bond interface. An unpatterned transducer layer included within the transducer wafer is patterned. A release etch process is then performed during which a sacrificial layer is exposed to a selected release etchant to remove at a least a portion of the sacrificial layer through the openings in the patterned transducer layer. A release etch stop layer is formed between the sacrificial layer and the bond interface prior to exposing the sacrificial layer to the release etchant. The release etch stop layer prevents the ingress of the selected release etchant into the region of the MEMS device containing the bond interface during the release etch process.
1. A Microelectromechanical Systems (“MEMS”) device, comprising:
a substrate wafer portion comprising:
a MEMS substrate having opposite upper and lower principal surfaces; and
an upper dielectric layer formed over the upper principal surface of the MEMS substrate; and
a transducer wafer portion bonded to the substrate wafer portion along a bond interface, the transducer wafer portion comprising:
a patterned transducer layer;
an electrically-conductive interconnect layer formed below and partially ohmically contacting a bottom surface of the patterned transducer layer with an electrically-conductive plug thereof;
a void area partially between the patterned transducer layer and the electrically-conductive interconnect layer formed by etching a sacrificial layer previously located between the patterned transducer layer and the electrically-conductive interconnect layer with an etchant; and
a release etch stop layer formed between the patterned transducer layer and the bond interface that deters ingress of the etchant into the upper dielectric layer.
2. The MEMS device of claim 1 , wherein the transducer wafer portion further comprises an interconnect layer underlying and ohmically coupled to at least one region of the patterned transducer layer, the release etch stop layer formed under and contacting at least a portion of the interconnect layer.
3. The MEMS device of claim 1 , further comprising:
a first oxide layer included within the substrate wafer portion; and
a second oxide layer included within the transducer wafer portion and fusion bonded to the first oxide layer along the bond interface, the release etch stop layer having an etch rate less than the first oxide layer and less than the second oxide layer when exposed to a hydrogen fluoride-based etchant.
4. The MEMS device of claim 1 , wherein the release etch stop layer comprises a material selected from the group consisting of an aluminum oxide and an aluminum fluoride.