Selective gate oxide properties adjustment using fluorine
View Patent ↗Fluorine is located in selective portions of a gate oxide to adjust characteristics of the gate oxide. In some embodiments, the fluorine promotes oxidation which increases the thickness of the selective portion of the gate oxide. In some embodiments, the fluorine lowers the dielectric constant of the oxide at the selective portion. In some examples, having fluorine at selective portions of a select gate oxide of a non volatile memory may reduce program disturb of the memory.
1. A method for forming a device, comprising:
forming an oxide layer on a substrate including a semiconductor material;
forming a gate layer over the oxide layer;
patterning the gate layer and the oxide layer to form a gate electrode over a gate oxide;
performing an angled implant of fluorine into locations of the device such that the gate oxide has an edge portion between the gate electrode and the substrate with a first concentration of fluorine and a non-edge portion between the gate electrode and the substrate with a second concentration of fluorine that is different than the first concentration;
forming a trench in the substrate; and
filling the trench with isolation material, wherein the performing the angled implant is performed after the forming the isolation trench and before the filling the trench, wherein the performing the angled implant implants fluorine into sidewalls of the trench.
2. The method of claim 1 , wherein the forming the oxide layer, the forming the gate layer, and the patterning the gate layer and the oxide layer are performed after the performing the angled implant, and wherein the edge portion of the gate oxide is closer to the trench than is the non-edge portion of the gate oxide.
3. The method of claim 1 , wherein the performing the angled implant is performed after patterning the gate layer and the oxide layer to define at least one side wall of the gate electrode, wherein the performing the angled implant implants fluorine into the gate oxide and into the substrate below the gate oxide.
4. The method of claim 3 , wherein the gate electrode is further characterized as a select gate of a non-volatile memory cell, and the method further comprises:
after the performing the angled implant, forming a charge storage layer overlapping a sidewall of the select gate, and forming a control gate over the charge storage layer.
5. The method of claim 1 wherein the performing an angled implant of fluorine into locations of the device include implanting fluorine into a region of the substrate, wherein the method includes oxidizing at least a portion of the region of the substrate to increase a thickness of the gate oxide.
6. A method for forming a device, comprising:
forming a trench in a substrate including a semiconductor material;
performing an angled implant to implant fluorine into sidewalls of the trench;
filling the trench with isolation material;
forming an oxide layer on the substrate adjacent the trench;
forming a gate layer over the oxide layer; and
patterning the gate layer and the oxide layer to form a gate electrode over a gate oxide, wherein the gate oxide has an edge portion between the gate electrode and the substrate with a first concentration of fluorine and a non-edge portion between the gate electrode and the substrate with a second concentration of fluorine, the first concentration is at least 10 times greater than the second concentration.