IP Library › Granted Patent US 9,333,624
Granted Patent B2
US 9,333,624 · App. 13/874,788 · Granted May 10, 2016

Method and device for cutting out hard-brittle substrate and protecting regions on the substrate

Inventors: Keiji Mase (Tokyo, JP); Daisuke Chino (Tokyo, JP); Masato Hinata (Tokyo, JP)
Assignee: FUJI MANUFACTURING CO., LTD
B24C1/045B24C1/04B24C3/18B24C3/32
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Quick Facts
Patent No.
US 9,333,624
App. No.
13/874,788
Granted
May 10, 2016
Kind
B2
Abstract

To cut out a hard-brittle substrate by blasting, laying out substrates 2 on a plate material 1 made of a hard-brittle material with leaving a space for blasting; forming first protective films 4 on both surfaces of the plate material 1 at layout positions of the substrates 2; and forming second protective films 5 on both surfaces of a margin 3 of the plate material 1 with leaving a space with respect to the first protective films 4 and having outer edges from a periphery of the plate material 1 at a width of 5 mm or less; cutting regions 6 between the films 4, 4 and between the films 4, 5 from one surface of the plate material 1 to a depth of approximately half of a thickness thereof by blasting, then cutting from the other surface of the plate material 1 until the plate material 1 is penetrated.

Claims (8)

1. A method for cutting out a hard-brittle substrate comprising: laying out a plurality of first protective films with blast resistant property having shapes corresponding to a plurality of substrate to be cut out on a plate material made of a hard-brittle material with leaving cutting regions required for cutting by blasting, and forming second protective films with blast resistant property on outer edges of the substrate with leaving the cutting regions, and covering a margin of the plate material with the second protective film so that an exposed width, which is not covered with the second protective film, on a peripheral portion located outer periphery on each of front and back surfaces of the plate material is equal to or less than 5 mm;

Setting the cutting regions on the regions of which having no first and second protective films formed between the first protective films, and between the first protective film and the second protective film;

Forming the first protective films and the second protective films on the front and back surfaces of the plate material at the same positions so as to opposite each other; and

Cutting the cutting regions from either one surface of the plate material to a depth of approximately half of a plate thickness of the plate material, then cutting the cutting region from the other surface of the plate material until communicating with a cut portion from said one surface of the plate material.

2. The method for cutting out a hard-brittle substrate according to claim 1 , wherein a width of the cutting region is equal to or less than 5 mm.

3. The method for cutting out a hard-brittle substrate according to claim 1 , wherein the cutting region of the plate material is cut to a depth of approximately a half of the plate thickness by blasting from a back surface side of the plate material in a state that the plate material is floated by fixing by suction a front surface of the plate material, then portions where the first protective films are formed in the back surface of the plate material are mounted and fixed by suction on suction fixing bases for substrates with plane shapes respectively corresponding to the substrates, and the margin where the second protective films are formed is mounted on a margin base to cut the cutting region by blasting from a front surface side of the plate material.

4. The method for cutting out a hard-brittle substrate according to claim 1 , wherein an abrasive to be ejected by blasting, selected from silicon carbide, aluminum oxide, zircon, zirconia, diamond, cerium oxide, stainless steel, cast steel, alloy steel, high-speed steel, tungsten carbide or FeCrB has a hardness of Hv 700 to Hv 9000, a true specific gravity of 3.0 to 15.3 and a median diameter of 20 μm to 100 μm, and the abrasive with a substantially spherical shape is ejected at an ejection speed of 100 m/s to 250 m/s or at an ejection pressure of 0.2 MPa to 0.5 MPa.

5. The method for cutting out a hard-brittle substrate according to claim 3 , wherein an abrasive to be ejected by blasting, selected from silicon carbide, aluminum oxide, zircon, zirconia, diamond, cerium oxide, stainless steel, cast steel, alloy steel, high-speed steel, tungsten carbide or FeCrB has a hardness of Hv 700 to Hv 9000, a true specific gravity of 3.0 to 15.3 and a median diameter of 20 μm to 100 μm, and the abrasive with a substantially spherical shape is ejected at an ejection speed of 100 m/s to 250 m/s or at an ejection pressure of 0.2 MPa to 0.5 MPa.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 2, 2013
From: MASE, KEIJI; CHINO, DAISUKE; HINATA, MASATO
To: FUJI MANUFACTURING CO., LTD.,
Reel/Frame 030334/0034 →
Priority Claims (2)
JP 2012-107052 · May 8, 2012 · national
JP 2012-193245 · Sep 3, 2012 · national
Continuity (1)
Related Publication 20130303053A1 · Nov 14, 2013