Semiconductor device with metal dam and fabricating method
View Patent ↗A semiconductor device is disclosed that may include a first semiconductor die comprising a copper pillar, a second semiconductor die comprising a copper pillar, and a conductive bump connecting the copper pillar of the first semiconductor die to the copper pillar of the second semiconductor die. The first semiconductor die may comprise a metal dam formed between the copper pillar and a bond pad on the first semiconductor die. The conductive bump may have a melting point lower than melting points of the copper pillar of the first semiconductor die and the copper pillar of the second semiconductor die. The first semiconductor die may be coupled to a substrate with a conductive wire coupled to the bond pad and to the substrate. The first semiconductor die may comprise a redistribution layer formed beneath the copper pillar on the first semiconductor die.
1. An electronic device comprising:
a first structure comprising an inner perimeter and an outer perimeter;
first metal pillars on the first structure, the first metal pillars located at the inner perimeter;
a first metal dam on the first structure, the first metal dam delimiting the inner perimeter from the outer perimeter;
a dam seed between the first metal dam and the first structure; and
a pillar seed between the first metal pillars and the first structure,
wherein:
the dam seed and the pillar seed are portions of a same seed metal layer; and
the first metal dam and the first metal pillars comprise respective portions of a same plating pattern on the first structure.
2. The electronic device of claim 1 , further comprising:
a bond pad on the first structure,
wherein:
the bond pad is located at the outer perimeter; and
the first metal dam is located between the first metal pillars and the bond pad.
3. The electronic device of claim 1 , wherein the first structure comprises a redistribution layer on a semiconductor die.
4. The electronic device of claim 1 , further comprising:
conductive bumps coupled to the first metal pillars of the first structure; and
a second structure coupled over the first structure by the conductive bumps.
5. The electronic device of claim 1 , further comprising:
a second structure over the first structure and comprising second metal pillars,
wherein the second metal pillars are coupled to the first metal pillars of the first structure.
6. The electronic device of claim 1 , further comprising:
an underfill over the first structure and extended from the first metal pillars to the first metal dam,
wherein the underfill is restricted from the outer perimeter of the first structure by the first metal dam.
7. The electronic device of claim 1 , wherein from a cross-section view, the first metal dam is at least one of thicker or wider than the first metal pillars.
8. The electronic device of claim 1 , wherein the first metal pillars and the first metal dam have a first thickness.
9. The electronic device of claim 1 , wherein the first metal pillars and the first metal dam have a first width.
10. The electronic device of claim 1 , wherein the first metal dam comprises individual dam pillars with a pitch separation between the individual dam pillars.
11. The electronic device of claim 1 , further comprising:
a second metal dam,
wherein:
the first metal dam is located between the first metal pillars and the second metal dam, and
the first metal dam and the second metal dam comprise respective portions of the same plating pattern on the first structure.
12. An electronic device comprising:
a first structure comprising an inner perimeter and an outer perimeter;
first metal pillars and a bond pad on the first structure, the first metal pillars located at the inner perimeter, the bond pad located at the outer perimeter; and
a first metal dam on the first structure, the first metal dam delimiting the inner perimeter from the outer perimeter, and located between the first metal pillars and the bond pad;
a dam seed between the first metal dam and the first structure; and
a pillar seed between the first metal pillars and the first structure,
wherein, from a cross-section view:
the dam seed and the pillar seed are portions of a same seed metal layer;
the first metal pillars have a first thickness and a first width; and
the first metal dam has one or both of the first thickness and the first width.
13. The electronic device of claim 12 , wherein the first metal dam has the first thickness.
14. The electronic device of claim 12 , wherein the first metal dam has the first width.
15. The electronic device of claim 12 , wherein the first metal dam has a width greater than the first width.
16. The electronic device of claim 12 , wherein the first metal dam has a thickness greater than the first thickness.
17. The electronic device of claim 12 , wherein the first metal dam and the first metal pillars comprise respective portions of a same plating pattern on the first structure.
18. The electronic device of claim 12 , wherein the first metal dam comprises individual dam pillars with a pitch separation between the individual dam pillars.
19. A method comprising:
providing first metal pillars and a first metal dam on a first structure, the first structure comprising an inner perimeter and an outer perimeter, the first metal dam delimiting the inner perimeter from the outer perimeter, the first metal pillars located at the inner perimeter; and
forming a dam seed between the first metal dam and the first structure and a pillar seed between the first metal pillars and the first structure,
wherein:
the dam seed and the pillar seed are portions of a same seed metal layer; and
the first metal dam and the first metal pillars comprise respective portions of a same plating pattern on the first structure.
20. The method of claim 19 , further comprising:
coupling a second structure to the first structure; and
providing an underfill between the first and second structures, wherein the underfill extends from the first metal pillars to the first metal dam,
wherein:
the second structure comprises second metal pillars coupled to the first metal pillars;
the first structure comprises a bond pad at the outer perimeter;
portions of respective thicknesses of the first metal dam and of the first metal pillars are simultaneously formed;
providing the first metal dam comprises locating the first metal dam between the first metal pillars and the bond pad; and
providing the underfill comprises restricting the underfill from the outer perimeter of the first structure via the first metal dam.
21. The method of claim 19 , wherein the first metal dam comprises individual dam pillars with a pitch separation between the individual dam pillars.