Electrical fuse and method of fabricating the same
View Patent ↗An electrical fuse is provided. The electrical fuse includes an anode formed on a substrate, a cathode formed on the substrate, a fuse link connecting the anode and the cathode to each other, a first contact formed on the anode, and a second contact formed on the cathode and arranged closer to the fuse link than the first contact.
1. An electrical fuse, comprising:
an anode formed on a substrate;
a cathode formed on the substrate;
a fuse link connecting the anode and the cathode to each other;
a first contact formed on the anode; and
a second contact formed on the cathode and arranged closer to the fuse link than the first contact,
wherein the second contact is arranged closer to an edge of the cathode proximal to the fuse link than an edge of the cathode distal to the fuse link, and
wherein an area defined by virtual extension of the fuse link, extending from the edge of the cathode distal to the fuse link to an edge of the anode distal to the fuse link, has no contact formed thereon.
2. The electrical fuse according to claim 1 , wherein the fuse link is arranged between the anode and the cathode.
3. The electrical fuse according to claim 1 , wherein the cathode comprises three regions of equal width lateral to a side of the cathode connected to the fuse link, and the second contact is formed in a region most proximal to the fuse link among the three regions of equal width.
4. The electrical fuse according to claim 1 , wherein the anode, the cathode and the fuse link are a deposition structure of semiconductor portions and metal silicide portions.
5. The electrical fuse according to claim 4 , wherein the semiconductor portions are doped polysilicons or undoped polysilicons.
6. The electrical fuse according to claim 4 , wherein the metal silicide portions include metal atoms selected from a group consisting of Ti, Co, Ni, Ta, Al, Zr, Hf, W, Pt, Pd, Mo and their combination.
7. The electrical fuse according to claim 4 , wherein the metal silicide portion has a thickness of 20 nm to 50 nm.
8. The electrical fuse according to claim 1 , further comprising a first set of contacts formed on the anode and a second set of contacts formed on the cathode, wherein the first set of contacts includes two or more contacts, and the first contact is one of the two or more contacts of the first set of contacts; and the second set of contacts includes two or more contacts, and the second contact is one of the two or more contacts of the second set of contacts.
9. The electrical fuse according to claim 1 , wherein the first contact formed on the anode is disposed outside of a silicide loss area.
10. The electrical fuse according to claim 1 , wherein a silicide loss region is disposed entirely within the fuse.
11. The electrical fuse according to claim 1 , wherein the cathode has an area greater than or equal to an area of the anode.
12. A method for fabricating an electrical fuse, the method comprising:
forming a semiconductor layer on the substrate;
forming first, second and third semiconductor portions by patterning the semiconductor layer;
forming an anode, a cathode and a fuse link connecting the anode and the cathode to each other by forming first, second and third metal silicide portions on the first, second and third semiconductor portions, respectively;
forming a first contact on the anode; and
forming a second contact on the cathode closer to the fuse link than the first contact,
wherein an area defined by virtual extension of the fuse link has no contact formed thereon.
13. The method according to claim 12 , wherein the fuse link is arranged between the anode and the cathode.
14. The method according to claim 12 , wherein the cathode comprises three regions of equal width lateral to a side of the cathode connected to the fuse link, and the second contact is formed in a region connected to the fuse link among the three regions of equal width.
15. The method according to claim 12 , wherein the anode, the cathode and the fuse link are formed of a deposition structure of first, second and third semiconductor portions and first, second and third metal silicide portions.
16. The method according to claim 12 , wherein the first, second and third semiconductor portions are doped polysilicons or undoped polysilicons.
17. The method according to claim 12 , wherein the first, second and third semiconductor portions are formed in a single body.
18. The method according to claim 12 , wherein the first, second and third metal silicide portions include metal atoms selected from a group consisting of Ti, Co, Ni, Ta, Al, Zr, Hf, W, Pt, Pd, Mo and their combination.
19. The method according to claim 12 , further comprising a first set of contacts formed on the anode and a second set of contacts formed on the cathode, wherein the first set of contacts includes two or more contacts, and the first contact is one of the two or more contacts of the first set of contacts; and the second set of contacts includes two or more contacts, and the second contact is one of the two or more contacts of the second set of contacts.
20. The method according to claim 12 , wherein the first contact formed on the anode is disposed outside of a silicide loss area.
21. The method according to claim 12 , wherein the forming of the metal silicide portions includes forming a metal layer on the first, second and third semiconductor portions at a thickness of 5 nm to 50 nm, and forming silicide on a surface of the metal layer by carrying out heat treatment for the metal layer.