IP Library Granted Patent US 8,957,510
Granted Patent B2
US 8,957,510 · App. 13/935,015 · Granted Feb 17, 2015

Using an integrated circuit die configuration for package height reduction

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Quick Facts
Patent No.
US 8,957,510
App. No.
13/935,015
Granted
Feb 17, 2015
Kind
B2
Abstract

A semiconductor device includes a semiconductor die having a first major surface and a second major surface opposite the first major surface, a first minor surface and a second minor surface opposite the first minor surface, a plurality of contact pads on the first major surface, and a notch which extends from the first minor surface and the second major surface into the semiconductor die. The notch has a notch depth measured from the second major surface into the semiconductor die, wherein the notch depth is less than a thickness of the semiconductor die, and a notch length measured from the first minor surface into the semiconductor die, wherein the notch length is less than a length of the semiconductor die measured between the first and second minor surfaces. The device includes a lead having a first end in the notch, and an encapsulant over the first major surface.

Claims (34)

1. A semiconductor device comprising:

a semiconductor die having a first major surface and a second major surface opposite the first major surface, a first minor surface and a second minor surface opposite the first minor surface, wherein the first and second minor surfaces are between the first and second major surfaces, a plurality of contact pads on the first major surface, and a notch which extends from the first minor surface and the second major surface into the semiconductor die, wherein:

the notch has a notch depth measured from the second major surface into the semiconductor die, wherein the notch depth is less than a thickness of the semiconductor die, and a notch length measured from the first minor surface into the semiconductor die, wherein the notch length is less than a length of the semiconductor die measured between the first and second minor surfaces;

a lead having a first end in the notch; and

an encapsulant over the first major surface of the semiconductor die.

2. The semiconductor device of claim 1 , wherein the encapsulant extends into the notch.

3. The semiconductor device of claim 1 , further comprising a wire bond connected between a contact pad of the plurality of contact pads and the lead, wherein the encapsulant is over the wire bond.

4. The semiconductor device of claim 1 , further comprising an adhesive in the notch between the lead and the semiconductor die.

5. The semiconductor device of claim 1 , wherein the semiconductor die has a third minor surface and a fourth minor surface opposite the third minor surface, wherein the third and four minor surfaces are substantially perpendicular to the first and second minor surfaces, and wherein the notch extends through the semiconductor die from the third minor surface to the fourth minor surface.

6. The semiconductor device of claim 1 , wherein the notch is one of a plurality of notches, wherein each of the plurality of notches extends from the first minor surface and the second major surface into the semiconductor die, and wherein each notch of the plurality of notches has a notch depth less than the thickness of the semiconductor die and a notch length less than the length of the semiconductor die.

7. The semiconductor device of claim 6 , wherein each notch of the plurality of notches has a same notch length and a same notch depth.

8. The semiconductor device of claim 6 , wherein the lead is one of a plurality of leads, and wherein each of the plurality of notches includes a first end of one or more leads of the plurality of leads.

9. The semiconductor device of claim 1 , wherein a thickness of the lead, measured in a same direction as the notch depth, is at least 80% of the notch depth.

10. The semiconductor device of claim 1 , wherein the notch length is at least 25 micrometers.

11. The semiconductor device of claim 1 , wherein at least a portion of the second major surface is exposed.

12. The semiconductor device of claim 1 , wherein the semiconductor die comprises a plurality of substrate layers.

13. A method for forming a semiconductor device, comprising:

forming a notch in a semiconductor die having a first major surface, a second major surface opposite the first major surface, a first minor surface, a second minor surface opposite the first minor surface, and a plurality of contact pads on the first major surface, wherein:

the notch extends from the first minor surface and the second major surface into the semiconductor die, and

the notch has a notch depth measured from the second major surface into the semiconductor die, wherein the notch depth is less than a thickness of the semiconductor die, and a notch length measured from the first minor surface into the semiconductor die, wherein the notch length is less than a length of the semiconductor die measured between the first and second minor surfaces;

placing a first end of a lead into the notch; and

forming an encapsulant over the first major surface of the semiconductor die.

14. The method of claim 13 , wherein forming the encapsulant is performed such that the encapsulant extends into the notch.

15. The method of claim 13 , further comprising forming a wire bond connection between a contact pad of the plurality of contact pads and the lead, wherein the encapsulant is over the wire bond connection.

16. The method of claim 13 , wherein the placing the first end of the lead into the notch comprises attaching the first end to the semiconductor die with an adhesive.

17. The method of claim 13 , wherein the semiconductor die has a third minor surface and a fourth minor surface opposite the third minor surface, wherein the third and four minor surfaces are substantially perpendicular to the first and second minor surfaces, and wherein forming the notch extends through the semiconductor die from the third minor surface to the fourth minor surface.

18. The method of claim 13 , wherein forming the notch comprises forming a plurality of notches, wherein each of the plurality of notches extends from the first minor surface and the second major surface into the semiconductor die, and wherein each notch of the plurality of notches has a notch depth less than the thickness of the semiconductor die and a notch length less than the length of the semiconductor die.

19. The method of claim 18 , wherein placing the lead comprises placing a first end of one or more leads of a plurality of leads into each notch of the plurality of notches.

20. A semiconductor device comprising:

a semiconductor die having a first major surface and a second major surface, opposite the first major surface, a first minor surface and a second minor surface, opposite the first minor surface, a third minor surface and a fourth minor surface, opposite the third minor surface, wherein the first, second, third, and fourth minor surfaces are between the first and second major surfaces, a plurality of contact pads on the first major surface, and a notch which extends from the first minor surface and the second major surface into the semiconductor die and which extends through the semiconductor die from the third minor surface to the fourth minor surface, wherein:

the notch has a notch depth measured from the second major surface into the semiconductor die, wherein the notch depth is less than a thickness of the semiconductor die;

a plurality of leads, each having a first end in the notch;

a plurality of wire bonds, each connected between a contact pad of the plurality of contact pads and a corresponding lead of the plurality of leads; and

an encapsulant over the plurality of wire bonds and over the first major surface of the semiconductor die.

Assignments (17)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
MERGER Recorded Jan 3, 2017
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 041144/0363 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PCT NUMBERS IB2013000664, US2013051970, US201305935 PREVIOUSLY RECORDED AT REEL: 037444 FRAME: 0787. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Oct 17, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 040450/0715 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 5, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037444/0787 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0874 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 13, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 031627/0158 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 13, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031627/0201 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 3, 2013
From: PHAM, TIM V.; GUAJARDO, JAMES R.; MCSHANE, MICHAEL B.
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 030737/0902 →