IP Library Granted Patent US 9,123,685
Granted Patent B2
US 9,123,685 · App. 13/942,518 · Granted Sep 1, 2015

Microelectronic packages having frontside thermal contacts and methods for the fabrication thereof

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Quick Facts
Patent No.
US 9,123,685
App. No.
13/942,518
Granted
Sep 1, 2015
Kind
B2
Abstract

Microelectronic packages and methods for fabricating microelectronic packages are provided. In one embodiment, the method includes forming one or more redistribution layers over an encapsulated die having a frontside bond pad area and a frontside passivated non-bond pad area. The redistribution layers are formed to have a frontside opening over the non-bond pad area of the encapsulated die. A primary heat sink body is provided in the frontside opening and thermally coupled to the encapsulated die. A contact array is formed over the redistribution layers and is electrically coupled to a plurality bond pads located on the frontside bond pad area of the encapsulated die.

Claims (40)

1. A method for producing a microelectronic package, comprising:

forming one or more redistribution layers over an encapsulated die around which a molded body having a fan-out area is formed, the encapsulated die having a frontside bond pad area and a frontside non-bond pad area, the redistribution layers formed to have a frontside opening over the non-bond pad area of the encapsulated die;

providing a primary heat sink body in the frontside opening and thermally coupled to the encapsulated die;

forming a contact array over the redistribution layers and electrically coupled to a plurality bond pads located on the frontside bond pad area of the encapsulated die; and

providing a peripheral heat sink body over the fan-out area, electrically-isolated from a plurality of interconnected lines formed within the redistribution layers, and in thermal contact with the primary heat sink body.

2. The method of claim 1 wherein the frontside opening is formed within a central region of the redistribution layers, and wherein the primary heat sink body is positioned over a central region of the encapsulated die.

3. The method of claim 1 wherein the contact array is disposed around the primary heat sink body.

4. The method of claim 1 wherein providing comprises adhesively attaching a metal slug directly to the frontside non-bond pad area of the encapsulated die.

5. The method of claim 1 wherein the primary heat sink body is exposed through the frontside of the microelectronic package.

6. The method of claim 1 wherein providing a peripheral heat sink body comprises forming a thermally-conductive layer over the fan-out area utilizing the lithographical patterning and metal deposition processes used to form the redistribution layers.

7. The method of claim 1 wherein the thermally-conductive layer has a substantially ring-shaped planform geometry and extends around the contact array.

8. The method of claim 1 wherein the primary heat sink body has planform dimensions less than the planform dimensions of the encapsulated semiconductor die.

9. The method of claim 1 further comprising depositing a thermally-conductive base layer directly onto the frontside non-bond pad area of the encapsulated die.

10. The method of claim 9 wherein providing the primary heat sink body comprises plating at least one layer of metal in the frontside opening and on the thermally-conductive base layer to produce the primary heat sink body.

11. The method of claim 9 wherein providing comprises attaching a metal slug to the thermally-conductive base layer.

12. The method of claim 1 further comprising:

forming a dielectric layer over the primary heat sink body; and

forming thermally-conductive contacts extending through the dielectric layer and contacting the primary heat sink body.

13. The method of claim 12 wherein the thermally-conductive contacts comprise solder balls.

14. The method of claim 1 wherein the forming comprises forming the redistribution layers over the encapsulated die while included within a molded panel containing a plurality of other encapsulated die, and wherein the method further comprises singulating the molded panel to define the sidewalls of the microelectronic package.

15. The method of claim 14 further comprising forming a peripheral heat sink body in thermal contact with the primary heat sink body along an outer perimeter of the microelectronic package such that the peripheral heat sink body is exposed through at least one sidewall of the microelectronic package after singulation of the molded panel.

16. A microelectronic package, comprising:

a semiconductor die having a frontside non-bond pad area and a frontside bond pad area;

a plurality of bond pads located over the semiconductor die and located within the frontside bond pad area;

a molded body in which the semiconductor die is embedded;

one or more redistribution layers located over the semiconductor die;

a contact array located over the one or more redistribution layers and electrically coupled to the plurality of bond pads therethrough; and

wherein the microelectronic package is a Redistributed Chip Package (RCP), wherein the molded body is comprised of a singulated piece of a molded RCP panel, wherein the molded body comprises a fan-out region surrounding the semiconductor die, and wherein the microelectronic package further comprises a peripheral heat sink body located over the fan-out region.

17. The microelectronic package of claim 16 wherein the primary heat sink body is generally centered with respect to the semiconductor die, at taken along an axis substantially orthogonal to the frontside surface of the semiconductor die; and wherein one or more redistribution layers circumscribe the primary heat sink body.

18. The microelectronic package of claim 16 further comprising a primary heat sink body in thermal contact with the semiconductor die and with the peripheral heat sink body, the primary heat sink body disposed over the frontside non-bond pad area of the semiconductor die.

19. A method for producing a microelectronic package, comprising:

forming one or more redistribution layers over an encapsulated die having a frontside bond pad area and a frontside non-bond pad area, the redistribution layers formed to have a frontside opening over the non-bond pad area of the encapsulated die;

during formation of the one or more redistribution layers, plating a thermally-conductive base layer onto the frontside non-bond pad area of the encapsulated die;

depositing a masking layer over the redistribution layers;

forming an additional opening in the masking layer aligning with the frontside opening provided in the redistribution layers;

after formation of the additional opening in the masking layer, plating at least one layer of metal in the frontside opening and onto the thermally-conductive base layer to produce a primary heat sink body in the frontside opening thermally coupled to the encapsulated die; and

forming a contact array over the redistribution layers and electrically coupled to a plurality bond pads located on the frontside bond pad area of the encapsulated die.

20. The method of claim 19 further comprising:

forming a dielectric layer extending over the primary heat sink body; and

forming electrically-inactive solder balls extending through the dielectric layer and contacting the primary heat sink body, the electrically-inactive solder balls providing an increased cumulative surface area for removing heat from the microelectronic package through the primary heat sink body.

Assignments (18)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040632 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Sep 21, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 044209/0047 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 040632/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PCT NUMBERS IB2013000664, US2013051970, US201305935 PREVIOUSLY RECORDED AT REEL: 037444 FRAME: 0787. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Oct 17, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 040450/0715 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 5, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037444/0787 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0874 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 13, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 031627/0158 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 13, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031627/0201 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 15, 2013
From: YAP, WENG F.; MITCHELL, DOUGLAS G.
To: FREESCALE SEMICONDUCTOR INC.
Reel/Frame 030800/0569 →